AT341335B - METHOD OF COATING A LONG STRETCHED BEAM WITH A THIN FILM BY STEAM PLASMA COATING AND DEVICE FOR CARRYING OUT THIS METHOD - Google Patents

METHOD OF COATING A LONG STRETCHED BEAM WITH A THIN FILM BY STEAM PLASMA COATING AND DEVICE FOR CARRYING OUT THIS METHOD

Info

Publication number
AT341335B
AT341335B AT9674A AT9674A AT341335B AT 341335 B AT341335 B AT 341335B AT 9674 A AT9674 A AT 9674A AT 9674 A AT9674 A AT 9674A AT 341335 B AT341335 B AT 341335B
Authority
AT
Austria
Prior art keywords
coating
carrying
thin film
long stretched
steam plasma
Prior art date
Application number
AT9674A
Other languages
German (de)
Other versions
ATA9674A (en
Original Assignee
Coulter Information Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Information Systems filed Critical Coulter Information Systems
Publication of ATA9674A publication Critical patent/ATA9674A/en
Application granted granted Critical
Publication of AT341335B publication Critical patent/AT341335B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
AT9674A 1973-01-12 1974-01-07 METHOD OF COATING A LONG STRETCHED BEAM WITH A THIN FILM BY STEAM PLASMA COATING AND DEVICE FOR CARRYING OUT THIS METHOD AT341335B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (2)

Publication Number Publication Date
ATA9674A ATA9674A (en) 1977-05-15
AT341335B true AT341335B (en) 1978-02-10

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
AT9674A AT341335B (en) 1973-01-12 1974-01-07 METHOD OF COATING A LONG STRETCHED BEAM WITH A THIN FILM BY STEAM PLASMA COATING AND DEVICE FOR CARRYING OUT THIS METHOD

Country Status (15)

Country Link
US (1) US3884787A (en)
JP (1) JPS5747267B2 (en)
AT (1) AT341335B (en)
BE (1) BE809464A (en)
CA (1) CA1018475A (en)
CH (1) CH597622A5 (en)
DD (1) DD109035A5 (en)
DE (1) DE2400587A1 (en)
FR (1) FR2322667A1 (en)
GB (1) GB1461921A (en)
IL (1) IL43966A (en)
IT (1) IT1002650B (en)
LU (1) LU69122A1 (en)
NL (1) NL7317670A (en)
SE (1) SE392919B (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
JPS5976571A (en) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd Applicator
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
NL8602759A (en) * 1986-10-31 1988-05-16 Bekaert Sa Nv METHOD AND DEVICE FOR TREATING AN LONG-TERM SUBSTRATE COVERED; AND SUBSTRATES TREATED ACCORDING TO THAT METHOD AND ARTICLES OF POLYMER MATERIAL REINFORCED WITH THESE SUBSTRATES.
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
DE3886754D1 (en) * 1988-10-19 1994-02-10 Ibm Deutschland Device for plasma or reactive ion etching and method for etching poorly heat-conducting substrates.
DE29600991U1 (en) * 1996-01-20 1997-05-22 Straemke Siegfried Dr Ing Plasma reactor
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
EP1347077B1 (en) * 2002-03-15 2006-05-17 VHF Technologies SA Apparatus and method for the production of flexible semiconductor devices
CH696013A5 (en) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance An apparatus for treating a strip-like material in a plasma-assisted process.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
MX2007007907A (en) * 2004-12-29 2007-08-17 Sca Hygiene Prod Ab A hands-free paper towel dispenser and dispensing system.
DE102005058869A1 (en) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Method and device for coating strips
KR100750654B1 (en) * 2006-09-15 2007-08-20 한국전기연구원 Long tape deposition apparatus
KR100928222B1 (en) * 2007-10-31 2009-11-24 한국전기연구원 Joist deposition apparatus with guide roller
US20090194505A1 (en) * 2008-01-24 2009-08-06 Microcontinuum, Inc. Vacuum coating techniques
EP2113585A1 (en) * 2008-04-29 2009-11-04 Applied Materials, Inc. Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
PL2508315T3 (en) 2011-04-07 2014-02-28 Gedore Werkzeugfabrik Gmbh & Co Kg Splitting wedge
WO2014120295A2 (en) * 2012-10-22 2014-08-07 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (en) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 Apparatus for depositing organic material
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
KR20230053660A (en) * 2020-08-21 2023-04-21 어플라이드 머티어리얼스, 인코포레이티드 A processing system for processing a flexible substrate and a method for measuring at least one of a property of the flexible substrate and a property of one or more coatings on the flexible substrate.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
NL143409C (en) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
BE599444A (en) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (en) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Method for producing an electrical switch contact
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Also Published As

Publication number Publication date
DE2400587A1 (en) 1974-07-18
LU69122A1 (en) 1975-12-09
US3884787A (en) 1975-05-20
JPS49104972A (en) 1974-10-04
SE392919B (en) 1977-04-25
FR2322667A1 (en) 1977-04-01
CA1018475A (en) 1977-10-04
JPS5747267B2 (en) 1982-10-08
GB1461921A (en) 1977-01-19
NL7317670A (en) 1974-07-16
IT1002650B (en) 1976-05-20
CH597622A5 (en) 1978-04-14
IL43966A0 (en) 1974-06-30
BE809464A (en) 1974-07-08
FR2322667B1 (en) 1978-10-27
IL43966A (en) 1976-12-31
ATA9674A (en) 1977-05-15
DD109035A5 (en) 1974-10-12

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Legal Events

Date Code Title Description
EFA Change in the company name
ELJ Ceased due to non-payment of the annual fee
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee