DK0516804T3 - Process for depositing a silica layer bonded to a polymer material support - Google Patents

Process for depositing a silica layer bonded to a polymer material support

Info

Publication number
DK0516804T3
DK0516804T3 DK92902267.1T DK92902267T DK0516804T3 DK 0516804 T3 DK0516804 T3 DK 0516804T3 DK 92902267 T DK92902267 T DK 92902267T DK 0516804 T3 DK0516804 T3 DK 0516804T3
Authority
DK
Denmark
Prior art keywords
depositing
polymer material
material support
silica layer
layer bonded
Prior art date
Application number
DK92902267.1T
Other languages
Danish (da)
Inventor
Michel Gastiger
Franciscus Slootman
Pascal Bouard
Antoine Willemot
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9403303&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK0516804(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of DK0516804T3 publication Critical patent/DK0516804T3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
    • C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Silicon Compounds (AREA)
  • Laminated Bodies (AREA)
  • Patch Boards (AREA)
  • Gas-Insulated Switchgears (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Wrappers (AREA)
  • Formation Of Insulating Films (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Abstract

In a method for depositing a thin silicon oxide film bonded to a polymer substrate, the surface of the substrate is subjected to an electric discharge with dielectric barrier and, concomitantly or subsequently, exposed to a silane-containing atmosphere, thus causing a silicon oxide deposit to be formed, bonded to the said substrate surface. Application in the production of foils or films used for example for food packaging.
DK92902267.1T 1990-12-17 1991-12-17 Process for depositing a silica layer bonded to a polymer material support DK0516804T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9015757A FR2670506B1 (en) 1990-12-17 1990-12-17 PROCESS FOR DEPOSITING A SILICON OXIDE LAYER BOUND TO A POLYOLEFIN SUBSTRATE.

Publications (1)

Publication Number Publication Date
DK0516804T3 true DK0516804T3 (en) 1996-04-09

Family

ID=9403303

Family Applications (1)

Application Number Title Priority Date Filing Date
DK92902267.1T DK0516804T3 (en) 1990-12-17 1991-12-17 Process for depositing a silica layer bonded to a polymer material support

Country Status (9)

Country Link
EP (1) EP0516804B1 (en)
JP (1) JP3260140B2 (en)
AT (1) ATE133437T1 (en)
CA (1) CA2076029C (en)
DE (1) DE69116683T2 (en)
DK (1) DK0516804T3 (en)
ES (1) ES2083154T3 (en)
FR (1) FR2670506B1 (en)
WO (1) WO1992011312A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3471356B2 (en) * 1992-11-13 2003-12-02 エナージー・コンバーション・デバイセス・インコーポレーテッド Microwave equipment for thin film deposition
JPH06330326A (en) * 1993-03-26 1994-11-29 Shin Etsu Chem Co Ltd Production of thin silica film
FR2704558B1 (en) * 1993-04-29 1995-06-23 Air Liquide METHOD AND DEVICE FOR CREATING A DEPOSIT OF SILICON OXIDE ON A SOLID TRAVELING SUBSTRATE.
US5364666A (en) * 1993-09-23 1994-11-15 Becton, Dickinson And Company Process for barrier coating of plastic objects
DE4438992C2 (en) * 1994-10-31 1997-04-10 Fraunhofer Ges Forschung Method and device for applying antistatic, transparent surface coatings to electrically insulating objects
FR2751664B1 (en) * 1996-07-23 1998-09-04 Air Liquide METHOD AND DEVICE FOR CONTROLLING THE OPERATION OF A SURFACE TREATMENT SYSTEM OF A SOLID TRAVELING SUBSTRATE
FR2751665B1 (en) * 1996-07-23 1998-09-04 Air Liquide METHOD AND DEVICE FOR CONTROLLING THE OPERATION OF A SURFACE TREATMENT SYSTEM
US5900317A (en) * 1996-09-13 1999-05-04 Minnesota Mining & Manufacturing Company Flame-treating process
EP1125972A1 (en) 2000-02-11 2001-08-22 L'air Liquide Société Anonyme pour l'étude et l'exploitation des procédés Georges Claude Process for surface treatment of polymeric substrates
WO2006133730A1 (en) 2005-06-16 2006-12-21 Innovative Systems & Technologies Method for producing coated polymer
US20080115444A1 (en) 2006-09-01 2008-05-22 Kalkanoglu Husnu M Roofing shingles with enhanced granule adhesion and method for producing same
FR2908137A1 (en) 2006-11-02 2008-05-09 Lapeyre Sa THIN FILM DEPOSITION METHOD AND PRODUCT OBTAINED
US8349435B2 (en) 2007-04-04 2013-01-08 Certainteed Corporation Mineral surfaced asphalt-based roofing products with encapsulated healing agents and methods of producing the same
US20090115060A1 (en) 2007-11-01 2009-05-07 Infineon Technologies Ag Integrated circuit device and method
US10730799B2 (en) 2016-12-31 2020-08-04 Certainteed Corporation Solar reflective composite granules and method of making solar reflective composite granules

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1188642A (en) * 1966-02-09 1970-04-22 Courtaulds Ltd Modified Polyolefin Articles
US3440959A (en) * 1966-02-18 1969-04-29 Hercules Inc Coated polymer
US4328646A (en) * 1978-11-27 1982-05-11 Rca Corporation Method for preparing an abrasive coating
KR890002565B1 (en) * 1982-10-08 1989-07-18 도오요오 보오세끼 가부시끼가이샤 Method for preparing high adhesive polyolefin
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5100720A (en) * 1987-10-07 1992-03-31 Mitsubishi Monsanto Chemical Company Limited Laminated film having gas barrier properties

Also Published As

Publication number Publication date
CA2076029A1 (en) 1992-06-18
DE69116683D1 (en) 1996-03-07
FR2670506A1 (en) 1992-06-19
DE69116683T2 (en) 1996-05-30
ES2083154T3 (en) 1996-04-01
EP0516804A1 (en) 1992-12-09
CA2076029C (en) 2002-02-19
EP0516804B1 (en) 1996-01-24
FR2670506B1 (en) 1993-02-19
WO1992011312A1 (en) 1992-07-09
JPH05504991A (en) 1993-07-29
ATE133437T1 (en) 1996-02-15
JP3260140B2 (en) 2002-02-25

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