IT1211938B - Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature - Google Patents
Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetratureInfo
- Publication number
- IT1211938B IT1211938B IT8748644A IT4864487A IT1211938B IT 1211938 B IT1211938 B IT 1211938B IT 8748644 A IT8748644 A IT 8748644A IT 4864487 A IT4864487 A IT 4864487A IT 1211938 B IT1211938 B IT 1211938B
- Authority
- IT
- Italy
- Prior art keywords
- deposition
- glass
- thin layer
- realization
- procedure
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 230000008021 deposition Effects 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/005—Other surface treatment of glass not in the form of fibres or filaments by irradiation by atoms
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT8748644A IT1211938B (it) | 1987-11-27 | 1987-11-27 | Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature |
EP88830503A EP0318441B1 (en) | 1987-11-27 | 1988-11-22 | Apparatus and process for the deposition of a thin layer on a transparent substrate, in particular for the manufacture of sheets of glass |
AT88830503T ATE88222T1 (de) | 1987-11-27 | 1988-11-22 | Anlage und verfahren zur ablagerung einer duennen schicht auf ein durchsichtiges substrat, insbesondere zur herstellung von glasscheiben. |
US07/275,570 US4933057A (en) | 1987-11-27 | 1988-11-22 | Apparatus and process for the deposition of a thin layer on a transparent substrate |
ES198888830503T ES2040896T3 (es) | 1987-11-27 | 1988-11-22 | Aparato y procedimiento para la deposicion de una capa delgada sobre un sustrato transparente, en particular para la fabricacion de laminas de vidrio. |
DE88830503T DE3880275T2 (de) | 1987-11-27 | 1988-11-22 | Anlage und Verfahren zur Ablagerung einer dünnen Schicht auf ein durchsichtiges Substrat, insbesondere zur Herstellung von Glasscheiben. |
DD32214888A DD275861A5 (de) | 1987-11-27 | 1988-11-24 | Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas |
JP63297995A JPH01168862A (ja) | 1987-11-27 | 1988-11-25 | 透明支持体上に薄層を付着するための、特にガラスシートを製造するための装置及び方法 |
SU884356883A RU1809840C (ru) | 1987-11-27 | 1988-11-25 | Устройство дл нанесени тонких пленок в вакууме |
BR888806229A BR8806229A (pt) | 1987-11-27 | 1988-11-25 | Aparelho e processo para a deposicao de uma delgada camada de um substrato transparente,em particular para a fabricacao de chapas de vidro |
PL88275999A PL161618B1 (pl) | 1987-11-27 | 1988-11-26 | Sposób i urzadzenie do osadzania cienkiej warstwy na przezroczystym podlozu PL |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT8748644A IT1211938B (it) | 1987-11-27 | 1987-11-27 | Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8748644A0 IT8748644A0 (it) | 1987-11-27 |
IT1211938B true IT1211938B (it) | 1989-11-08 |
Family
ID=11267817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT8748644A IT1211938B (it) | 1987-11-27 | 1987-11-27 | Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature |
Country Status (11)
Country | Link |
---|---|
US (1) | US4933057A (it) |
EP (1) | EP0318441B1 (it) |
JP (1) | JPH01168862A (it) |
AT (1) | ATE88222T1 (it) |
BR (1) | BR8806229A (it) |
DD (1) | DD275861A5 (it) |
DE (1) | DE3880275T2 (it) |
ES (1) | ES2040896T3 (it) |
IT (1) | IT1211938B (it) |
PL (1) | PL161618B1 (it) |
RU (1) | RU1809840C (it) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5073245A (en) * | 1990-07-10 | 1991-12-17 | Hedgcoth Virgle L | Slotted cylindrical hollow cathode/magnetron sputtering device |
US5437778A (en) * | 1990-07-10 | 1995-08-01 | Telic Technologies Corporation | Slotted cylindrical hollow cathode/magnetron sputtering device |
US5277779A (en) * | 1992-04-14 | 1994-01-11 | Henshaw William F | Rectangular cavity magnetron sputtering vapor source |
US6444100B1 (en) | 2000-02-11 | 2002-09-03 | Seagate Technology Llc | Hollow cathode sputter source |
SG90171A1 (en) * | 2000-09-26 | 2002-07-23 | Inst Data Storage | Sputtering device |
DE10227048A1 (de) * | 2002-06-17 | 2004-01-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt |
US7411352B2 (en) * | 2002-09-19 | 2008-08-12 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
JP5160730B2 (ja) * | 2002-09-19 | 2013-03-13 | ジェネラル・プラズマ・インコーポレーテッド | ビーム状プラズマ源 |
US7038389B2 (en) * | 2003-05-02 | 2006-05-02 | Applied Process Technologies, Inc. | Magnetron plasma source |
WO2017169029A1 (ja) * | 2016-03-30 | 2017-10-05 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
US20230029343A1 (en) * | 2021-07-20 | 2023-01-26 | Canon Kabushiki Kaisha | Sputtering apparatus, film formation method, and method for manufacturing product |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1425754A (en) * | 1973-07-03 | 1976-02-18 | Electricity Council | Methods of and apparatus for coating wire rod or strip material by sputtering |
US3878085A (en) * | 1973-07-05 | 1975-04-15 | Sloan Technology Corp | Cathode sputtering apparatus |
DD141932B1 (de) * | 1978-12-18 | 1982-06-30 | Guenter Reisse | Verfahren und vorrichtung zur teilchenstromionisierung und hochratebeschichtung |
US4472259A (en) * | 1981-10-29 | 1984-09-18 | Materials Research Corporation | Focusing magnetron sputtering apparatus |
US4428816A (en) * | 1983-05-25 | 1984-01-31 | Materials Research Corporation | Focusing magnetron sputtering apparatus |
US4690744A (en) * | 1983-07-20 | 1987-09-01 | Konishiroku Photo Industry Co., Ltd. | Method of ion beam generation and an apparatus based on such method |
CH659484A5 (de) * | 1984-04-19 | 1987-01-30 | Balzers Hochvakuum | Anordnung zur beschichtung von substraten mittels kathodenzerstaeubung. |
JPS6277460A (ja) * | 1985-09-30 | 1987-04-09 | Tokuda Seisakusho Ltd | 放電電極 |
-
1987
- 1987-11-27 IT IT8748644A patent/IT1211938B/it active
-
1988
- 1988-11-22 DE DE88830503T patent/DE3880275T2/de not_active Expired - Fee Related
- 1988-11-22 EP EP88830503A patent/EP0318441B1/en not_active Expired - Lifetime
- 1988-11-22 US US07/275,570 patent/US4933057A/en not_active Expired - Fee Related
- 1988-11-22 ES ES198888830503T patent/ES2040896T3/es not_active Expired - Lifetime
- 1988-11-22 AT AT88830503T patent/ATE88222T1/de not_active IP Right Cessation
- 1988-11-24 DD DD32214888A patent/DD275861A5/de not_active IP Right Cessation
- 1988-11-25 BR BR888806229A patent/BR8806229A/pt unknown
- 1988-11-25 RU SU884356883A patent/RU1809840C/ru active
- 1988-11-25 JP JP63297995A patent/JPH01168862A/ja active Pending
- 1988-11-26 PL PL88275999A patent/PL161618B1/pl unknown
Also Published As
Publication number | Publication date |
---|---|
EP0318441B1 (en) | 1993-04-14 |
DE3880275T2 (de) | 1993-10-21 |
ATE88222T1 (de) | 1993-04-15 |
EP0318441A3 (en) | 1990-07-25 |
IT8748644A0 (it) | 1987-11-27 |
PL161618B1 (pl) | 1993-07-30 |
ES2040896T3 (es) | 1993-11-01 |
US4933057A (en) | 1990-06-12 |
DD275861A5 (de) | 1990-02-07 |
RU1809840C (ru) | 1993-04-15 |
PL275999A1 (en) | 1989-07-24 |
EP0318441A2 (en) | 1989-05-31 |
DE3880275D1 (de) | 1993-05-19 |
BR8806229A (pt) | 1989-08-15 |
JPH01168862A (ja) | 1989-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IT1211938B (it) | Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature | |
DE3875263D1 (de) | Verfahren und vorrichtung zum aufstaeuben hochohmiger schichten durch katodenzerstaeubung. | |
TW352471B (en) | Method for preventing B-P-Si glass from subsiding | |
Shih et al. | Deposition of aluminum oxide films with high refractive index | |
ATE90167T1 (de) | Verfahren zum niederschlagen von rauhem zinnoxid. | |
DE3772706D1 (de) | Anlage zur vakuum-auflagerung durch reaktive kathodenzerstaeubung auf eine glasplatte. | |
JPS5472696A (en) | Package for super miniature size piezoelectric oscillator | |
DE69018159D1 (de) | Verfahren zur Abscheidung von Dünnschichten. | |
JPS57161857A (en) | Photomask blank plate | |
JPS55143754A (en) | Gas discharge panel | |
JPS54126488A (en) | Semiconductor laser and its production | |
JPS575372A (en) | Thin film diode and manufacture thereof | |
JPS5767262A (en) | Gas discharge display panel | |
JPS5731130A (en) | Method and device for plasma chemical vapour deposition | |
JPS5824143A (ja) | フオトマスク | |
JPS5665119A (en) | Liquid crystal display device | |
JPS5317583A (en) | Process for forming vacuum evaporation layer on largeesized substrate surface | |
JPS54138405A (en) | Preparation method of information recording media | |
JPS6318330A (ja) | 液晶素子のパタ−ン形成方法 | |
JPS55122242A (en) | Substrate for optical disc | |
JPS54162688A (en) | Forming method for oxide single crystal thin film | |
JPS6414891A (en) | Thin film el element | |
JPS572003A (en) | Manufacture of reflector | |
JPS6480017A (en) | Manufacture of semiconductor single crystal layer | |
JPS5514510A (en) | Information recording plate and its manufacture |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19931123 |