IL43966A0 - Method and apparatus for thin film deposition on a substrate - Google Patents
Method and apparatus for thin film deposition on a substrateInfo
- Publication number
- IL43966A0 IL43966A0 IL43966A IL4396674A IL43966A0 IL 43966 A0 IL43966 A0 IL 43966A0 IL 43966 A IL43966 A IL 43966A IL 4396674 A IL4396674 A IL 4396674A IL 43966 A0 IL43966 A0 IL 43966A0
- Authority
- IL
- Israel
- Prior art keywords
- substrate
- thin film
- film deposition
- deposition
- thin
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US323133A US3884787A (en) | 1973-01-12 | 1973-01-12 | Sputtering method for thin film deposition on a substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
IL43966A0 true IL43966A0 (en) | 1974-06-30 |
IL43966A IL43966A (en) | 1976-12-31 |
Family
ID=23257860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL43966A IL43966A (en) | 1973-01-12 | 1974-01-07 | Method and apparatus for thin film deposition on a substrate by plasma vapor sputtering |
Country Status (15)
Country | Link |
---|---|
US (1) | US3884787A (en) |
JP (1) | JPS5747267B2 (en) |
AT (1) | AT341335B (en) |
BE (1) | BE809464A (en) |
CA (1) | CA1018475A (en) |
CH (1) | CH597622A5 (en) |
DD (1) | DD109035A5 (en) |
DE (1) | DE2400587A1 (en) |
FR (1) | FR2322667A1 (en) |
GB (1) | GB1461921A (en) |
IL (1) | IL43966A (en) |
IT (1) | IT1002650B (en) |
LU (1) | LU69122A1 (en) |
NL (1) | NL7317670A (en) |
SE (1) | SE392919B (en) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3939052A (en) * | 1975-01-15 | 1976-02-17 | Riley Leon H | Depositing optical fibers |
GB2010676B (en) * | 1977-12-27 | 1982-05-19 | Alza Corp | Diffusional drug delivery device with block copolymer as drug carrier |
US4331526A (en) * | 1979-09-24 | 1982-05-25 | Coulter Systems Corporation | Continuous sputtering apparatus and method |
US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
US4384532A (en) * | 1980-10-31 | 1983-05-24 | Staff Arthur B | Table extension for the handicapped |
US4343881A (en) * | 1981-07-06 | 1982-08-10 | Savin Corporation | Multilayer photoconductive assembly with intermediate heterojunction |
US4389295A (en) * | 1982-05-06 | 1983-06-21 | Gte Products Corporation | Thin film phosphor sputtering process |
JPS5976571A (en) * | 1982-10-25 | 1984-05-01 | Natl House Ind Co Ltd | Applicator |
GB8332394D0 (en) * | 1983-12-05 | 1984-01-11 | Pilkington Brothers Plc | Coating apparatus |
US5219668A (en) * | 1986-10-31 | 1993-06-15 | N.V. Bekaert S.A. | Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
NL8602759A (en) * | 1986-10-31 | 1988-05-16 | Bekaert Sa Nv | METHOD AND DEVICE FOR TREATING AN LONG-TERM SUBSTRATE COVERED; AND SUBSTRATES TREATED ACCORDING TO THAT METHOD AND ARTICLES OF POLYMER MATERIAL REINFORCED WITH THESE SUBSTRATES. |
US4849087A (en) * | 1988-02-11 | 1989-07-18 | Southwall Technologies | Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate |
EP0364619B1 (en) * | 1988-10-19 | 1993-12-29 | Ibm Deutschland Gmbh | Device for plasma or reactive ion etching, and process for etching thermally poorly conducting substrates |
DE29600991U1 (en) * | 1996-01-20 | 1997-05-22 | Strämke, Siegfried, Dr.-Ing., 52538 Selfkant | Plasma reactor |
US5725706A (en) * | 1996-03-12 | 1998-03-10 | The Whitaker Corporation | Laser transfer deposition |
US6066826A (en) * | 1998-03-16 | 2000-05-23 | Yializis; Angelo | Apparatus for plasma treatment of moving webs |
ES2263734T3 (en) * | 2002-03-15 | 2006-12-16 | Vhf Technologies Sa | APPLIANCE AND PROCEDURE FOR MANUFACTURING FLEXIBLE SEMI-DRIVING DEVICES. |
CH696013A5 (en) * | 2002-10-03 | 2006-11-15 | Tetra Laval Holdings & Finance | An apparatus for treating a strip-like material in a plasma-assisted process. |
US6906008B2 (en) * | 2003-06-26 | 2005-06-14 | Superpower, Inc. | Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
US7169232B2 (en) * | 2004-06-01 | 2007-01-30 | Eastman Kodak Company | Producing repetitive coatings on a flexible substrate |
MX2007007907A (en) * | 2004-12-29 | 2007-08-17 | Sca Hygiene Prod Ab | A hands-free paper towel dispenser and dispensing system. |
DE102005058869A1 (en) * | 2005-12-09 | 2007-06-14 | Cis Solartechnik Gmbh & Co. Kg | Method and device for coating strips |
KR100750654B1 (en) * | 2006-09-15 | 2007-08-20 | 한국전기연구원 | Long tape deposition apparatus |
KR100928222B1 (en) * | 2007-10-31 | 2009-11-24 | 한국전기연구원 | Joist deposition apparatus with guide roller |
US20090194505A1 (en) * | 2008-01-24 | 2009-08-06 | Microcontinuum, Inc. | Vacuum coating techniques |
EP2113585A1 (en) * | 2008-04-29 | 2009-11-04 | Applied Materials, Inc. | Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region |
TW201110831A (en) * | 2009-09-03 | 2011-03-16 | Chunghwa Picture Tubes Ltd | Plasma apparatus and method of fabricating nano-crystalline silicon thin film |
EP2508315B1 (en) | 2011-04-07 | 2013-09-18 | Gedore-Werkzeugfabrik GmbH & Co. KG | Splitting wedge |
US9869782B2 (en) * | 2012-10-22 | 2018-01-16 | Proportional Technologies, Inc. | Method and apparatus for coating thin foil with a boron coating |
KR20140061808A (en) * | 2012-11-14 | 2014-05-22 | 삼성디스플레이 주식회사 | Apparatus for depositing organic material |
US10112836B2 (en) * | 2012-11-26 | 2018-10-30 | The Regents Of The University Of Michigan | Continuous nanosynthesis apparatus and process |
JP2023538038A (en) * | 2020-08-21 | 2023-09-06 | アプライド マテリアルズ インコーポレイテッド | A processing system for processing a flexible substrate and a method for measuring at least one of properties of the flexible substrate and properties of one or more coatings on the flexible substrate |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2249710A (en) * | 1935-02-18 | 1941-07-15 | Ind Rayon Corp | Apparatus for continuously processing thread or the like |
NL143409C (en) * | 1947-11-20 | |||
US3068510A (en) * | 1959-12-14 | 1962-12-18 | Radiation Res Corp | Polymerizing method and apparatus |
BE599444A (en) * | 1960-02-03 | |||
US3343207A (en) * | 1963-10-14 | 1967-09-26 | Monsanto Co | Novelty yarn apparatus |
US3272175A (en) * | 1965-05-12 | 1966-09-13 | Heraeus Gmbh W C | Vapor deposition means for strip-coating continuously moving, helically wound ribbon |
US3477902A (en) * | 1965-10-14 | 1969-11-11 | Radiation Res Corp | Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product |
DE1802932B2 (en) * | 1968-10-14 | 1974-11-14 | W.C. Heraeus Gmbh, 6450 Hanau | Method for producing an electrical switch contact |
US3598639A (en) * | 1968-12-09 | 1971-08-10 | Bror Olov Nikolaus Hansson | Method of continuously producing metal wire and profiles |
US3700489A (en) * | 1970-07-30 | 1972-10-24 | Ethicon Inc | Process for applying a thin coating of polytetrafluoroethylene |
-
1973
- 1973-01-12 US US323133A patent/US3884787A/en not_active Expired - Lifetime
- 1973-12-27 NL NL7317670A patent/NL7317670A/xx not_active Application Discontinuation
-
1974
- 1974-01-07 CA CA189,611A patent/CA1018475A/en not_active Expired
- 1974-01-07 CH CH22474A patent/CH597622A5/xx not_active IP Right Cessation
- 1974-01-07 IL IL43966A patent/IL43966A/en unknown
- 1974-01-07 JP JP49005003A patent/JPS5747267B2/ja not_active Expired
- 1974-01-07 AT AT9674A patent/AT341335B/en not_active IP Right Cessation
- 1974-01-07 BE BE139580A patent/BE809464A/en not_active IP Right Cessation
- 1974-01-07 FR FR7400468A patent/FR2322667A1/en active Granted
- 1974-01-07 DE DE2400587A patent/DE2400587A1/en not_active Withdrawn
- 1974-01-07 LU LU69122A patent/LU69122A1/xx unknown
- 1974-01-07 GB GB64474A patent/GB1461921A/en not_active Expired
- 1974-01-10 DD DD175932A patent/DD109035A5/xx unknown
- 1974-01-11 SE SE7400351A patent/SE392919B/en unknown
- 1974-01-14 IT IT47682/74A patent/IT1002650B/en active
Also Published As
Publication number | Publication date |
---|---|
LU69122A1 (en) | 1975-12-09 |
DD109035A5 (en) | 1974-10-12 |
US3884787A (en) | 1975-05-20 |
CA1018475A (en) | 1977-10-04 |
FR2322667A1 (en) | 1977-04-01 |
CH597622A5 (en) | 1978-04-14 |
IT1002650B (en) | 1976-05-20 |
BE809464A (en) | 1974-07-08 |
IL43966A (en) | 1976-12-31 |
ATA9674A (en) | 1977-05-15 |
NL7317670A (en) | 1974-07-16 |
SE392919B (en) | 1977-04-25 |
GB1461921A (en) | 1977-01-19 |
JPS49104972A (en) | 1974-10-04 |
AT341335B (en) | 1978-02-10 |
DE2400587A1 (en) | 1974-07-18 |
JPS5747267B2 (en) | 1982-10-08 |
FR2322667B1 (en) | 1978-10-27 |
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