JPS5226214A - Method for coating resist - Google Patents

Method for coating resist

Info

Publication number
JPS5226214A
JPS5226214A JP50102195A JP10219575A JPS5226214A JP S5226214 A JPS5226214 A JP S5226214A JP 50102195 A JP50102195 A JP 50102195A JP 10219575 A JP10219575 A JP 10219575A JP S5226214 A JPS5226214 A JP S5226214A
Authority
JP
Japan
Prior art keywords
resist
coating resist
wafer
coating
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50102195A
Other languages
Japanese (ja)
Other versions
JPS5530212B2 (en
Inventor
Tamotsu Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50102195A priority Critical patent/JPS5226214A/en
Publication of JPS5226214A publication Critical patent/JPS5226214A/en
Publication of JPS5530212B2 publication Critical patent/JPS5530212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent a resist from thickening on a peripheral surface of a resist film on coating the resist on wafer by means of forming the resist film in such a manner that the rotation speed of the wafer to be coated after reaching the maximum value is kept for a slight time and reduced to that of one step below.
JP50102195A 1975-08-25 1975-08-25 Method for coating resist Granted JPS5226214A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50102195A JPS5226214A (en) 1975-08-25 1975-08-25 Method for coating resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50102195A JPS5226214A (en) 1975-08-25 1975-08-25 Method for coating resist

Publications (2)

Publication Number Publication Date
JPS5226214A true JPS5226214A (en) 1977-02-26
JPS5530212B2 JPS5530212B2 (en) 1980-08-09

Family

ID=14320871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50102195A Granted JPS5226214A (en) 1975-08-25 1975-08-25 Method for coating resist

Country Status (1)

Country Link
JP (1) JPS5226214A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5916333A (en) * 1982-07-19 1984-01-27 Matsushita Electronics Corp Resist coating method
JPS6197923A (en) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing semiconductor device
US4748053A (en) * 1983-12-08 1988-05-31 Hoya Corporation Method of forming a uniform resist film by selecting a duration of rotation
JPS63177329A (en) * 1980-08-11 1988-07-21 デイスコビジョン　アソシエイツ Molding of video disc
JP2015223556A (en) * 2014-05-28 2015-12-14 株式会社ディスコ Coating method of protective film
KR20160140462A (en) * 2015-05-27 2016-12-07 수스 마이크로텍 리소그라피 게엠바하 Device for treating a disc-shaped substrate and support adapter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS493029A (en) * 1972-04-27 1974-01-11

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS493029A (en) * 1972-04-27 1974-01-11

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63177329A (en) * 1980-08-11 1988-07-21 デイスコビジョン　アソシエイツ Molding of video disc
JPH0346895B2 (en) * 1980-08-11 1991-07-17 Discovision Ass
JPS5916333A (en) * 1982-07-19 1984-01-27 Matsushita Electronics Corp Resist coating method
JPH0345529B2 (en) * 1982-07-19 1991-07-11 Matsushita Electronics Corp
US4748053A (en) * 1983-12-08 1988-05-31 Hoya Corporation Method of forming a uniform resist film by selecting a duration of rotation
JPS6197923A (en) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing semiconductor device
JPH056341B2 (en) * 1984-10-19 1993-01-26 Matsushita Electric Ind Co Ltd
JP2015223556A (en) * 2014-05-28 2015-12-14 株式会社ディスコ Coating method of protective film
KR20160140462A (en) * 2015-05-27 2016-12-07 수스 마이크로텍 리소그라피 게엠바하 Device for treating a disc-shaped substrate and support adapter

Also Published As

Publication number Publication date
JPS5530212B2 (en) 1980-08-09

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