ATE473209T1 - Sulfoniumsalzinitiatoren - Google Patents
SulfoniumsalzinitiatorenInfo
- Publication number
- ATE473209T1 ATE473209T1 AT06777379T AT06777379T ATE473209T1 AT E473209 T1 ATE473209 T1 AT E473209T1 AT 06777379 T AT06777379 T AT 06777379T AT 06777379 T AT06777379 T AT 06777379T AT E473209 T1 ATE473209 T1 AT E473209T1
- Authority
- AT
- Austria
- Prior art keywords
- c20alkyl
- phenanthryl
- anthryl
- naphthyl
- biphenylyl
- Prior art date
Links
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 title 1
- 239000003999 initiator Substances 0.000 title 1
- -1 biphenylyl Chemical group 0.000 abstract 5
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 abstract 4
- 125000005561 phenanthryl group Chemical group 0.000 abstract 4
- 125000001624 naphthyl group Chemical group 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 229910052717 sulfur Inorganic materials 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 125000004653 anthracenylene group Chemical group 0.000 abstract 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 150000002431 hydrogen Chemical group 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 125000005562 phenanthrylene group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/06—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05105991 | 2005-07-01 | ||
| PCT/EP2006/063378 WO2007003507A1 (en) | 2005-07-01 | 2006-06-21 | Sulphonium salt initiators |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE473209T1 true ATE473209T1 (de) | 2010-07-15 |
Family
ID=35453417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06777379T ATE473209T1 (de) | 2005-07-01 | 2006-06-21 | Sulfoniumsalzinitiatoren |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7901867B2 (OSRAM) |
| EP (1) | EP1902019B1 (OSRAM) |
| JP (1) | JP5081151B2 (OSRAM) |
| KR (1) | KR101334046B1 (OSRAM) |
| CN (1) | CN101213169A (OSRAM) |
| AT (1) | ATE473209T1 (OSRAM) |
| DE (1) | DE602006015319D1 (OSRAM) |
| TW (1) | TW200710074A (OSRAM) |
| WO (1) | WO2007003507A1 (OSRAM) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4866606B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP4695996B2 (ja) * | 2006-02-27 | 2011-06-08 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| US8012672B2 (en) | 2006-10-04 | 2011-09-06 | Basf Se | Sulphonium salt photoinitiators |
| CN101778818B (zh) * | 2007-08-07 | 2014-01-08 | 株式会社Adeka | 芳香族硫鎓盐化合物 |
| WO2009047105A1 (en) * | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| CN102026967B (zh) * | 2007-10-10 | 2013-09-18 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| EP2288599A1 (en) * | 2008-06-12 | 2011-03-02 | Basf Se | Sulfonium derivatives and the use thereof as latent acids |
| JP5385017B2 (ja) * | 2008-07-11 | 2014-01-08 | 信越化学工業株式会社 | レジストパターン形成方法及びフォトマスクの製造方法 |
| WO2010046240A1 (en) | 2008-10-20 | 2010-04-29 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| US20120020881A1 (en) * | 2008-12-12 | 2012-01-26 | Bayer Schering Pharma Aktiengesellschaft | Triaryl-sulphonium compounds, kit and methods for labeling positron emitting isotopes |
| EP2199856B1 (en) | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Cationic radiation curable compositions |
| JP5576139B2 (ja) * | 2009-02-20 | 2014-08-20 | サンアプロ株式会社 | スルホニウム塩，光酸発生剤，光硬化性組成物，及びその硬化体 |
| KR101700980B1 (ko) * | 2009-02-20 | 2017-01-31 | 산아프로 가부시키가이샤 | 술포늄염, 광산 발생제 및 감광성 수지 조성물 |
| JP5448157B2 (ja) * | 2009-03-13 | 2014-03-19 | 株式会社Ａｄｅｋａ | 芳香族スルホニウム塩化合物 |
| JP5491913B2 (ja) * | 2009-03-18 | 2014-05-14 | サンアプロ株式会社 | 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP5635526B2 (ja) * | 2009-10-26 | 2014-12-03 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
| JP5543757B2 (ja) * | 2009-11-11 | 2014-07-09 | サンアプロ株式会社 | スルホニウム塩，光酸発生剤，硬化性組成物及びポジ型フォトレジスト組成物 |
| US9382352B2 (en) | 2009-11-12 | 2016-07-05 | Ndsu Research Foundation | Polymers derived from plant oil |
| EP2499171A4 (en) * | 2009-11-12 | 2014-06-18 | Ndsu Res Foundation | POLYMERS FROM A VEGETABLE OIL |
| WO2011075555A1 (en) | 2009-12-17 | 2011-06-23 | Dsm Ip Assets, B.V. | Led curable liquid resin compositions for additive fabrication |
| AU2011207304B2 (en) | 2010-01-22 | 2014-07-17 | Stratasys, Inc. | Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof |
| US8871423B2 (en) * | 2010-01-29 | 2014-10-28 | Samsung Electronics Co., Ltd. | Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same |
| EP2552927B1 (en) | 2010-03-30 | 2019-03-13 | SurModics, Inc. | Degradable photo-crosslinkers |
| US10315987B2 (en) | 2010-12-13 | 2019-06-11 | Surmodics, Inc. | Photo-crosslinker |
| JP5787720B2 (ja) | 2010-12-16 | 2015-09-30 | キヤノン株式会社 | 感光性ネガ型樹脂組成物 |
| KR101229312B1 (ko) * | 2011-01-03 | 2013-02-04 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 이의 제조방법 |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| EP2502728B1 (en) | 2011-03-23 | 2017-01-04 | DSM IP Assets B.V. | Lightweight and high strength three-dimensional articles producible by additive fabrication processes |
| US9487420B2 (en) | 2012-05-18 | 2016-11-08 | Ndsu Research Foundation | Vegetable oil-based polymers for nanoparticle surface modification |
| US9631040B2 (en) | 2012-05-18 | 2017-04-25 | Ndsu Research Foundation | Functionalized amphiphilic plant-based polymers |
| JP5899068B2 (ja) * | 2012-06-28 | 2016-04-06 | 東京応化工業株式会社 | 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法 |
| JP5739497B2 (ja) * | 2012-09-15 | 2015-06-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 酸発生剤化合物およびそれを含むフォトレジスト |
| JP5830503B2 (ja) * | 2012-09-15 | 2015-12-09 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 酸発生剤化合物およびそれを含むフォトレジスト |
| TWI573782B (zh) * | 2012-12-07 | 2017-03-11 | Ｄｓｐ五協食品＆化學品股份有限公司 | 新穎鋶鹽化合物、其製造方法及光酸產生劑 |
| US9834626B2 (en) | 2013-01-15 | 2017-12-05 | Ndsu Research Foundation | Plant oil-based materials |
| CN103642383B (zh) * | 2013-12-04 | 2016-04-20 | 江南大学 | 一种本征型光固化抗静电树脂的制备方法 |
| WO2015174471A1 (ja) * | 2014-05-13 | 2015-11-19 | 東洋合成工業株式会社 | オニウム塩、光酸発生剤、感光性樹脂組成物及びデバイスの製造方法 |
| JP6583136B2 (ja) * | 2016-05-11 | 2019-10-02 | 信越化学工業株式会社 | 新規スルホニウム化合物及びその製造方法、レジスト組成物、並びにパターン形成方法 |
| JP6561937B2 (ja) * | 2016-08-05 | 2019-08-21 | 信越化学工業株式会社 | ネガ型レジスト組成物及びレジストパターン形成方法 |
| US10416558B2 (en) * | 2016-08-05 | 2019-09-17 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition, resist pattern forming process, and photomask blank |
| CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
| CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
| US11590706B2 (en) | 2018-05-03 | 2023-02-28 | Covestro (Netherlands) B.V. | Methods of post-processing photofabricated articles created via additive fabrication |
| JP7499071B2 (ja) * | 2019-06-04 | 2024-06-13 | 住友化学株式会社 | 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法並びに塩の製造方法 |
| US12461444B2 (en) | 2020-03-17 | 2025-11-04 | San-Apro Ltd. | Sulfonium salt, photoacid generator, curable composition, and resist composition |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ZA805273B (en) * | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
| JPH107649A (ja) * | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
| KR100279497B1 (ko) * | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
| TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| JP3476374B2 (ja) * | 1998-10-09 | 2003-12-10 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
| JP3972568B2 (ja) * | 2000-05-09 | 2007-09-05 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物及びスルホニウム塩 |
| JP4177952B2 (ja) * | 2000-05-22 | 2008-11-05 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| TWI286664B (en) * | 2000-06-23 | 2007-09-11 | Sumitomo Chemical Co | Chemical amplification type positive resist composition and sulfonium salt |
| JP4150509B2 (ja) * | 2000-11-20 | 2008-09-17 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP4262402B2 (ja) * | 2000-10-20 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US6749987B2 (en) | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| JP2002202605A (ja) * | 2000-12-28 | 2002-07-19 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| ATE438638T1 (de) | 2001-07-19 | 2009-08-15 | Lamberti Spa | Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme |
| JP2003255542A (ja) * | 2002-03-04 | 2003-09-10 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| US6911297B2 (en) * | 2002-06-26 | 2005-06-28 | Arch Specialty Chemicals, Inc. | Photoresist compositions |
| US7611817B2 (en) * | 2002-09-25 | 2009-11-03 | Adeka Corporation | Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
| JP4253486B2 (ja) * | 2002-09-25 | 2009-04-15 | 富士フイルム株式会社 | ポジ型又はネガ型レジスト組成物、酸発生剤及びパターン形成方法 |
| JP4115309B2 (ja) * | 2003-03-24 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4399192B2 (ja) * | 2003-06-03 | 2010-01-13 | 富士フイルム株式会社 | 感光性組成物 |
-
2006
- 2006-06-21 AT AT06777379T patent/ATE473209T1/de not_active IP Right Cessation
- 2006-06-21 CN CNA2006800238530A patent/CN101213169A/zh active Pending
- 2006-06-21 US US11/922,444 patent/US7901867B2/en active Active
- 2006-06-21 JP JP2008518789A patent/JP5081151B2/ja active Active
- 2006-06-21 EP EP06777379A patent/EP1902019B1/en active Active
- 2006-06-21 WO PCT/EP2006/063378 patent/WO2007003507A1/en not_active Ceased
- 2006-06-21 DE DE602006015319T patent/DE602006015319D1/de active Active
- 2006-06-21 KR KR1020087002868A patent/KR101334046B1/ko active Active
- 2006-06-30 TW TW095123894A patent/TW200710074A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP1902019A1 (en) | 2008-03-26 |
| DE602006015319D1 (de) | 2010-08-19 |
| KR20080030082A (ko) | 2008-04-03 |
| US7901867B2 (en) | 2011-03-08 |
| CN101213169A (zh) | 2008-07-02 |
| JP2009501148A (ja) | 2009-01-15 |
| KR101334046B1 (ko) | 2013-12-02 |
| JP5081151B2 (ja) | 2012-11-21 |
| US20090208872A1 (en) | 2009-08-20 |
| TW200710074A (en) | 2007-03-16 |
| WO2007003507A1 (en) | 2007-01-11 |
| EP1902019B1 (en) | 2010-07-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE473209T1 (de) | Sulfoniumsalzinitiatoren | |
| ES2495743T3 (es) | Fosfaplatinos y su uso en el tratamiento de cánceres resistentes a cisplatino y carboplatino | |
| ATE496910T1 (de) | Oximesther-fotoinitiatoren | |
| BRPI0509471A8 (pt) | Lipídios, complexos de lipídio e uso dos mesmos | |
| ATE381540T1 (de) | Oximesther-fotoinitiatoren | |
| CY1106752T1 (el) | Διϋδροπτεριδινονες, μεθοδος για την παραγωγη τους και χρηση τους ως φαρμακων | |
| DK1678119T3 (da) | Fremgangsmåde til fremstilling af 2-dihalogenacyl-3-amino-acrylsyreestere og 3-dihalogenmethyl-pyrazol-4-carboxylsyreestere | |
| EA200000327A2 (ru) | Новые соединения аминотриазола, способ их получения и содержащие их фармацевтические композиции | |
| JP2013028597A5 (OSRAM) | ||
| AR047917A1 (es) | Derivados de 4-benzimidazol-2-il-piridazin-3-ona, preparacion de los mismos, y su empleo en medicamentos | |
| JP2014043437A5 (ja) | 有機化合物 | |
| EP2020617A3 (en) | Resist composition containing a sulfonium compound, pattern-forming method using the resist composition, and sulfonium compound | |
| DE60000442D1 (de) | Aus beta-phosphorylierte nitroxiden abkömmige alkoxyamine, ihre verwendung fur radikal polymerisation | |
| PE20010751A1 (es) | Quinolin-2-ona como inhibidores de las proteinas resistentes a multiples farmacos | |
| NO20022021L (no) | Indeno-, nafto- og benzocyklohepta-dihydrotiazolderivater, fremstilling av de samme og deres anvendelse somanoreksilegemidler | |
| EA200600485A1 (ru) | Способ получения производных 2-оксо-1-пирролидина | |
| AR049681A1 (es) | Macrolidos preparados a partir de actinomicetos. composiciones farmaceuticas | |
| CN104803994A (zh) | 一种单组分的可见光引发剂及其制备方法 | |
| CY1107101T1 (el) | Μεθοδος συνθεσης παραγωγων της 1,3-διϋδρο-2h-3-βενζαζεπιν-2-ονης και εφαρμογη στη συνθεση της ιβαβραδινης και των αλατων προσθηκης με φαρμακευτικως αποδεκτο οξυ | |
| EA200602169A1 (ru) | Способ получения производных 2-оксо-1-пирролидина внутримолекулярным аллилированием | |
| DE602005003369D1 (de) | Neue sequenz um die expression einer nukleinsäure zu erhöhen | |
| BRPI0518958B8 (pt) | método para produzir um derivado de biopterina, 1;2'-0- diacetil-l-biopterina e l-biopterina | |
| JP2003121999A5 (OSRAM) | ||
| JP2007112769A5 (OSRAM) | ||
| DE60131176D1 (de) | Fluoreszierende verbindungen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |