DE3852500D1 - Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren. - Google Patents

Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren.

Info

Publication number
DE3852500D1
DE3852500D1 DE3852500T DE3852500T DE3852500D1 DE 3852500 D1 DE3852500 D1 DE 3852500D1 DE 3852500 T DE3852500 T DE 3852500T DE 3852500 T DE3852500 T DE 3852500T DE 3852500 D1 DE3852500 D1 DE 3852500D1
Authority
DE
Germany
Prior art keywords
coating device
physical vapor
double coating
vapor deposit
capd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3852500T
Other languages
English (en)
Other versions
DE3852500T2 (de
Inventor
Harbhajan Randhawa
Jeffrey Buske
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Hauzer Techno Coating BV
Original Assignee
Hauzer Industries BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22208873&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3852500(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hauzer Industries BV filed Critical Hauzer Industries BV
Application granted granted Critical
Publication of DE3852500D1 publication Critical patent/DE3852500D1/de
Publication of DE3852500T2 publication Critical patent/DE3852500T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE3852500T 1988-08-25 1988-08-25 Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren. Expired - Lifetime DE3852500T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1988/002950 WO1990002216A1 (en) 1988-08-25 1988-08-25 Physical vapor deposition dual coating apparatus and process

Publications (2)

Publication Number Publication Date
DE3852500D1 true DE3852500D1 (de) 1995-01-26
DE3852500T2 DE3852500T2 (de) 1995-07-27

Family

ID=22208873

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3852500T Expired - Lifetime DE3852500T2 (de) 1988-08-25 1988-08-25 Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren.

Country Status (5)

Country Link
EP (1) EP0403552B1 (de)
JP (1) JP2836876B2 (de)
AT (1) ATE115647T1 (de)
DE (1) DE3852500T2 (de)
WO (1) WO1990002216A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111534804A (zh) * 2020-06-16 2020-08-14 常州市乐萌压力容器有限公司 基于改进灰关联模型的磁控溅射工艺参数优化方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9108553D0 (en) * 1991-04-22 1991-06-05 Ion Coat Ltd Ionised vapour source
CH691776A5 (de) * 1997-04-17 2001-10-15 Bci Bloesch Corp Ag Plasma-Beschichtungs-Verfahren und mit diesem Verfahren herstellbare Arbeitsschichten.
DE10018143C5 (de) † 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
KR100826935B1 (ko) 2001-05-01 2008-05-02 허니웰 인터내셔날 인코포레이티드 티탄 및 지르코늄으로 구성된 장벽층 및 이를 포함하는반도체 구조물
EP1524329A1 (de) * 2003-10-17 2005-04-20 Platit AG Modulare Vorrichtung zur Beschichtung von Oberflächen
JP4500061B2 (ja) * 2004-02-02 2010-07-14 株式会社神戸製鋼所 硬質皮膜の成膜方法
CN100419117C (zh) * 2004-02-02 2008-09-17 株式会社神户制钢所 硬质叠层被膜、其制造方法及成膜装置
DE102004015231B4 (de) * 2004-03-29 2015-12-31 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Behandeln von Substratoberflächen mittels Ladungsträgerbeschuss
DE102006002034A1 (de) 2006-01-13 2007-07-19 Hauzer Techno-Coating B.V. Gegenstand, der ein relativ weiches Trägermaterial und eine relativ harte dekorative Schicht aufweist, sowie Verfahren zu dessen Herstellung
GB2450933A (en) 2007-07-13 2009-01-14 Hauzer Techno Coating Bv Method of providing a hard coating
EP2159821B1 (de) 2008-09-02 2020-01-15 Oerlikon Surface Solutions AG, Pfäffikon Beschichtungsvorrichtung zum Beschichten eines Substrats, sowie ein Verfahren zum Beschichten eines Substrats
CN103103485A (zh) * 2011-11-11 2013-05-15 中国科学院沈阳科学仪器研制中心有限公司 一种带有单冷却自转盘的磁控溅射系统
JP5916581B2 (ja) * 2012-10-12 2016-05-11 株式会社神戸製鋼所 Ｐｖｄ処理方法及びｐｖｄ処理装置
EP2746424B1 (de) 2012-12-21 2018-10-17 Oerlikon Surface Solutions AG, Pfäffikon Verdampfungsquelle
EP2778253B1 (de) 2013-02-26 2018-10-24 Oerlikon Surface Solutions AG, Pfäffikon Zylinderförmige Verdampfungsquelle
JP6000173B2 (ja) 2013-03-19 2016-09-28 株式会社神戸製鋼所 Ｐｖｄ処理装置及びｐｖｄ処理方法
JP6057812B2 (ja) 2013-04-02 2017-01-11 株式会社神戸製鋼所 処理装置及びワークの温度計測方法
RU2562566C2 (ru) * 2013-06-18 2015-09-10 Виталий Степанович Гончаров Установка для вакуумного ионно-плазменного нанесения покрытий
KR20240043891A (ko) * 2022-09-27 2024-04-04 재단법인대구경북과학기술원 마그네트론 스퍼터링 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234622A (en) * 1979-04-11 1980-11-18 The United States Of American As Represented By The Secretary Of The Army Vacuum deposition method
US4500408A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Apparatus for and method of controlling sputter coating
US4560462A (en) * 1984-06-22 1985-12-24 Westinghouse Electric Corp. Apparatus for coating nuclear fuel pellets with a burnable absorber
BG41744A1 (en) * 1984-11-26 1987-08-14 Savov Method for control of chimico= thermic processing of work- pieces with glowing dicharge in medium of processing gas and device for implementing this method
US4814056A (en) * 1987-06-23 1989-03-21 Vac-Tec Systems, Inc. Apparatus for producing graded-composition coatings
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111534804A (zh) * 2020-06-16 2020-08-14 常州市乐萌压力容器有限公司 基于改进灰关联模型的磁控溅射工艺参数优化方法

Also Published As

Publication number Publication date
EP0403552A1 (de) 1990-12-27
JP2836876B2 (ja) 1998-12-14
JPH03502215A (ja) 1991-05-23
EP0403552A4 (en) 1991-12-18
DE3852500T2 (de) 1995-07-27
EP0403552B1 (de) 1994-12-14
WO1990002216A1 (en) 1990-03-08
ATE115647T1 (de) 1994-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HAUZER TECHNO COATING B.V., VENLO, NL

8328 Change in the person/name/address of the agent

Representative=s name: MANITZ, FINSTERWALD & PARTNER GBR, 80336 MUENCHEN

8310 Action for declaration of annulment
8313 Request for invalidation rejected/withdrawn