ATE3307T1 - Vorrichtung und verfahren zur vakuumbeschichtung. - Google Patents

Vorrichtung und verfahren zur vakuumbeschichtung.

Info

Publication number
ATE3307T1
ATE3307T1 AT80200388T AT80200388T ATE3307T1 AT E3307 T1 ATE3307 T1 AT E3307T1 AT 80200388 T AT80200388 T AT 80200388T AT 80200388 T AT80200388 T AT 80200388T AT E3307 T1 ATE3307 T1 AT E3307T1
Authority
AT
Austria
Prior art keywords
chamber system
working chamber
substrates
moved
coated
Prior art date
Application number
AT80200388T
Other languages
English (en)
Inventor
Robert Bruce Love
Original Assignee
Advanced Coating Technology, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21875863&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE3307(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Advanced Coating Technology, Inc. filed Critical Advanced Coating Technology, Inc.
Application granted granted Critical
Publication of ATE3307T1 publication Critical patent/ATE3307T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT80200388T 1979-04-30 1980-04-28 Vorrichtung und verfahren zur vakuumbeschichtung. ATE3307T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/034,347 US4274936A (en) 1979-04-30 1979-04-30 Vacuum deposition system and method
EP80200388A EP0018690B2 (de) 1979-04-30 1980-04-28 Vorrichtung und Verfahren zur Vakuumbeschichtung

Publications (1)

Publication Number Publication Date
ATE3307T1 true ATE3307T1 (de) 1983-05-15

Family

ID=21875863

Family Applications (1)

Application Number Title Priority Date Filing Date
AT80200388T ATE3307T1 (de) 1979-04-30 1980-04-28 Vorrichtung und verfahren zur vakuumbeschichtung.

Country Status (8)

Country Link
US (1) US4274936A (de)
EP (1) EP0018690B2 (de)
JP (1) JPS55148768A (de)
AT (1) ATE3307T1 (de)
CA (1) CA1140002A (de)
DE (2) DE3016069A1 (de)
GB (1) GB2051136A (de)
ZA (1) ZA802395B (de)

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US4423701A (en) * 1982-03-29 1984-01-03 Energy Conversion Devices, Inc. Glow discharge deposition apparatus including a non-horizontally disposed cathode
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US4490227A (en) * 1982-11-03 1984-12-25 Donnelly Mirrors, Inc. Process for making a curved, conductively coated glass member and the product thereof
US4650557A (en) * 1982-11-03 1987-03-17 Donnelly Corporation Process for making a conductively coated glass member and the product thereof
JPS6052574A (ja) * 1983-09-02 1985-03-25 Hitachi Ltd 連続スパツタ装置
US5780313A (en) 1985-02-14 1998-07-14 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device
US6784033B1 (en) 1984-02-15 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Method for the manufacture of an insulated gate field effect semiconductor device
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US4790921A (en) * 1984-10-12 1988-12-13 Hewlett-Packard Company Planetary substrate carrier method and apparatus
US4576830A (en) * 1984-11-05 1986-03-18 Chronar Corp. Deposition of materials
US5021138A (en) * 1985-01-17 1991-06-04 Babu Suryadevara V Side source center sink plasma reactor
US4663009A (en) * 1985-02-08 1987-05-05 Hewlett-Packard Company System and method for depositing plural thin film layers on a substrate
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
KR900008252B1 (ko) * 1985-05-09 1990-11-06 씨게이트 테크놀러지 인-라인 디스크 스퍼터링 시스템에서 물체 이송 장치 및 처리 방법
US5044314A (en) * 1986-10-15 1991-09-03 Advantage Production Technology, Inc. Semiconductor wafer processing apparatus
US4885074A (en) * 1987-02-24 1989-12-05 International Business Machines Corporation Plasma reactor having segmented electrodes
JPS6411320A (en) * 1987-07-06 1989-01-13 Toshiba Corp Photo-cvd device
DE3731444A1 (de) * 1987-09-18 1989-03-30 Leybold Ag Vorrichtung zum beschichten von substraten
JP2714833B2 (ja) * 1988-12-18 1998-02-16 日本真空技術株式会社 仕込・取出室
JPH0733576B2 (ja) * 1989-11-29 1995-04-12 株式会社日立製作所 スパツタ装置、及びターゲツト交換装置、並びにその交換方法
DE4111384C2 (de) * 1991-04-09 1999-11-04 Leybold Ag Vorrichtung zur Beschichtung von Substraten
DE4303462C2 (de) * 1992-03-30 1994-03-31 Leybold Ag Mehrkammerbeschichtungsanlage
DE4325011A1 (de) * 1993-07-28 1995-03-02 Herlitz Michael Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
US5738767A (en) * 1994-01-11 1998-04-14 Intevac, Inc. Substrate handling and processing system for flat panel displays
US5660114A (en) * 1995-05-10 1997-08-26 Seagate Technology, Inc. Transport system for thin film sputtering system
JPH0950992A (ja) * 1995-08-04 1997-02-18 Sharp Corp 成膜装置
WO1997039160A1 (fr) * 1996-04-18 1997-10-23 Kabushiki Kaisha Toshiba Appareil et procede de production d'un tube cathodique
DE19808163C1 (de) * 1998-02-27 1999-07-15 Ardenne Anlagentech Gmbh Schleusensystem für die Überführungskammer einer Vakuumbeschichtungsanlage
EP1221526A1 (de) * 2001-01-09 2002-07-10 Emil BÄCHLI Verfahren zur Herstellung von wärmeisolierenden Bau- und/oder Lichtelementen sowie Einrichtung zur Durchführung desselben
US6500264B2 (en) 2001-04-06 2002-12-31 Wafermasters, Inc. Continuous thermal evaporation system
US6524463B2 (en) 2001-07-16 2003-02-25 Technic, Inc. Method of processing wafers and other planar articles within a processing cell
US6558750B2 (en) 2001-07-16 2003-05-06 Technic Inc. Method of processing and plating planar articles
US7832177B2 (en) 2002-03-22 2010-11-16 Electronics Packaging Solutions, Inc. Insulated glazing units
US6962834B2 (en) 2002-03-22 2005-11-08 Stark David H Wafer-level hermetic micro-device packages
DE102004008598B4 (de) * 2004-02-21 2006-12-28 Applied Films Gmbh & Co. Kg Verfahren für den Betrieb einer Inline-Beschichtungsanlage
EP1582606A1 (de) * 2004-03-25 2005-10-05 Applied Films GmbH & Co. KG Vakuumbehandlungsanlage mit variabler Pumpanordnung
KR20090110863A (ko) * 2007-02-01 2009-10-22 윌라드 앤드 켈시 솔라 그룹, 엘엘씨 유리 시트 반도체 코팅을 위한 시스템과 방법
WO2009036359A1 (en) * 2007-09-14 2009-03-19 Electronics Packaging Solutions, Inc. Insulating glass unit having multi-height internal standoffs and visible decoration
WO2010019484A2 (en) * 2008-08-09 2010-02-18 Eversealed Windows, Inc. Asymmetrical flexible edge seal for vacuum insulating glass
US8329267B2 (en) * 2009-01-15 2012-12-11 Eversealed Windows, Inc. Flexible edge seal for vacuum insulating glazing units
US8512830B2 (en) * 2009-01-15 2013-08-20 Eversealed Windows, Inc. Filament-strung stand-off elements for maintaining pane separation in vacuum insulating glazing units
US9051650B2 (en) 2009-01-16 2015-06-09 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US9297064B2 (en) * 2009-01-16 2016-03-29 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US9664974B2 (en) 2009-03-31 2017-05-30 View, Inc. Fabrication of low defectivity electrochromic devices
DE102009020512B4 (de) * 2009-05-08 2017-07-27 Von Ardenne Gmbh Durchlauf-Vakuumbeschichtungsanlage
CN102859655A (zh) * 2010-04-30 2013-01-02 应用材料公司 垂直直列cvd系统
WO2011153381A2 (en) 2010-06-02 2011-12-08 Eversealed Windows, Inc. Multi-pane glass unit having seal with adhesive and hermetic coating layer
CN102337510A (zh) * 2010-07-23 2012-02-01 鸿富锦精密工业（深圳）有限公司 连续真空镀膜方法
US9328512B2 (en) 2011-05-05 2016-05-03 Eversealed Windows, Inc. Method and apparatus for an insulating glazing unit and compliant seal for an insulating glazing unit
KR20200035328A (ko) 2011-12-12 2020-04-02 뷰, 인크. 박막 디바이스 및 제조
EP2650135A1 (de) * 2012-04-12 2013-10-16 KBA-NotaSys SA Intaglio-Druckplattenbeschichtungsvorrichtung
CN107099773B (zh) * 2016-02-22 2019-04-09 蓝思科技（长沙）有限公司 一种多功能连续溅射镀膜线及其镀膜方法与镀膜控制方法
CN109913844A (zh) * 2017-12-12 2019-06-21 湘潭宏大真空技术股份有限公司 用于大面积azo透明导电玻璃的磁控溅射镀膜生产线
CN109957777A (zh) * 2017-12-14 2019-07-02 湘潭宏大真空技术股份有限公司 Tft-lcd减薄镀膜生产线

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US2925062A (en) * 1953-05-15 1960-02-16 Heraeus Gmbh W C Coating apparatus
US3294670A (en) * 1963-10-07 1966-12-27 Western Electric Co Apparatus for processing materials in a controlled atmosphere
US3521765A (en) * 1967-10-31 1970-07-28 Western Electric Co Closed-end machine for processing articles in a controlled atmosphere
US3584847A (en) * 1968-05-31 1971-06-15 Western Electric Co Advancing workpieces through a sputtering chamber
US3673981A (en) * 1969-05-13 1972-07-04 Libbey Owens Ford Co Filming apparatus
US3907660A (en) * 1970-07-31 1975-09-23 Ppg Industries Inc Apparatus for coating glass
GB1321640A (en) * 1970-12-05 1973-06-27 Hunt C J L Vacuum metallising or vacuum coating
FR2132033B1 (de) * 1971-04-02 1975-10-24 Delog Detag Flachglas Ag
FR2202169B2 (de) * 1972-10-07 1977-05-27 Delog Detag Flachglas Ag
DE2253769C3 (de) * 1972-11-02 1979-07-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Kathodenzerstäubungsanlage mit kontinuierlichem Substratdurchlauf
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US3925182A (en) * 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products

Also Published As

Publication number Publication date
US4274936A (en) 1981-06-23
GB2051136A (en) 1981-01-14
CA1140002A (en) 1983-01-25
ZA802395B (en) 1981-04-29
DE3016069A1 (de) 1980-11-13
DE3063058D1 (en) 1983-06-16
EP0018690B2 (de) 1993-07-14
EP0018690B1 (de) 1983-05-11
JPS55148768A (en) 1980-11-19
EP0018690A1 (de) 1980-11-12

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee