DE3772706D1 - Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte. - Google Patents

Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte.

Info

Publication number
DE3772706D1
DE3772706D1 DE8787402242T DE3772706T DE3772706D1 DE 3772706 D1 DE3772706 D1 DE 3772706D1 DE 8787402242 T DE8787402242 T DE 8787402242T DE 3772706 T DE3772706 T DE 3772706T DE 3772706 D1 DE3772706 D1 DE 3772706D1
Authority
DE
Germany
Prior art keywords
chamber
coating
glass plate
electrodes
vacuum support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787402242T
Other languages
English (en)
Inventor
Xaver Heitzer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vegla Vereinigte Glaswerke GmbH
Original Assignee
Vegla Vereinigte Glaswerke GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vegla Vereinigte Glaswerke GmbH filed Critical Vegla Vereinigte Glaswerke GmbH
Priority to DE8787402242T priority Critical patent/DE3772706D1/de
Application granted granted Critical
Publication of DE3772706D1 publication Critical patent/DE3772706D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
  • Supports For Plants (AREA)
  • Window Of Vehicle (AREA)
  • Blinds (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
DE8787402242T 1986-10-11 1987-10-08 Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte. Expired - Fee Related DE3772706D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8787402242T DE3772706D1 (de) 1986-10-11 1987-10-08 Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863634710 DE3634710A1 (de) 1986-10-11 1986-10-11 Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung
DE8787402242T DE3772706D1 (de) 1986-10-11 1987-10-08 Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte.

Publications (1)

Publication Number Publication Date
DE3772706D1 true DE3772706D1 (de) 1991-10-10

Family

ID=6311558

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19863634710 Granted DE3634710A1 (de) 1986-10-11 1986-10-11 Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung
DE8787402242T Expired - Fee Related DE3772706D1 (de) 1986-10-11 1987-10-08 Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19863634710 Granted DE3634710A1 (de) 1986-10-11 1986-10-11 Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung

Country Status (7)

Country Link
US (1) US5080774A (de)
EP (1) EP0265320B1 (de)
JP (1) JPS63105963A (de)
AT (1) ATE66966T1 (de)
DE (2) DE3634710A1 (de)
ES (1) ES2026558T3 (de)
FI (1) FI82717C (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01152271A (ja) * 1987-12-09 1989-06-14 Toshiba Corp スパッタ装置
FR2698093B1 (fr) * 1992-11-17 1995-01-27 Saint Gobain Vitrage Int Vitrage à propriétés de transmission variant avec l'incidence.
KR970009828B1 (en) * 1994-02-23 1997-06-18 Sansung Electronics Co Ltd Fabrication method of collimator
US5614071A (en) * 1995-06-28 1997-03-25 Hmt Technology Corporation Sputtering shield
JP2001509214A (ja) * 1997-01-16 2001-07-10 ボトムフィールド，ロジャー，エル． 蒸気蒸着構成要素及び対応する方法
JP2002105628A (ja) * 2000-10-03 2002-04-10 Nissin Electric Co Ltd 真空アーク蒸着装置
DE10132478C1 (de) * 2001-07-03 2003-04-30 Atotech Deutschland Gmbh Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung
US6495000B1 (en) * 2001-07-16 2002-12-17 Sharp Laboratories Of America, Inc. System and method for DC sputtering oxide films with a finned anode
US8500965B2 (en) * 2004-05-06 2013-08-06 Ppg Industries Ohio, Inc. MSVD coating process
KR101165466B1 (ko) * 2005-08-31 2012-07-13 엘지디스플레이 주식회사 캐리어 및 이를 구비한 공정 장치
US8603250B2 (en) * 2006-06-27 2013-12-10 First Solar, Inc. System and method for deposition of a material on a substrate
US20080017501A1 (en) * 2006-07-21 2008-01-24 Makoto Inagawa Cooled dark space shield for multi-cathode design
US20090194414A1 (en) * 2008-01-31 2009-08-06 Nolander Ira G Modified sputtering target and deposition components, methods of production and uses thereof
EP2354271A1 (de) * 2010-02-09 2011-08-10 Applied Materials, Inc. Substratschutzvorrichtung und -verfahren
DE102010052761A1 (de) * 2010-11-30 2012-05-31 Leybold Optics Gmbh Vorrichtung zum Beschichten eines Substrats
KR20140047276A (ko) * 2012-10-12 2014-04-22 삼성디스플레이 주식회사 스퍼터링 장치
CN106756780B (zh) * 2017-01-23 2019-03-05 京东方科技集团股份有限公司 一种用于溅射成膜工艺的掩膜板及溅射装置
CH715877A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
DE102022103180A1 (de) 2022-02-10 2023-08-10 Voestalpine Stahl Gmbh Verfahren zum Erzeugen von beschichtetem perforiertem Stahlband

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3514391A (en) * 1967-05-05 1970-05-26 Nat Res Corp Sputtering apparatus with finned anode
US4094763A (en) * 1970-07-31 1978-06-13 Ppg Industries, Inc. Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
US4100055A (en) * 1977-06-10 1978-07-11 Varian Associates, Inc. Target profile for sputtering apparatus
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
DD140481A1 (de) * 1978-11-20 1980-03-05 Juergen Salm Verfahren und vorrichtung zum aufbringen von isolatorschichten
NL8202092A (nl) * 1982-05-21 1983-12-16 Philips Nv Magnetronkathodesputtersysteem.
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
US4545882A (en) * 1983-09-02 1985-10-08 Shatterproof Glass Corporation Method and apparatus for detecting sputtering target depletion
GB2194965B (en) * 1986-09-12 1991-01-09 Sharp Kk A process for preparing a soft magnetic film of ni-fe based alloy

Also Published As

Publication number Publication date
DE3634710A1 (de) 1988-04-21
FI82717C (fi) 1991-04-10
FI874464A (fi) 1988-04-12
FI82717B (fi) 1990-12-31
ES2026558T3 (es) 1992-05-01
ATE66966T1 (de) 1991-09-15
DE3634710C2 (de) 1989-01-12
US5080774A (en) 1992-01-14
EP0265320B1 (de) 1991-09-04
JPS63105963A (ja) 1988-05-11
EP0265320A1 (de) 1988-04-27
FI874464A0 (fi) 1987-10-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee