JPS572003A - Manufacture of reflector - Google Patents

Manufacture of reflector

Info

Publication number
JPS572003A
JPS572003A JP7615180A JP7615180A JPS572003A JP S572003 A JPS572003 A JP S572003A JP 7615180 A JP7615180 A JP 7615180A JP 7615180 A JP7615180 A JP 7615180A JP S572003 A JPS572003 A JP S572003A
Authority
JP
Japan
Prior art keywords
vacuum
silver film
vapor deposition
substrate
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7615180A
Other languages
Japanese (ja)
Inventor
Rokuro Watabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP7615180A priority Critical patent/JPS572003A/en
Publication of JPS572003A publication Critical patent/JPS572003A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors

Abstract

PURPOSE:To obtain a reflector which has a high reflection factor and also a satisfactory adhesive property, by forming a silver film on one surface of a substrate by means of a gas lead-in high frequency vapor deposition in the first half of the process, and vacuum vapor deposition in the latter half of the process. CONSTITUTION:When a silver film is formed on one surface of a reflector substrate, an evaporation source consisting of metallic silver, and a substrate supporting plate of glass, etc. are placed so as to be opposed in a vacuum tank which has been filled with inert gas, a high frequency oil is provided in the proximity of said evaporation source, and an inplating device which is able to apply DC voltage is used between the evaporation source and the substrate supporting plate. When forming a silver film, in the first half of the process, the degree of vacuum is lowered by leading inert gas into the exhausted vacuum tank, ion lead-in high frequency vapor deposition is executed by applying DC voltage, and a silver film whose thickness is half of that which is desired finally is formed on the substrate. Subsequently, in the latter half of the process, the degree of vacuum in the vacuum tank is raised, regular vacuum vapor deposition is executed by heating, and a silver film whose thickness is desired finally is formed by adding a film whose thickness is almost same as that of the first half of the process.
JP7615180A 1980-06-06 1980-06-06 Manufacture of reflector Pending JPS572003A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7615180A JPS572003A (en) 1980-06-06 1980-06-06 Manufacture of reflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7615180A JPS572003A (en) 1980-06-06 1980-06-06 Manufacture of reflector

Publications (1)

Publication Number Publication Date
JPS572003A true JPS572003A (en) 1982-01-07

Family

ID=13597013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7615180A Pending JPS572003A (en) 1980-06-06 1980-06-06 Manufacture of reflector

Country Status (1)

Country Link
JP (1) JPS572003A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH041585U (en) * 1990-04-13 1992-01-08
USRE41747E1 (en) 2001-01-25 2010-09-21 Kyocera Optec Co., Ltd. Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4967883A (en) * 1972-11-06 1974-07-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4967883A (en) * 1972-11-06 1974-07-01

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH041585U (en) * 1990-04-13 1992-01-08
USRE41747E1 (en) 2001-01-25 2010-09-21 Kyocera Optec Co., Ltd. Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film

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