CA935120A - Method and apparatus for applying a film to a substrate surface - Google Patents

Method and apparatus for applying a film to a substrate surface

Info

Publication number
CA935120A
CA935120A CA102775A CA102775A CA935120A CA 935120 A CA935120 A CA 935120A CA 102775 A CA102775 A CA 102775A CA 102775 A CA102775 A CA 102775A CA 935120 A CA935120 A CA 935120A
Authority
CA
Canada
Prior art keywords
applying
film
substrate surface
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA102775A
Other versions
CA102775S (en
Inventor
J. Knowles Terence
A. Eaton Daniel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zenith Electronics LLC
Original Assignee
Zenith Radio Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zenith Radio Corp filed Critical Zenith Radio Corp
Application granted granted Critical
Publication of CA935120A publication Critical patent/CA935120A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
CA102775A 1970-04-01 1971-01-14 Method and apparatus for applying a film to a substrate surface Expired CA935120A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2457170A 1970-04-01 1970-04-01

Publications (1)

Publication Number Publication Date
CA935120A true CA935120A (en) 1973-10-09

Family

ID=21821276

Family Applications (1)

Application Number Title Priority Date Filing Date
CA102775A Expired CA935120A (en) 1970-04-01 1971-01-14 Method and apparatus for applying a film to a substrate surface

Country Status (2)

Country Link
US (1) US3669860A (en)
CA (1) CA935120A (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847115A (en) * 1973-05-02 1974-11-12 Nasa System for depositing thin films
JPS511398A (en) * 1974-04-04 1976-01-08 Matsushita Electric Ind Co Ltd
US4060470A (en) * 1974-12-06 1977-11-29 Clarke Peter J Sputtering apparatus and method
US4111782A (en) * 1974-12-23 1978-09-05 Telic Corporation Sputtering apparatus
US4013830A (en) * 1975-05-19 1977-03-22 Rca Corporation Video disc stylus
US4025410A (en) * 1975-08-25 1977-05-24 Western Electric Company, Inc. Sputtering apparatus and methods using a magnetic field
FR2324755A1 (en) * 1975-09-19 1977-04-15 Anvar HIGH SPEED OF DEPOSIT CATHODIC SPRAY DEVICE
US4046660A (en) * 1975-12-29 1977-09-06 Bell Telephone Laboratories, Incorporated Sputter coating with charged particle flux control
US4305801A (en) * 1980-04-16 1981-12-15 The United States Of America As Represented By The United States Department Of Energy Line-of-sight deposition method
JPH0689446B2 (en) * 1988-12-19 1994-11-09 株式会社日立製作所 Thin film forming equipment
US5662770A (en) 1993-04-16 1997-09-02 Micron Technology, Inc. Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks
IL108677A (en) * 1994-02-17 1997-11-20 Thin Films Ltd Sputtering method and apparatus for depositing a coating onto a substrate
JPH0860355A (en) * 1994-08-23 1996-03-05 Tel Varian Ltd Treating device
US5902461A (en) * 1997-09-03 1999-05-11 Applied Materials, Inc. Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma
US7294242B1 (en) * 1998-08-24 2007-11-13 Applied Materials, Inc. Collimated and long throw magnetron sputtering of nickel/iron films for magnetic recording head applications
US6497796B1 (en) * 1999-01-05 2002-12-24 Novellus Systems, Inc. Apparatus and method for controlling plasma uniformity across a substrate
US6579421B1 (en) 1999-01-07 2003-06-17 Applied Materials, Inc. Transverse magnetic field for ionized sputter deposition
DE102009041184A1 (en) * 2009-09-14 2011-09-15 Solarworld Innovations Gmbh Coating apparatus and method
WO2012097268A2 (en) * 2011-01-13 2012-07-19 Regents Of The University Of Minnesota Nanoparticle deposition systems
CN105121068A (en) 2013-02-15 2015-12-02 明尼苏达大学董事会 Particle functionalization
GB201713385D0 (en) * 2017-08-21 2017-10-04 Gencoa Ltd Ion-enhanced deposition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458426A (en) * 1966-05-25 1969-07-29 Fabri Tek Inc Symmetrical sputtering apparatus with plasma confinement
US3451912A (en) * 1966-07-15 1969-06-24 Ibm Schottky-barrier diode formed by sputter-deposition processes
GB1217685A (en) * 1967-06-05 1970-12-31 Smiths Industries Ltd Improvements in or relating to methods and apparatus for sputtering of materials
US3556048A (en) * 1968-09-05 1971-01-19 Nasa Vacuum evaporator with electromagnetic ion steering

Also Published As

Publication number Publication date
US3669860A (en) 1972-06-13

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