FR2322667A1 - METHOD AND APPARATUS FOR DEPOSITING A THIN LAYER ON A SUBSTRATE - Google Patents

METHOD AND APPARATUS FOR DEPOSITING A THIN LAYER ON A SUBSTRATE

Info

Publication number
FR2322667A1
FR2322667A1 FR7400468A FR7400468A FR2322667A1 FR 2322667 A1 FR2322667 A1 FR 2322667A1 FR 7400468 A FR7400468 A FR 7400468A FR 7400468 A FR7400468 A FR 7400468A FR 2322667 A1 FR2322667 A1 FR 2322667A1
Authority
FR
France
Prior art keywords
depositing
substrate
thin layer
thin
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7400468A
Other languages
French (fr)
Other versions
FR2322667B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Information Systems Inc
Original Assignee
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Information Systems Inc filed Critical Coulter Information Systems Inc
Publication of FR2322667A1 publication Critical patent/FR2322667A1/en
Application granted granted Critical
Publication of FR2322667B1 publication Critical patent/FR2322667B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
FR7400468A 1973-01-12 1974-01-07 METHOD AND APPARATUS FOR DEPOSITING A THIN LAYER ON A SUBSTRATE Granted FR2322667A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (2)

Publication Number Publication Date
FR2322667A1 true FR2322667A1 (en) 1977-04-01
FR2322667B1 FR2322667B1 (en) 1978-10-27

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7400468A Granted FR2322667A1 (en) 1973-01-12 1974-01-07 METHOD AND APPARATUS FOR DEPOSITING A THIN LAYER ON A SUBSTRATE

Country Status (15)

Country Link
US (1) US3884787A (en)
JP (1) JPS5747267B2 (en)
AT (1) AT341335B (en)
BE (1) BE809464A (en)
CA (1) CA1018475A (en)
CH (1) CH597622A5 (en)
DD (1) DD109035A5 (en)
DE (1) DE2400587A1 (en)
FR (1) FR2322667A1 (en)
GB (1) GB1461921A (en)
IL (1) IL43966A (en)
IT (1) IT1002650B (en)
LU (1) LU69122A1 (en)
NL (1) NL7317670A (en)
SE (1) SE392919B (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
JPS5976571A (en) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd Applicator
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
NL8602759A (en) * 1986-10-31 1988-05-16 Bekaert Sa Nv METHOD AND DEVICE FOR TREATING AN LONG-TERM SUBSTRATE COVERED; AND SUBSTRATES TREATED ACCORDING TO THAT METHOD AND ARTICLES OF POLYMER MATERIAL REINFORCED WITH THESE SUBSTRATES.
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
EP0364619B1 (en) * 1988-10-19 1993-12-29 Ibm Deutschland Gmbh Device for plasma or reactive ion etching, and process for etching thermally poorly conducting substrates
DE29600991U1 (en) * 1996-01-20 1997-05-22 Strämke, Siegfried, Dr.-Ing., 52538 Selfkant Plasma reactor
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
EP1347077B1 (en) * 2002-03-15 2006-05-17 VHF Technologies SA Apparatus and method for the production of flexible semiconductor devices
CH696013A5 (en) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance An apparatus for treating a strip-like material in a plasma-assisted process.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
ES2344904T3 (en) * 2004-12-29 2010-09-09 Sca Hygiene Products Ab "HANDS-FREE" PAPER TOWEL DISPENSER AND A DISPENSING SYSTEM.
DE102005058869A1 (en) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Method and device for coating strips
KR100750654B1 (en) * 2006-09-15 2007-08-20 한국전기연구원 Long tape deposition apparatus
KR100928222B1 (en) * 2007-10-31 2009-11-24 한국전기연구원 Joist deposition apparatus with guide roller
US20090194505A1 (en) * 2008-01-24 2009-08-06 Microcontinuum, Inc. Vacuum coating techniques
EP2113585A1 (en) * 2008-04-29 2009-11-04 Applied Materials, Inc. Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
PL2508315T3 (en) 2011-04-07 2014-02-28 Gedore Werkzeugfabrik Gmbh & Co Kg Splitting wedge
WO2014120295A2 (en) * 2012-10-22 2014-08-07 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (en) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 Apparatus for depositing organic material
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
KR20230053660A (en) * 2020-08-21 2023-04-21 어플라이드 머티어리얼스, 인코포레이티드 A processing system for processing a flexible substrate and a method for measuring at least one of a property of the flexible substrate and a property of one or more coatings on the flexible substrate.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
NL143409C (en) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
BE599444A (en) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (en) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Method for producing an electrical switch contact
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Also Published As

Publication number Publication date
AT341335B (en) 1978-02-10
US3884787A (en) 1975-05-20
LU69122A1 (en) 1975-12-09
CA1018475A (en) 1977-10-04
JPS5747267B2 (en) 1982-10-08
ATA9674A (en) 1977-05-15
GB1461921A (en) 1977-01-19
DE2400587A1 (en) 1974-07-18
NL7317670A (en) 1974-07-16
IL43966A (en) 1976-12-31
CH597622A5 (en) 1978-04-14
BE809464A (en) 1974-07-08
DD109035A5 (en) 1974-10-12
IT1002650B (en) 1976-05-20
IL43966A0 (en) 1974-06-30
JPS49104972A (en) 1974-10-04
SE392919B (en) 1977-04-25
FR2322667B1 (en) 1978-10-27

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Legal Events

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CD Change of name or company name
ST Notification of lapse