FR2305021A1 - Thin glass film passivation - of active semiconductor devices by spraying dry glass powder on surface and fusing it - Google Patents
Thin glass film passivation - of active semiconductor devices by spraying dry glass powder on surface and fusing itInfo
- Publication number
- FR2305021A1 FR2305021A1 FR7607634A FR7607634A FR2305021A1 FR 2305021 A1 FR2305021 A1 FR 2305021A1 FR 7607634 A FR7607634 A FR 7607634A FR 7607634 A FR7607634 A FR 7607634A FR 2305021 A1 FR2305021 A1 FR 2305021A1
- Authority
- FR
- France
- Prior art keywords
- fusing
- glass powder
- semiconductor devices
- active semiconductor
- spraying dry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title abstract 5
- 239000000843 powder Substances 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000005507 spraying Methods 0.000 title abstract 2
- 238000002161 passivation Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 3
- 239000004809 Teflon Substances 0.000 abstract 1
- 229920006362 Teflon® Polymers 0.000 abstract 1
- 239000007767 bonding agent Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000001962 electrophoresis Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000375 suspending agent Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10156—Shape being other than a cuboid at the periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10157—Shape being other than a cuboid at the active surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Casings For Electric Apparatus (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Thin glass films are applied to the surface of active semiconductor devices by spraying dry glass powder electrostatically on the surface, followed by fusing it. The glass powder has a grain size of 5-30 mu, i.e. as large as possible but smaller than the desird layer thickness. The devices are held by permanent magnets embedded in insulating holders made of TEflon (RTM). This is a simple and accurate method which ensures a uniform coating. Contamination or chemical attack of the surfaces to be passivated by bonding or suspension agent is eliminated; the complications of electrochemical processes during electrochemical processes during electrophoresis is obviated.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH355275A CH591762A5 (en) | 1975-03-20 | 1975-03-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2305021A1 true FR2305021A1 (en) | 1976-10-15 |
Family
ID=4258446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7607634A Withdrawn FR2305021A1 (en) | 1975-03-20 | 1976-03-17 | Thin glass film passivation - of active semiconductor devices by spraying dry glass powder on surface and fusing it |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS51118966A (en) |
CH (1) | CH591762A5 (en) |
DE (2) | DE2518666A1 (en) |
FR (1) | FR2305021A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2469000A1 (en) * | 1979-10-30 | 1981-05-08 | Silicium Semiconducteur Ssc | Vitrified high voltage thyristor - has concave rim and glass layer to prevent surface breakdown |
FR2515874A1 (en) * | 1981-11-05 | 1983-05-06 | Comp Generale Electricite | Encapsulation of photocell arrays - by electrostatic powder deposition for rapid application without incurring voids |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5367363A (en) * | 1976-11-27 | 1978-06-15 | Mitsubishi Electric Corp | Semiconductor device |
DE3832732A1 (en) * | 1988-09-27 | 1990-03-29 | Asea Brown Boveri | PERFORMANCE SEMICONDUCTOR DIODE |
DE3832750A1 (en) * | 1988-09-27 | 1990-03-29 | Asea Brown Boveri | PERFORMANCE SEMICONDUCTOR COMPONENT |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1438826A (en) * | 1964-06-30 | 1966-05-13 | Ibm | Reactive spraying of glass films |
FR1485806A (en) * | 1965-06-28 | 1967-06-23 | Ibm | Method and apparatus for depositing particles on an object |
US3473959A (en) * | 1964-08-10 | 1969-10-21 | Licentia Gmbh | Method for coating semiconductors and apparatus |
DE2037524A1 (en) * | 1969-07-30 | 1971-02-11 | General Electric Co , Schenectady NY (V St A ) | Process for the production of a semiconductor component encapsulated in glass |
-
1975
- 1975-03-20 CH CH355275A patent/CH591762A5/xx not_active IP Right Cessation
- 1975-04-26 DE DE19752518666 patent/DE2518666A1/en not_active Withdrawn
- 1975-04-26 DE DE19757513490 patent/DE7513490U/en not_active Expired
-
1976
- 1976-03-17 FR FR7607634A patent/FR2305021A1/en not_active Withdrawn
- 1976-03-18 JP JP2976776A patent/JPS51118966A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1438826A (en) * | 1964-06-30 | 1966-05-13 | Ibm | Reactive spraying of glass films |
US3473959A (en) * | 1964-08-10 | 1969-10-21 | Licentia Gmbh | Method for coating semiconductors and apparatus |
FR1485806A (en) * | 1965-06-28 | 1967-06-23 | Ibm | Method and apparatus for depositing particles on an object |
DE2037524A1 (en) * | 1969-07-30 | 1971-02-11 | General Electric Co , Schenectady NY (V St A ) | Process for the production of a semiconductor component encapsulated in glass |
Non-Patent Citations (2)
Title |
---|
NV8021/69 * |
NV8137/73 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2469000A1 (en) * | 1979-10-30 | 1981-05-08 | Silicium Semiconducteur Ssc | Vitrified high voltage thyristor - has concave rim and glass layer to prevent surface breakdown |
FR2515874A1 (en) * | 1981-11-05 | 1983-05-06 | Comp Generale Electricite | Encapsulation of photocell arrays - by electrostatic powder deposition for rapid application without incurring voids |
Also Published As
Publication number | Publication date |
---|---|
CH591762A5 (en) | 1977-09-30 |
DE2518666A1 (en) | 1976-09-30 |
DE7513490U (en) | 1977-05-26 |
JPS51118966A (en) | 1976-10-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2305021A1 (en) | Thin glass film passivation - of active semiconductor devices by spraying dry glass powder on surface and fusing it | |
DK0516804T3 (en) | Process for depositing a silica layer bonded to a polymer material support | |
JPS5267353A (en) | Electrostatic chuck | |
IT1061594B (en) | PROCEDURE FOR THE APPLICATION OF AN ANTI-REFLECTION COATING ON PLASTIC SUBSTRATES, IN PARTICULAR LENSES | |
JPS5229792A (en) | Method of determining adhesion of films | |
JPS5222881A (en) | Thin film etching system on semiconductor base plate | |
IT1057683B (en) | PROCESS FOR THE PRODUCTION OF OXIDE SEALED ANODIC FILMS ON ALUMINUM AND SUELEGHE IN PREPARATION FOR COATING OR PAINTING | |
JPS5226214A (en) | Method for coating resist | |
JPS5286429A (en) | Method of application of water-dispersed resin coating | |
JPS57104851A (en) | Semiconductor sensor | |
JPH06504877A (en) | Electric field-assisted adhesion | |
JPS5769737A (en) | Coating method and device for resist on both side surfaces of wafer | |
JPS51112182A (en) | Method and apparatus for generating plasma acted by magnetism to form thin film on surface of solid substrate | |
JPS55146419A (en) | Display device | |
FR2369016A1 (en) | Vacuum coating of substrates with periodic masking - to form curves of equal exposure having a desired shape, e.g. elliptical, esp. for Schmidt films | |
JPS5780647A (en) | Pulverized sample supporting method | |
JPS562872A (en) | Processing method of fluorine contained resin | |
JPS5541702A (en) | Glass film coating method for semiconductor | |
JPS5571043A (en) | Semiconductor device | |
WO1987004007A1 (en) | A method of improving the electrical characteristics of a thin film | |
JPS56150591A (en) | Forming of optical record member | |
JPS5219505A (en) | Manufacturing process of adhesive magnetic sheet | |
JPS5671982A (en) | Junction type field effect transistor | |
JPS6450534A (en) | Method of forming oxide film of element semiconductor | |
JPS57134929A (en) | Method for interconnection-pattern forming |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |