CA1035255A - Thin film coating apparatus - Google Patents

Thin film coating apparatus

Info

Publication number
CA1035255A
CA1035255A CA213,557A CA213557A CA1035255A CA 1035255 A CA1035255 A CA 1035255A CA 213557 A CA213557 A CA 213557A CA 1035255 A CA1035255 A CA 1035255A
Authority
CA
Canada
Prior art keywords
thin film
coating apparatus
film coating
thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA213,557A
Other languages
French (fr)
Other versions
CA213557S (en
Inventor
Richard Wahl
Richard G. Christensen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1035255A publication Critical patent/CA1035255A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CA213,557A 1973-12-03 1974-11-13 Thin film coating apparatus Expired CA1035255A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00421020A US3853091A (en) 1973-12-03 1973-12-03 Thin film coating apparatus

Publications (1)

Publication Number Publication Date
CA1035255A true CA1035255A (en) 1978-07-25

Family

ID=23668864

Family Applications (1)

Application Number Title Priority Date Filing Date
CA213,557A Expired CA1035255A (en) 1973-12-03 1974-11-13 Thin film coating apparatus

Country Status (11)

Country Link
US (1) US3853091A (en)
JP (1) JPS5325718B2 (en)
CA (1) CA1035255A (en)
CH (1) CH606479A5 (en)
DE (1) DE2448023B2 (en)
ES (1) ES432508A1 (en)
FR (1) FR2253270B1 (en)
GB (1) GB1474927A (en)
IT (1) IT1022786B (en)
NL (1) NL7415450A (en)
SE (1) SE397435B (en)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH580990A5 (en) * 1974-03-04 1976-10-29 Ebauches Sa
US4010710A (en) * 1974-09-20 1977-03-08 Rockwell International Corporation Apparatus for coating substrates
JPS5266756U (en) * 1975-11-13 1977-05-17
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US3983838A (en) * 1975-12-31 1976-10-05 International Business Machines Corporation Planetary evaporator
US4222345A (en) * 1978-11-30 1980-09-16 Optical Coating Laboratory, Inc. Vacuum coating apparatus with rotary motion assembly
US4241698A (en) * 1979-02-09 1980-12-30 Mca Discovision, Inc. Vacuum evaporation system for the deposition of a thin evaporated layer having a high degree of uniformity
DE2917841A1 (en) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg EVAPORATOR FOR VACUUM EVAPORATION SYSTEMS
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
DE3306870A1 (en) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln DEVICE FOR PRODUCING LAYERS WITH ROTATIONALLY SYMMETRIC THICK PROFILE BY CATODENSIONING
DE3310044A1 (en) * 1983-03-19 1984-09-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt METHOD AND ARRANGEMENT FOR COATING A SUBSTRATE
DE3422718A1 (en) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug VACUUM PLASMA COATING SYSTEM
US4640846A (en) * 1984-09-25 1987-02-03 Yue Kuo Semiconductor spin coating method
JPS61227165A (en) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp Vapor deposition device
US4662310A (en) * 1986-07-09 1987-05-05 Deco Tools, Inc. Robotic paint masking machine
DE3702775A1 (en) * 1987-01-30 1988-08-11 Leybold Ag DEVICE FOR QUASI-CONTINUOUS TREATMENT OF SUBSTRATES
DE3705592A1 (en) * 1987-02-21 1988-09-01 Convac Gmbh Geraete Zur Halble Device for the thin coating (lacquering) of disc-shaped substrates for electronic applications, for example circuit boards, Compact Discs, etc.
DE3705946A1 (en) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch DEVICE FOR TREATING PLASTIC MOLDINGS
DE3705945A1 (en) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch DEVICE FOR PRODUCING HOLLOW BODIES FROM THERMOPLASTIC PLASTIC
US5002011A (en) * 1987-04-14 1991-03-26 Kabushiki Kaisha Toshiba Vapor deposition apparatus
JPH01143211A (en) * 1987-11-27 1989-06-05 Takatori Haitetsuku:Kk Sticking and cutting of protective tape for wafer and device therefor
EP0362418A1 (en) * 1988-10-03 1990-04-11 International Business Machines Corporation Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method
DE4025659A1 (en) * 1990-08-14 1992-02-20 Leybold Ag CYCLING GEARBOXES WITH ONE WHEEL SET, ESPECIALLY FOR DEVICES FOR COATING SUBSTRATES
JPH0828333B2 (en) * 1992-11-30 1996-03-21 株式会社半導体プロセス研究所 Semiconductor device manufacturing equipment
AU7403694A (en) * 1994-07-19 1996-02-16 American Plating Systems, Inc. Electrolytic plating apparatus and method
GB2291889B (en) * 1994-07-27 1998-02-25 Gec Marconi Avionics Holdings Depositing coatings of materials on a substrate
FR2733253B1 (en) * 1995-04-24 1997-06-13 Commissariat Energie Atomique DEVICE FOR DEPOSITING MATERIAL BY EVAPORATION ON LARGE SURFACE SUBSTRATES
US5702532A (en) * 1995-05-31 1997-12-30 Hughes Aircraft Company MOCVD reactor system for indium antimonide epitaxial material
US5776256A (en) * 1996-10-01 1998-07-07 The United States Of America As Represented By The Secretary Of The Air Force Coating chamber planetary gear mirror rotating system
DE19738234C1 (en) 1997-09-02 1998-10-22 Fraunhofer Ges Forschung Apparatus for producing sputtered coatings consisting of hard substances
JPH11200017A (en) * 1998-01-20 1999-07-27 Nikon Corp Optical thin film deposition apparatus and optical element deposited by the optical thin film deposition apparatus
US6203619B1 (en) 1998-10-26 2001-03-20 Symetrix Corporation Multiple station apparatus for liquid source fabrication of thin films
JP4614538B2 (en) * 1998-12-15 2011-01-19 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ Vacuum processing planetary system workpiece carrier
US7081166B2 (en) 1999-12-15 2006-07-25 Unaxis Balzers Aktiengesellschaft Planetary system workpiece support and method for surface treatment of workpieces
US6749764B1 (en) 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE102004027989B4 (en) * 2004-06-09 2007-05-10 Esser, Stefan, Dr.-Ing. Workpiece carrier device for holding workpieces
WO2013189935A1 (en) * 2012-06-18 2013-12-27 Oc Oerlikon Balzers Ag Pvd apparatus for directional material deposition, methods and workpiece
JP6019310B1 (en) * 2015-04-16 2016-11-02 ナルックス株式会社 Vapor deposition apparatus and manufacturing method including film forming process by vapor deposition apparatus
DE102018126862A1 (en) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Workpiece carrier device and coating arrangement

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2351537A (en) * 1942-03-05 1944-06-13 Spencer Lens Co Apparatus for treating surfaces
US3023727A (en) * 1959-09-10 1962-03-06 Ibm Substrate processing apparatus
US3352282A (en) * 1965-07-23 1967-11-14 Bendix Corp Vacuum deposit device including means to register and manipulate mask and substrate elements
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses

Also Published As

Publication number Publication date
NL7415450A (en) 1975-06-05
GB1474927A (en) 1977-05-25
US3853091A (en) 1974-12-10
JPS5087576A (en) 1975-07-14
ES432508A1 (en) 1977-03-01
SE7414445L (en) 1975-06-04
SE397435B (en) 1977-10-31
FR2253270B1 (en) 1977-03-25
IT1022786B (en) 1978-04-20
DE2448023A1 (en) 1975-06-05
FR2253270A1 (en) 1975-06-27
JPS5325718B2 (en) 1978-07-28
DE2448023B2 (en) 1976-11-04
CH606479A5 (en) 1978-10-31

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