ATE359539T1 - Metallischer integral-dünnschichtresistor mit verbesserter toleranz und vereinfachter verarbeitung - Google Patents

Metallischer integral-dünnschichtresistor mit verbesserter toleranz und vereinfachter verarbeitung

Info

Publication number
ATE359539T1
ATE359539T1 AT99939643T AT99939643T ATE359539T1 AT E359539 T1 ATE359539 T1 AT E359539T1 AT 99939643 T AT99939643 T AT 99939643T AT 99939643 T AT99939643 T AT 99939643T AT E359539 T1 ATE359539 T1 AT E359539T1
Authority
AT
Austria
Prior art keywords
dielectric layer
resistive film
unpolymerized
layer
thin film
Prior art date
Application number
AT99939643T
Other languages
German (de)
English (en)
Inventor
Gregory J Dunn
Jovica Savic
Allyson Beuhler
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Application granted granted Critical
Publication of ATE359539T1 publication Critical patent/ATE359539T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/167—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed resistors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/07—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by resistor foil bonding, e.g. cladding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0302—Properties and characteristics in general
    • H05K2201/0317—Thin film conductor layer; Thin film passive component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09881—Coating only between conductors, i.e. flush with the conductors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0147—Carriers and holders
    • H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1461—Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Conductive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
AT99939643T 1998-07-07 1999-06-29 Metallischer integral-dünnschichtresistor mit verbesserter toleranz und vereinfachter verarbeitung ATE359539T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/111,189 US6232042B1 (en) 1998-07-07 1998-07-07 Method for manufacturing an integral thin-film metal resistor

Publications (1)

Publication Number Publication Date
ATE359539T1 true ATE359539T1 (de) 2007-05-15

Family

ID=22337051

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99939643T ATE359539T1 (de) 1998-07-07 1999-06-29 Metallischer integral-dünnschichtresistor mit verbesserter toleranz und vereinfachter verarbeitung

Country Status (7)

Country Link
US (1) US6232042B1 (fr)
EP (1) EP1053507B1 (fr)
JP (1) JP2002520809A (fr)
AT (1) ATE359539T1 (fr)
DE (1) DE69935780T2 (fr)
TW (1) TW425579B (fr)
WO (1) WO2000002088A1 (fr)

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US6194990B1 (en) * 1999-03-16 2001-02-27 Motorola, Inc. Printed circuit board with a multilayer integral thin-film metal resistor and method therefor
US6212078B1 (en) * 1999-10-27 2001-04-03 Microcoating Technologies Nanolaminated thin film circuitry materials
JP3760731B2 (ja) * 2000-07-11 2006-03-29 ソニーケミカル株式会社 バンプ付き配線回路基板及びその製造方法
US6738600B1 (en) * 2000-08-04 2004-05-18 Harris Corporation Ceramic microelectromechanical structure
US6680668B2 (en) * 2001-01-19 2004-01-20 Vishay Intertechnology, Inc. Fast heat rise resistor using resistive foil
US6727780B2 (en) * 2001-10-24 2004-04-27 Sun Microsystems, Inc. Adding electrical resistance in series with bypass capacitors using annular resistors
JP2003332749A (ja) * 2002-01-11 2003-11-21 Denso Corp 受動素子内蔵基板、その製造方法及び受動素子内蔵基板形成用素板
US6751113B2 (en) * 2002-03-07 2004-06-15 Netlist, Inc. Arrangement of integrated circuits in a memory module
US6682989B1 (en) * 2002-11-20 2004-01-27 Intel Corporation Plating a conductive material on a dielectric material
US20040192039A1 (en) * 2003-03-27 2004-09-30 E Touch Corporation Method of fabricating a multi-layer circuit structure having embedded polymer resistors
US20040187297A1 (en) * 2003-03-27 2004-09-30 E Touch Corporation Method of fabricating a polymer resistor in an interconnection via
US20050086037A1 (en) * 2003-09-29 2005-04-21 Pauley Robert S. Memory device load simulator
US20050018495A1 (en) * 2004-01-29 2005-01-27 Netlist, Inc. Arrangement of integrated circuits in a memory module
US7122898B1 (en) * 2005-05-09 2006-10-17 International Business Machines Corporation Electrical programmable metal resistor
US7314786B1 (en) * 2006-06-16 2008-01-01 International Business Machines Corporation Metal resistor, resistor material and method
US7488682B2 (en) * 2006-10-03 2009-02-10 International Business Machines Corporation High-density 3-dimensional resistors
CN101227800B (zh) * 2008-02-03 2011-05-04 华为终端有限公司 一种实现高精度埋阻的方法及装置
WO2010027145A1 (fr) * 2008-09-05 2010-03-11 (주) 탑엔지니어링 Carte sonde mems et procede de fabrication associe
US8530320B2 (en) 2011-06-08 2013-09-10 International Business Machines Corporation High-nitrogen content metal resistor and method of forming same
US9972671B2 (en) 2016-04-19 2018-05-15 International Business Machines Corporation Metal resistors having varying resistivity
US9985088B2 (en) 2016-04-19 2018-05-29 International Business Machines Corporation Metal resistors having nitridized metal surface layers with different nitrogen content
US10020358B2 (en) 2016-04-19 2018-07-10 International Business Machines Corporation Metal resistors having nitridized dielectric surface layers and nitridized metal surface layers
US9824967B1 (en) 2016-07-28 2017-11-21 International Business Machines Corporation Semiconductor resistor structures embedded in a middle-of-the-line (MOL) dielectric
US9831301B1 (en) 2016-09-19 2017-11-28 International Business Machines Corporation Metal resistor structures with nitrogen content
US9853025B1 (en) 2016-10-14 2017-12-26 International Business Machines Corporation Thin film metallic resistors formed by surface treatment of insulating layer
US9991330B1 (en) 2017-01-11 2018-06-05 International Business Machines Corporation Resistors with controlled resistivity
US9972672B1 (en) 2017-01-11 2018-05-15 International Business Machines Corporation Tunable resistor with curved resistor elements
US10283583B2 (en) * 2017-01-11 2019-05-07 International Business Machines Corporation 3D resistor structure with controlled resistivity
CN112055460B (zh) * 2020-09-01 2022-12-06 王川川 电阻材料、含有电阻层的覆铜板及印刷电路板的制作方法

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US3719508A (en) * 1971-11-16 1973-03-06 Shipley Co Electroless nickel solution
US4888574A (en) 1985-05-29 1989-12-19 501 Ohmega Electronics, Inc. Circuit board material and method of making
US4786564A (en) * 1987-02-25 1988-11-22 Komag, Inc. Method for manufacturing a magnetic disk having reduced bit shift, minimized noise, increased resolution and uniform magnetic characteristics, and the resulting disk
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Also Published As

Publication number Publication date
EP1053507A1 (fr) 2000-11-22
DE69935780T2 (de) 2007-12-27
TW425579B (en) 2001-03-11
JP2002520809A (ja) 2002-07-09
EP1053507B1 (fr) 2007-04-11
EP1053507A4 (fr) 2002-07-24
US6232042B1 (en) 2001-05-15
WO2000002088A1 (fr) 2000-01-13
DE69935780D1 (de) 2007-05-24

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