ATE40575T1 - Vorrichtung zur magnetron-kathodenzerstaeubung. - Google Patents

Vorrichtung zur magnetron-kathodenzerstaeubung.

Info

Publication number
ATE40575T1
ATE40575T1 AT84103049T AT84103049T ATE40575T1 AT E40575 T1 ATE40575 T1 AT E40575T1 AT 84103049 T AT84103049 T AT 84103049T AT 84103049 T AT84103049 T AT 84103049T AT E40575 T1 ATE40575 T1 AT E40575T1
Authority
AT
Austria
Prior art keywords
cathode
central
cathodes
central cathode
cylindrical
Prior art date
Application number
AT84103049T
Other languages
English (en)
Inventor
Harold E Mckelvey
Original Assignee
Boc Group Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Plc filed Critical Boc Group Plc
Application granted granted Critical
Publication of ATE40575T1 publication Critical patent/ATE40575T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Curing Cements, Concrete, And Artificial Stone (AREA)
  • Physical Water Treatments (AREA)
  • Microwave Tubes (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Coating By Spraying Or Casting (AREA)
AT84103049T 1983-03-21 1984-03-20 Vorrichtung zur magnetron-kathodenzerstaeubung. ATE40575T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/477,069 US4417968A (en) 1983-03-21 1983-03-21 Magnetron cathode sputtering apparatus
EP84103049A EP0119631B1 (de) 1983-03-21 1984-03-20 Vorrichtung zur Magnetron-Kathodenzerstäubung

Publications (1)

Publication Number Publication Date
ATE40575T1 true ATE40575T1 (de) 1989-02-15

Family

ID=23894398

Family Applications (1)

Application Number Title Priority Date Filing Date
AT84103049T ATE40575T1 (de) 1983-03-21 1984-03-20 Vorrichtung zur magnetron-kathodenzerstaeubung.

Country Status (11)

Country Link
US (1) US4417968A (de)
EP (1) EP0119631B1 (de)
JP (1) JPS59179785A (de)
AT (1) ATE40575T1 (de)
AU (1) AU567918B2 (de)
CA (1) CA1225364A (de)
DE (1) DE3476563D1 (de)
DK (1) DK160154C (de)
FI (1) FI76123C (de)
IT (1) IT1173906B (de)
NO (1) NO163414C (de)

Families Citing this family (55)

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JPS6011103B2 (ja) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ 電弧金属蒸発装置用の消耗性陰極
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
US4466877A (en) * 1983-10-11 1984-08-21 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
EP0173583B1 (de) * 1984-08-31 1990-12-19 Anelva Corporation Entladungsvorrichtung
US4597847A (en) * 1984-10-09 1986-07-01 Iodep, Inc. Non-magnetic sputtering target
US5215639A (en) * 1984-10-09 1993-06-01 Genus, Inc. Composite sputtering target structures and process for producing such structures
DE3503398A1 (de) * 1985-02-01 1986-08-07 W.C. Heraeus Gmbh, 6450 Hanau Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
US4647361A (en) * 1985-09-03 1987-03-03 International Business Machines Corporation Sputtering apparatus
US4701251A (en) * 1986-02-03 1987-10-20 Bvt Limited Apparatus for sputter coating discs
US4738761A (en) * 1986-10-06 1988-04-19 Microelectronics Center Of North Carolina Shared current loop, multiple field apparatus and process for plasma processing
US4834860A (en) * 1987-07-01 1989-05-30 The Boc Group, Inc. Magnetron sputtering targets
US4842703A (en) * 1988-02-23 1989-06-27 Eaton Corporation Magnetron cathode and method for sputter coating
US5096562A (en) * 1989-11-08 1992-03-17 The Boc Group, Inc. Rotating cylindrical magnetron structure for large area coating
US5047131A (en) * 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
US5108574A (en) * 1991-01-29 1992-04-28 The Boc Group, Inc. Cylindrical magnetron shield structure
AU664995B2 (en) * 1991-04-19 1995-12-14 Surface Solutions, Incorporated Method and apparatus for linear magnetron sputtering
DE4126236C2 (de) * 1991-08-08 2000-01-05 Leybold Ag Rotierende Magnetron-Kathode und Verwendung einer rotierenden Magnetron-Kathode
US5338422A (en) * 1992-09-29 1994-08-16 The Boc Group, Inc. Device and method for depositing metal oxide films
US5286361A (en) * 1992-10-19 1994-02-15 Regents Of The University Of California Magnetically attached sputter targets
EP1251547A1 (de) * 1993-01-15 2002-10-23 The Boc Group, Inc. Abschirmungsstruktur für zylindrischen Magnetron
US5414588A (en) * 1993-09-20 1995-05-09 The Regents Of The University Of California High performance capacitors using nano-structure multilayer materials fabrication
US5571393A (en) * 1994-08-24 1996-11-05 Viratec Thin Films, Inc. Magnet housing for a sputtering cathode
US5527439A (en) * 1995-01-23 1996-06-18 The Boc Group, Inc. Cylindrical magnetron shield structure
US5882810A (en) * 1996-03-08 1999-03-16 The Dow Chemicalcompany Active layer for membrane electrode assembly
US6436252B1 (en) 2000-04-07 2002-08-20 Surface Engineered Products Corp. Method and apparatus for magnetron sputtering
DE10145201C1 (de) * 2001-09-13 2002-11-21 Fraunhofer Ges Forschung Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron-Zerstäuben
DE10221112B4 (de) * 2002-05-03 2008-04-03 Fhr Anlagenbau Gmbh Verfahren zur Herstellung eines metallisch glänzenden Schichtsystems auf einem Substrat und Verwendung des Verfahrens
US20050224343A1 (en) * 2004-04-08 2005-10-13 Richard Newcomb Power coupling for high-power sputtering
EP1594153B1 (de) * 2004-05-05 2010-02-24 Applied Materials GmbH & Co. KG Beschichtungsvorrichtung mit grossflächiger Anordnung von drehbaren Magnetronkathoden
US20060065524A1 (en) * 2004-09-30 2006-03-30 Richard Newcomb Non-bonded rotatable targets for sputtering
US20060096855A1 (en) * 2004-11-05 2006-05-11 Richard Newcomb Cathode arrangement for atomizing a rotatable target pipe
US20060278521A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for controlling ion density and energy using modulated power signals
US20060278524A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for modulating power signals to control sputtering
US8092657B2 (en) * 2005-06-30 2012-01-10 Bekaert Advanced Coatings Module for coating both sides of a substrate in a single pass
CN101297059A (zh) * 2005-10-24 2008-10-29 索莱拉斯有限公司 结合固定或者旋转靶的阴极与移动磁体组件的组合及其应用
US7842355B2 (en) * 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
US20070095281A1 (en) * 2005-11-01 2007-05-03 Stowell Michael W System and method for power function ramping of microwave liner discharge sources
US8236152B2 (en) * 2006-11-24 2012-08-07 Ascentool International Ltd. Deposition system
TWI377264B (en) * 2007-02-05 2012-11-21 Hon Hai Prec Ind Co Ltd Sputtering device
EP2091067A1 (de) 2008-02-14 2009-08-19 Applied Materials, Inc. Vorrichtung zur Verarbeitung eines Substrats
US8083911B2 (en) * 2008-02-14 2011-12-27 Applied Materials, Inc. Apparatus for treating a substrate
US8182662B2 (en) * 2009-03-27 2012-05-22 Sputtering Components, Inc. Rotary cathode for magnetron sputtering apparatus
CZ304905B6 (cs) 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
TW201137144A (en) * 2010-04-29 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering device and cleaning method for sputtering target
TW201139712A (en) * 2010-05-12 2011-11-16 Hon Hai Prec Ind Co Ltd Sputtering device
CN102296273B (zh) * 2010-06-24 2013-06-05 上海子创镀膜技术有限公司 一种真空磁控溅射镀膜用旋转阴极驱动系统
TW201217568A (en) * 2010-10-26 2012-05-01 Hon Hai Prec Ind Co Ltd Deposition device
TWI480403B (zh) * 2010-10-26 2015-04-11 Hon Hai Prec Ind Co Ltd 鍍膜裝置
US20130032476A1 (en) * 2011-08-04 2013-02-07 Sputtering Components, Inc. Rotary cathodes for magnetron sputtering system
JP6106266B2 (ja) * 2012-04-16 2017-03-29 ザ・ティムケン・カンパニーＴｈｅ Ｔｉｍｋｅｎ Ｃｏｍｐａｎｙ 球形部品にコーティングを施すための方法およびテーブルアセンブリ
EP2746424B1 (de) * 2012-12-21 2018-10-17 Oerlikon Surface Solutions AG, Pfäffikon Verdampfungsquelle
CN103290382B (zh) * 2013-05-15 2015-09-09 宁波韵升股份有限公司 一种真空镀膜机行星式工件架
CN112281127A (zh) * 2020-10-30 2021-01-29 湘潭宏大真空技术股份有限公司 用于磁控溅射镀膜机的承载装置

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Publication number Priority date Publication date Assignee Title
US2476592A (en) * 1944-12-13 1949-07-19 Fruth Hal Frederick Cathodic deposition apparatus
GB1147318A (en) * 1968-02-22 1969-04-02 Standard Telephones Cables Ltd Improvements in r.f. cathodic sputtering systems
JPS49125285A (de) * 1973-04-06 1974-11-30
US3897325A (en) * 1972-10-20 1975-07-29 Nippon Electric Varian Ltd Low temperature sputtering device
US3901784A (en) * 1973-11-15 1975-08-26 United Aircraft Corp Cylindrical rf sputtering apparatus
MX145314A (es) * 1975-12-17 1982-01-27 Coulter Systems Corp Mejoras a un aparato chisporroteador para producir pelicula electrofotografica
US4126530A (en) * 1977-08-04 1978-11-21 Telic Corporation Method and apparatus for sputter cleaning and bias sputtering
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS6037188B2 (ja) * 1981-08-27 1985-08-24 三菱マテリアル株式会社 スパツタリング装置

Also Published As

Publication number Publication date
IT1173906B (it) 1987-06-24
FI841119A (fi) 1984-09-22
DK160154B (da) 1991-02-04
NO163414B (no) 1990-02-12
FI76123C (fi) 1988-09-09
AU2515684A (en) 1984-09-27
DE3476563D1 (de) 1989-03-09
EP0119631B1 (de) 1989-02-01
CA1225364A (en) 1987-08-11
US4417968A (en) 1983-11-29
NO841073L (no) 1984-09-24
JPS59179785A (ja) 1984-10-12
DK98484D0 (da) 1984-02-24
NO163414C (no) 1990-05-23
DK98484A (da) 1984-09-22
FI76123B (fi) 1988-05-31
EP0119631A2 (de) 1984-09-26
DK160154C (da) 1991-07-08
FI841119A0 (fi) 1984-03-20
AU567918B2 (en) 1987-12-10
IT8420158A0 (it) 1984-03-20
EP0119631A3 (en) 1986-03-12

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