ATE421165T1 - Einrichtung und verfahren zur nassbehandlung scheibenförmiger artikel - Google Patents
Einrichtung und verfahren zur nassbehandlung scheibenförmiger artikelInfo
- Publication number
- ATE421165T1 ATE421165T1 AT04720127T AT04720127T ATE421165T1 AT E421165 T1 ATE421165 T1 AT E421165T1 AT 04720127 T AT04720127 T AT 04720127T AT 04720127 T AT04720127 T AT 04720127T AT E421165 T1 ATE421165 T1 AT E421165T1
- Authority
- AT
- Austria
- Prior art keywords
- disc
- shaped articles
- wet treatment
- level
- collector levels
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT4442003 | 2003-03-20 | ||
EP04720127A EP1609172B1 (de) | 2003-03-20 | 2004-03-12 | Einrichtung und verfahren zur nassbehandlung scheibenförmiger artikel |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE421165T1 true ATE421165T1 (de) | 2009-01-15 |
Family
ID=32996818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04720127T ATE421165T1 (de) | 2003-03-20 | 2004-03-12 | Einrichtung und verfahren zur nassbehandlung scheibenförmiger artikel |
Country Status (9)
Country | Link |
---|---|
US (2) | US7837803B2 (de) |
EP (1) | EP1609172B1 (de) |
JP (1) | JP4441530B2 (de) |
KR (1) | KR101039765B1 (de) |
CN (1) | CN100447943C (de) |
AT (1) | ATE421165T1 (de) |
DE (1) | DE602004019061D1 (de) |
TW (1) | TWI257881B (de) |
WO (1) | WO2004084278A1 (de) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6129973A (en) * | 1994-07-29 | 2000-10-10 | Battelle Memorial Institute | Microchannel laminated mass exchanger and method of making |
JP2007180379A (ja) * | 2005-12-28 | 2007-07-12 | Ses Co Ltd | 基板処理方法及び基板処理装置 |
KR100687011B1 (ko) | 2006-01-13 | 2007-02-26 | 세메스 주식회사 | 기판 처리 장치 |
KR100787996B1 (ko) * | 2006-06-16 | 2007-12-21 | 세메스 주식회사 | 기판 처리 장치 및 상기 장치로부터 처리액을 회수하는방법 |
TWI359456B (en) * | 2006-12-15 | 2012-03-01 | Lam Res Ag | Device and method for wet treating plate-like arti |
US7849865B2 (en) * | 2007-01-05 | 2010-12-14 | Semitool, Inc. | System for processing a workpiece |
KR100839913B1 (ko) * | 2007-01-12 | 2008-06-19 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
KR100839912B1 (ko) * | 2007-01-12 | 2008-06-20 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
US7972969B2 (en) * | 2008-03-06 | 2011-07-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for thinning a substrate |
US20100258142A1 (en) * | 2009-04-14 | 2010-10-14 | Mark Naoshi Kawaguchi | Apparatus and method for using a viscoelastic cleaning material to remove particles on a substrate |
US9159593B2 (en) * | 2008-06-02 | 2015-10-13 | Lam Research Corporation | Method of particle contaminant removal |
JP5084639B2 (ja) * | 2008-06-30 | 2012-11-28 | 芝浦メカトロニクス株式会社 | スピン処理装置 |
CN101673062B (zh) * | 2008-09-09 | 2011-10-26 | 中芯国际集成电路制造(北京)有限公司 | 一种全湿法去胶的装置 |
TWI419220B (zh) * | 2008-12-12 | 2013-12-11 | Grand Plastic Technology Co Ltd | 具有移動式洩液槽之清洗蝕刻機台 |
CN101992165B (zh) * | 2009-08-27 | 2012-10-24 | 沈阳芯源微电子设备有限公司 | 一种用于圆形薄片状物体进行化学液喷洒处理的装置 |
JP5318010B2 (ja) * | 2010-03-26 | 2013-10-16 | 大日本スクリーン製造株式会社 | 基板処理装置 |
US8501025B2 (en) | 2010-03-31 | 2013-08-06 | Dainippon Screen Mfg. Co., Ltd. | Substrate treatment apparatus and substrate treatment method |
KR101592058B1 (ko) * | 2010-06-03 | 2016-02-05 | 도쿄엘렉트론가부시키가이샤 | 기판 액처리 장치 |
TWI421928B (zh) * | 2010-06-10 | 2014-01-01 | Grand Plastic Technology Co Ltd | 清洗蝕刻機台之自動清洗方法 |
US8926788B2 (en) * | 2010-10-27 | 2015-01-06 | Lam Research Ag | Closed chamber for wafer wet processing |
US20120286481A1 (en) * | 2011-05-13 | 2012-11-15 | Lam Research Ag | Device and process for liquid treatment of wafer shaped articles |
US8997764B2 (en) | 2011-05-27 | 2015-04-07 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
US20130008602A1 (en) * | 2011-07-07 | 2013-01-10 | Lam Research Ag | Apparatus for treating a wafer-shaped article |
US10269615B2 (en) | 2011-09-09 | 2019-04-23 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
US9355883B2 (en) | 2011-09-09 | 2016-05-31 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
US8894877B2 (en) | 2011-10-19 | 2014-11-25 | Lam Research Ag | Method, apparatus and composition for wet etching |
US9484229B2 (en) | 2011-11-14 | 2016-11-01 | Lam Research Ag | Device and method for processing wafer-shaped articles |
CN103357637B (zh) * | 2012-03-31 | 2016-06-22 | 弘塑科技股份有限公司 | 清洗蚀刻机台移动式泄液槽的排气装置 |
US20140053982A1 (en) * | 2012-08-23 | 2014-02-27 | Lam Research Ag | Method and apparatus for processing wafer-shaped articles |
US9316443B2 (en) | 2012-08-23 | 2016-04-19 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
US9147593B2 (en) | 2012-10-10 | 2015-09-29 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
US9748120B2 (en) | 2013-07-01 | 2017-08-29 | Lam Research Ag | Apparatus for liquid treatment of disc-shaped articles and heating system for use in such apparatus |
US9093482B2 (en) | 2012-10-12 | 2015-07-28 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
US9589818B2 (en) | 2012-12-20 | 2017-03-07 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles and liquid control ring for use in same |
US10134611B2 (en) | 2013-03-22 | 2018-11-20 | Lam Research Ag | Collector for use with an apparatus for treating wafer-shaped articles |
US10707099B2 (en) | 2013-08-12 | 2020-07-07 | Veeco Instruments Inc. | Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle |
US9768041B2 (en) | 2013-08-12 | 2017-09-19 | Veeco Precision Surface Processing Llc | Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle |
US9698029B2 (en) | 2014-02-19 | 2017-07-04 | Lam Research Ag | Method and apparatus for processing wafer-shaped articles |
US9779979B2 (en) * | 2014-02-24 | 2017-10-03 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
US9786524B2 (en) * | 2014-04-15 | 2017-10-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Developing unit with multi-switch exhaust control for defect reduction |
KR101681183B1 (ko) * | 2014-07-11 | 2016-12-02 | 세메스 주식회사 | 기판 처리 장치 |
US9500405B2 (en) | 2014-10-28 | 2016-11-22 | Lam Research Ag | Convective wafer heating by impingement with hot gas |
JP6715019B2 (ja) * | 2016-02-09 | 2020-07-01 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
CN107093567B (zh) * | 2016-02-18 | 2019-08-06 | 顶程国际股份有限公司 | 环状液体收集装置 |
US9972514B2 (en) | 2016-03-07 | 2018-05-15 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
TWI797121B (zh) * | 2017-04-25 | 2023-04-01 | 美商維克儀器公司 | 半導體晶圓製程腔體 |
US10618085B2 (en) | 2017-05-31 | 2020-04-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and methods for exhaust cleaning |
CN107968061A (zh) * | 2017-11-21 | 2018-04-27 | 长江存储科技有限责任公司 | 晶圆清洗液回收装置 |
US11244841B2 (en) | 2017-12-01 | 2022-02-08 | Elemental Scientific, Inc. | Systems for integrated decomposition and scanning of a semiconducting wafer |
KR102139605B1 (ko) * | 2018-11-06 | 2020-08-12 | 세메스 주식회사 | 기판 처리 방법 및 기판 처리 장치 |
GB201820270D0 (en) | 2018-12-12 | 2019-01-30 | Lam Res Ag | Method and apparatus for treating semiconductor substrate |
TWI718529B (zh) * | 2019-05-06 | 2021-02-11 | 弘塑科技股份有限公司 | 單晶圓濕處理設備 |
TWI711491B (zh) * | 2020-01-03 | 2020-12-01 | 弘塑科技股份有限公司 | 基板濕處理設備及回收環 |
Family Cites Families (20)
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US140949A (en) * | 1873-07-15 | Improvement in match-boxes | ||
JPS63295696A (ja) * | 1987-05-27 | 1988-12-02 | Mitsubishi Electric Corp | 陰極線管用螢光体 |
AT389959B (de) * | 1987-11-09 | 1990-02-26 | Sez Semiconduct Equip Zubehoer | Vorrichtung zum aetzen von scheibenfoermigen gegenstaenden, insbesondere von siliziumscheiben |
US5070813A (en) * | 1989-02-10 | 1991-12-10 | Tokyo Electron Limited | Coating apparatus |
US5273589A (en) | 1992-07-10 | 1993-12-28 | Griswold Bradley L | Method for low pressure rinsing and drying in a process chamber |
KR100284559B1 (ko) | 1994-04-04 | 2001-04-02 | 다카시마 히로시 | 처리방법 및 처리장치 |
KR0164007B1 (ko) * | 1994-04-06 | 1999-02-01 | 이시다 아키라 | 미세 패턴화된 레지스트막을 가지는 기판의 건조처리방법 및 장치 |
TW306011B (de) * | 1995-04-19 | 1997-05-21 | Tokyo Electron Co Ltd | |
JPH09243419A (ja) | 1996-03-12 | 1997-09-19 | Rion Co Ltd | 液体試料の吸引装置 |
US6027602A (en) * | 1997-08-29 | 2000-02-22 | Techpoint Pacific Singapore Pte. Ltd. | Wet processing apparatus |
JP3708690B2 (ja) | 1997-09-12 | 2005-10-19 | 大日本スクリーン製造株式会社 | 基板現像装置 |
DE19807460A1 (de) * | 1998-02-21 | 1999-04-15 | Sez Semiconduct Equip Zubehoer | Ringförmige Aufnahme für einen rotierenden Träger |
JP2001044164A (ja) | 1999-07-26 | 2001-02-16 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001077082A (ja) | 1999-09-06 | 2001-03-23 | Takata Corp | 処理液回収用チャンバー構造 |
JP4426036B2 (ja) | 1999-12-02 | 2010-03-03 | 東京エレクトロン株式会社 | 基板処理装置 |
JP2002305177A (ja) * | 2001-02-01 | 2002-10-18 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP4531998B2 (ja) | 2001-02-21 | 2010-08-25 | Okiセミコンダクタ株式会社 | 廃液分離回収システム及び廃液分離回収方法 |
JP2002329705A (ja) | 2001-04-26 | 2002-11-15 | Shibaura Mechatronics Corp | スピン処理装置 |
US7074726B2 (en) * | 2002-01-31 | 2006-07-11 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating method and substrate treating apparatus |
US7584760B2 (en) | 2002-09-13 | 2009-09-08 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus |
-
2004
- 2004-03-12 JP JP2006506699A patent/JP4441530B2/ja not_active Expired - Fee Related
- 2004-03-12 US US10/549,620 patent/US7837803B2/en active Active
- 2004-03-12 WO PCT/IB2004/050238 patent/WO2004084278A1/en active Application Filing
- 2004-03-12 EP EP04720127A patent/EP1609172B1/de not_active Expired - Lifetime
- 2004-03-12 KR KR1020057017287A patent/KR101039765B1/ko active IP Right Grant
- 2004-03-12 DE DE602004019061T patent/DE602004019061D1/de not_active Expired - Lifetime
- 2004-03-12 CN CNB2004800075981A patent/CN100447943C/zh not_active Expired - Fee Related
- 2004-03-12 AT AT04720127T patent/ATE421165T1/de active
- 2004-03-16 TW TW093107000A patent/TWI257881B/zh active
-
2010
- 2010-01-04 US US12/651,530 patent/US8955529B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7837803B2 (en) | 2010-11-23 |
CN100447943C (zh) | 2008-12-31 |
DE602004019061D1 (de) | 2009-03-05 |
WO2004084278A1 (en) | 2004-09-30 |
JP2006521013A (ja) | 2006-09-14 |
CN1762041A (zh) | 2006-04-19 |
EP1609172B1 (de) | 2009-01-14 |
TW200422113A (en) | 2004-11-01 |
US20070175500A1 (en) | 2007-08-02 |
KR20050107806A (ko) | 2005-11-15 |
US20100101424A1 (en) | 2010-04-29 |
US8955529B2 (en) | 2015-02-17 |
JP4441530B2 (ja) | 2010-03-31 |
KR101039765B1 (ko) | 2011-06-09 |
TWI257881B (en) | 2006-07-11 |
EP1609172A1 (de) | 2005-12-28 |
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