JPS5232671A - Manufacturing process of semiconductor device - Google Patents

Manufacturing process of semiconductor device

Info

Publication number
JPS5232671A
JPS5232671A JP10913675A JP10913675A JPS5232671A JP S5232671 A JPS5232671 A JP S5232671A JP 10913675 A JP10913675 A JP 10913675A JP 10913675 A JP10913675 A JP 10913675A JP S5232671 A JPS5232671 A JP S5232671A
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacturing process
hillocks
etched
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10913675A
Other languages
Japanese (ja)
Inventor
Yukihiro Ooyama
Akira Abiru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10913675A priority Critical patent/JPS5232671A/en
Publication of JPS5232671A publication Critical patent/JPS5232671A/en
Pending legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: Al layer is photo-etched by coating it with Cr film. In this way, Al electrode can be formed with minute patterns and without hillocks.
COPYRIGHT: (C)1977,JPO&Japio
JP10913675A 1975-09-08 1975-09-08 Manufacturing process of semiconductor device Pending JPS5232671A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10913675A JPS5232671A (en) 1975-09-08 1975-09-08 Manufacturing process of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10913675A JPS5232671A (en) 1975-09-08 1975-09-08 Manufacturing process of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5232671A true JPS5232671A (en) 1977-03-12

Family

ID=14502488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10913675A Pending JPS5232671A (en) 1975-09-08 1975-09-08 Manufacturing process of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5232671A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5766629A (en) * 1980-10-13 1982-04-22 Mitsubishi Electric Corp Formation of electrode
JPS5784167A (en) * 1980-11-14 1982-05-26 Mitsubishi Electric Corp Electrode wiring
JPS57199232A (en) * 1981-06-03 1982-12-07 Fujitsu Ltd Manufacture of semiconductor device
JPH05117380A (en) * 1991-06-12 1993-05-14 Korea Advanced Inst Of Sci Technol Process for manufacturing polybutylene terephthalate polymer

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5766629A (en) * 1980-10-13 1982-04-22 Mitsubishi Electric Corp Formation of electrode
JPS6230687B2 (en) * 1980-10-13 1987-07-03 Mitsubishi Electric Corp
JPS5784167A (en) * 1980-11-14 1982-05-26 Mitsubishi Electric Corp Electrode wiring
JPS57199232A (en) * 1981-06-03 1982-12-07 Fujitsu Ltd Manufacture of semiconductor device
JPH0249018B2 (en) * 1981-06-03 1990-10-26 Fujitsu Ltd
JPH05117380A (en) * 1991-06-12 1993-05-14 Korea Advanced Inst Of Sci Technol Process for manufacturing polybutylene terephthalate polymer

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