GB1466790A - Deposition of layers in a vacuum - Google Patents

Deposition of layers in a vacuum

Info

Publication number
GB1466790A
GB1466790A GB4882374A GB4882374A GB1466790A GB 1466790 A GB1466790 A GB 1466790A GB 4882374 A GB4882374 A GB 4882374A GB 4882374 A GB4882374 A GB 4882374A GB 1466790 A GB1466790 A GB 1466790A
Authority
GB
United Kingdom
Prior art keywords
station
layers
nov
articles
working chambers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4882374A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of GB1466790A publication Critical patent/GB1466790A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1466790 Rotary vacuum coating apparatus BALZERS PATENT- & BETEILIGUNGS AG 12 Nov 1974 [22 Nov 1973] 48823/74 Heading C7F A rotary table 3 carries articles, which may be supported on a carrier 9, through stages where the articles are inserted, removed, coated by sputtering or vapour deposition, as shown, with one or more layers, heated cooled or impinged with ions or electrons. At each station a wall 5 on the table 3 forms part of the working chamber in which the process takes place. The main chamber and the working chambers formed at each station are separately evacuable. The working chambers are closed at each station by a movable plate e.g. 19, 23.
GB4882374A 1973-11-22 1974-11-12 Deposition of layers in a vacuum Expired GB1466790A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1660273A CH573985A5 (en) 1973-11-22 1973-11-22

Publications (1)

Publication Number Publication Date
GB1466790A true GB1466790A (en) 1977-03-09

Family

ID=4418700

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4882374A Expired GB1466790A (en) 1973-11-22 1974-11-12 Deposition of layers in a vacuum

Country Status (6)

Country Link
US (1) US3915117A (en)
CH (1) CH573985A5 (en)
DE (1) DE2454544C4 (en)
FR (1) FR2252419B1 (en)
GB (1) GB1466790A (en)
NL (1) NL165224C (en)

Cited By (3)

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GB2137662A (en) * 1979-12-21 1984-10-10 Varian Associates Substrate processing apparatus
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
CN110218976A (en) * 2019-07-17 2019-09-10 南通职业大学 A kind of components automatic film coating device

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DE2740129A1 (en) * 1976-09-18 1978-03-23 Claude John Lancelot Hunt METAL FUMING METHOD AND DEVICE
US4226208A (en) * 1977-08-04 1980-10-07 Canon Kabushiki Kaisha Vapor deposition apparatus
DE2847632A1 (en) * 1977-11-19 1979-05-23 Claude John Lancelot Hunt VACUUM METALLIZING DEVICE
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
DE2940064A1 (en) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln VACUUM EVAPORATION SYSTEM WITH A VALVE CHAMBER, A STEAMING CHAMBER AND AN EVAPORATOR CHAMBER
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
JPS58197262A (en) * 1982-05-13 1983-11-16 Canon Inc Mass production type vacuum apparatus for forming film
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
DE3448599B4 (en) * 1983-11-28 2004-04-08 Hitachi, Ltd. Vacuum equipment esp. for IC prodn.
JPS60184678A (en) * 1984-03-02 1985-09-20 Canon Inc Vacuum treating device
JPS61291032A (en) * 1985-06-17 1986-12-20 Fujitsu Ltd Vacuum apparatus
DE3788973T2 (en) * 1986-04-04 1994-08-11 Materials Research Corp Method and device for handling and treating disc-like materials.
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
DE3716498C2 (en) * 1987-05-16 1994-08-04 Leybold Ag Device for introducing and removing workpieces into a coating chamber
DE3735284A1 (en) * 1987-10-17 1989-04-27 Leybold Ag DEVICE ACCORDING TO THE CAROUSEL PRINCIPLE FOR COATING SUBSTRATES
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
DE59001747D1 (en) * 1989-03-30 1993-07-22 Leybold Ag DEVICE FOR INPUTING AND EXHAUSTING A WORKPIECE IN A VACUUM CHAMBER.
DE4009603A1 (en) * 1989-03-30 1990-10-04 Leybold Ag Lock chamber for substrate
US5259942A (en) * 1989-03-30 1993-11-09 Leybold Aktiengesellschaft Device for transferring a workpiece into and out from a vacuum chamber
IT1232241B (en) * 1989-09-11 1992-01-28 Cetev Cent Tecnolog Vuoto FAST LOADING DEVICE FOR SUBSTRATES IN VACUUM PLANTS
JP3466607B2 (en) * 1989-09-13 2003-11-17 ソニー株式会社 Sputtering equipment
US5002010A (en) * 1989-10-18 1991-03-26 Varian Associates, Inc. Vacuum vessel
EP0448782B1 (en) * 1990-03-26 1993-06-16 Leybold Aktiengesellschaft Apparatus for loading and unloading an article into a vacuum chamber
EP0449227B1 (en) * 1990-03-30 1995-03-15 Sony Corporation Sputtering apparatus
JP2913745B2 (en) * 1990-04-10 1999-06-28 松下電器産業株式会社 Vacuum deposition equipment
DE4117969C2 (en) * 1991-05-31 2000-11-09 Balzers Ag Liechtenstein Vacuum chamber
CH691377A5 (en) * 1992-10-06 2001-07-13 Unaxis Balzers Ag Chamber arrangement for transporting workpieces and their use.
EP0591706B1 (en) * 1992-10-06 2002-04-24 Unaxis Balzers Aktiengesellschaft Chamber for transport of substrates
DE4235677C2 (en) * 1992-10-22 1996-10-31 Balzers Hochvakuum Vacuum chamber, vacuum treatment system with such a chamber and transport processes
DE4235676C2 (en) * 1992-10-22 1997-08-28 Balzers Hochvakuum Vacuum chamber for transporting disk-shaped workpieces in a vacuum system
DE4235674C2 (en) * 1992-10-22 2000-12-28 Balzers Ag Liechtenstein Chamber for the transport of workpieces in a vacuum atmosphere, chamber combination and method for transporting a workpiece
DE4302851A1 (en) * 1993-02-02 1994-08-04 Leybold Ag Device for applying and / or removing a mask on a substrate
DE4341635C2 (en) * 1993-12-07 2002-07-18 Unaxis Deutschland Holding Vacuum coating system
NL1000138C2 (en) * 1995-04-13 1996-10-15 Od & Me Bv Substrate processing devices as well as methods suitable for use with such devices.
US5773088A (en) * 1995-12-05 1998-06-30 Materials Research Group, Inc. Treatment system including vacuum isolated sources and method
DE19624609B4 (en) * 1996-06-20 2009-04-16 Leybold Optics Gmbh Vacuum treatment system for applying thin layers to substrates, for example to headlight reflectors
DE19626861B4 (en) * 1996-07-04 2009-04-16 Leybold Optics Gmbh Vacuum treatment system for applying thin layers to substrates, for example to headlight reflectors
DE19642852A1 (en) * 1996-10-17 1998-04-23 Leybold Systems Gmbh Vacuum treatment system for applying thin layers on three-dimensional, bowl-shaped or prismatic substrates
DE19742923A1 (en) 1997-09-29 1999-04-01 Leybold Systems Gmbh Device for coating a substantially flat, disc-shaped substrate
DE19807031A1 (en) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Air lock for continuous transfer of articles between sealed chambers, especially for vacuum vapor deposition treatment of plastic bottles
EP0943699B1 (en) 1998-02-19 2003-12-17 Applied Films GmbH & Co. KG Load-lock device for transferring substrates in and out of a treatment chamber
US6184132B1 (en) * 1999-08-03 2001-02-06 International Business Machines Corporation Integrated cobalt silicide process for semiconductor devices
US6193804B1 (en) * 1999-10-02 2001-02-27 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for sealing a vacuum chamber
AU2001243246A1 (en) * 2000-03-20 2001-10-03 Tokyo Electron Limited High speed photoresist stripping chamber
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6620252B2 (en) * 2001-10-29 2003-09-16 Thomson Licensing S.A. Metallization module for cathode-ray tube (CRT) applications
JP2008192642A (en) * 2007-01-31 2008-08-21 Tokyo Electron Ltd Substrate processing apparatus
DE102009018700B4 (en) * 2008-09-01 2020-02-13 Singulus Technologies Ag Coating line and method for coating
KR101680295B1 (en) * 2009-03-18 2016-11-29 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트 Vacuum Treatment Apparatus
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
DE102009037290A1 (en) * 2009-04-24 2010-11-11 Singulus Technologies Ag Transport device with a deflectable sealing frame
DE102009060649A1 (en) * 2009-12-22 2011-06-30 EISENMANN Anlagenbau GmbH & Co. KG, 71032 Plant for surface treatment of objects
DE102011114593B4 (en) 2011-09-30 2016-11-03 Manz Ag Transport device for transporting a plurality of substrates into the region of a substrate treatment device and a vacuum treatment device designed in this way
EP2641665A1 (en) * 2012-03-19 2013-09-25 Deceuninck NV Multi-step process for fully coloured construction elements
CN112206947B (en) * 2020-10-16 2021-09-28 泰安市力华液压设备有限公司 Hanging tool for paint spraying machining process of plunger hydraulic oil cylinder and using method of hanging tool

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US1118869A (en) * 1914-11-24 Carl Kugel Annealing furnace.
US1073235A (en) * 1912-06-19 1913-09-16 Hermann Hillebrand Jr Annealing apparatus.
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US2799600A (en) * 1954-08-17 1957-07-16 Noel W Scott Method of producing electrically conducting transparent coatings on optical surfaces
US3473954A (en) * 1965-12-08 1969-10-21 Ethyl Corp Method and apparatus for tunnel plating
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3749383A (en) * 1971-04-29 1973-07-31 Rca Corp Apparatus for processing semiconductor devices
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2137662A (en) * 1979-12-21 1984-10-10 Varian Associates Substrate processing apparatus
GB2137663A (en) * 1979-12-21 1984-10-10 Varian Associates Wafer moving apparatus
GB2137661A (en) * 1979-12-21 1984-10-10 Varian Associates Wafer coating apparatus
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
CN110218976A (en) * 2019-07-17 2019-09-10 南通职业大学 A kind of components automatic film coating device

Also Published As

Publication number Publication date
FR2252419A1 (en) 1975-06-20
US3915117A (en) 1975-10-28
DE2454544A1 (en) 1975-07-31
CH573985A5 (en) 1976-03-31
FR2252419B1 (en) 1980-06-06
NL7400848A (en) 1975-05-26
NL165224B (en) 1980-10-15
DE2454544C3 (en) 1979-03-29
DE2454544B2 (en) 1978-07-13
NL165224C (en) 1981-03-16
DE2454544C4 (en) 1992-07-16

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years

Effective date: 19941111