ATE502323T1 - Beleuchtungssystem für die mikrolithographie - Google Patents

Beleuchtungssystem für die mikrolithographie

Info

Publication number
ATE502323T1
ATE502323T1 AT04726980T AT04726980T ATE502323T1 AT E502323 T1 ATE502323 T1 AT E502323T1 AT 04726980 T AT04726980 T AT 04726980T AT 04726980 T AT04726980 T AT 04726980T AT E502323 T1 ATE502323 T1 AT E502323T1
Authority
AT
Austria
Prior art keywords
light
filter
microlithography
illumination system
field
Prior art date
Application number
AT04726980T
Other languages
German (de)
English (en)
Inventor
Wolfgang Singer
Joachim Wietzorrek
Joachim Hainz
Gabriele Weirauch
Manfred Maul
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE502323T1 publication Critical patent/ATE502323T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lighting Device Outwards From Vehicle And Optical Signal (AREA)
AT04726980T 2003-07-30 2004-04-13 Beleuchtungssystem für die mikrolithographie ATE502323T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10334722 2003-07-30
PCT/EP2004/003854 WO2005015314A2 (en) 2003-07-30 2004-04-13 An illumination system for microlithography

Publications (1)

Publication Number Publication Date
ATE502323T1 true ATE502323T1 (de) 2011-04-15

Family

ID=34129472

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04726980T ATE502323T1 (de) 2003-07-30 2004-04-13 Beleuchtungssystem für die mikrolithographie

Country Status (7)

Country Link
US (1) US7911584B2 (https=)
EP (1) EP1649324B1 (https=)
JP (1) JP5026788B2 (https=)
KR (1) KR101144458B1 (https=)
AT (1) ATE502323T1 (https=)
DE (1) DE602004031844D1 (https=)
WO (1) WO2005015314A2 (https=)

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WO2005036266A1 (de) 2003-09-17 2005-04-21 Carl Zeiss Smt Ag Masken, lithographievorrichtung und halbleiterbauelement
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2006136353A1 (en) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag A double-facetted illumination system with attenuator elements on the pupil facet mirror
JP2007150295A (ja) 2005-11-10 2007-06-14 Carl Zeiss Smt Ag ラスタ要素を有する光学装置、及びこの光学装置を有する照射システム
KR101314974B1 (ko) 2006-02-17 2013-10-04 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 조명 시스템 및 이를 구비한 투사 노출장치
DE102006020734A1 (de) 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
WO2008101664A1 (en) * 2007-02-20 2008-08-28 Carl Zeiss Smt Ag Optical element with multiple primary light sources
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
EP2155932A2 (de) * 2007-05-31 2010-02-24 Carl Zeiss SMT AG Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem
DE102007041004A1 (de) 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102008002749A1 (de) 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
NL2003449A (en) * 2008-10-28 2010-04-29 Asml Netherlands Bv Fly's eye integrator, illuminator, lithographic apparatus and method.
JP6041304B2 (ja) * 2009-03-27 2016-12-07 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置
DE102009014701A1 (de) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Optische Baugruppe
JP5070242B2 (ja) * 2009-05-27 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置
DE102009045491A1 (de) 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Beleuchtungsoptik
JP5661172B2 (ja) * 2010-04-23 2015-01-28 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法
WO2012041697A1 (en) 2010-09-27 2012-04-05 Carl Zeiss Smt Gmbh Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
DE102011085132A1 (de) 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Optische Baugruppe für die Projektionslithografie
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
NL2008009A (en) 2011-02-02 2012-08-06 Asml Netherlands Bv Illumination system, lithographic apparatus and method.
DE102011004326A1 (de) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optische Baugruppe für eine Beleuchtungsoptik für die Projektionslithographie
JP2013072845A (ja) * 2011-09-29 2013-04-22 Nuflare Technology Inc パターン検査装置及びパターン検査方法
CN104220931B (zh) 2012-03-29 2016-10-12 卡尔蔡司Smt有限责任公司 补偿微光刻投射曝光系统的通道缺陷的设备及方法
DE102012210174A1 (de) * 2012-06-18 2013-06-06 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102012218221A1 (de) * 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem
DE102014203187A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102014217612A1 (de) 2014-09-03 2016-03-03 Carl Zeiss Smt Gmbh Beleuchtungoptik für die Projektonslithograpfie
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JP2019028392A (ja) * 2017-08-03 2019-02-21 セイコーエプソン株式会社 光源装置、照明装置及びプロジェクター
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Also Published As

Publication number Publication date
KR101144458B1 (ko) 2012-05-14
US7911584B2 (en) 2011-03-22
WO2005015314A2 (en) 2005-02-17
JP5026788B2 (ja) 2012-09-19
KR20060039876A (ko) 2006-05-09
EP1649324B1 (en) 2011-03-16
US20070058274A1 (en) 2007-03-15
DE602004031844D1 (de) 2011-04-28
WO2005015314A3 (en) 2005-11-24
JP2007500432A (ja) 2007-01-11
EP1649324A2 (en) 2006-04-26

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