GB2291889B - Depositing coatings of materials on a substrate - Google Patents

Depositing coatings of materials on a substrate

Info

Publication number
GB2291889B
GB2291889B GB9415094A GB9415094A GB2291889B GB 2291889 B GB2291889 B GB 2291889B GB 9415094 A GB9415094 A GB 9415094A GB 9415094 A GB9415094 A GB 9415094A GB 2291889 B GB2291889 B GB 2291889B
Authority
GB
United Kingdom
Prior art keywords
substrate
materials
depositing coatings
coatings
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9415094A
Other versions
GB2291889A (en
GB9415094D0 (en
Inventor
Roger Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonardo MW Ltd
Original Assignee
GEC Marconi Avionics Holdings Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GEC Marconi Avionics Holdings Ltd filed Critical GEC Marconi Avionics Holdings Ltd
Priority to GB9415094A priority Critical patent/GB2291889B/en
Publication of GB9415094D0 publication Critical patent/GB9415094D0/en
Publication of GB2291889A publication Critical patent/GB2291889A/en
Application granted granted Critical
Publication of GB2291889B publication Critical patent/GB2291889B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB9415094A 1994-07-27 1994-07-27 Depositing coatings of materials on a substrate Expired - Fee Related GB2291889B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9415094A GB2291889B (en) 1994-07-27 1994-07-27 Depositing coatings of materials on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9415094A GB2291889B (en) 1994-07-27 1994-07-27 Depositing coatings of materials on a substrate

Publications (3)

Publication Number Publication Date
GB9415094D0 GB9415094D0 (en) 1994-09-28
GB2291889A GB2291889A (en) 1996-02-07
GB2291889B true GB2291889B (en) 1998-02-25

Family

ID=10758921

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9415094A Expired - Fee Related GB2291889B (en) 1994-07-27 1994-07-27 Depositing coatings of materials on a substrate

Country Status (1)

Country Link
GB (1) GB2291889B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19812562A1 (en) * 1998-03-21 1999-09-23 Joachim Sacher Coating method and device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3853091A (en) * 1973-12-03 1974-12-10 Ibm Thin film coating apparatus
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
GB2087766A (en) * 1980-11-21 1982-06-03 United Technologies Corp Indexing apparatus for electron beam drilling or welding
GB2191335A (en) * 1986-05-29 1987-12-09 Mitsubishi Electric Corp Substrate support structure for ion implantation device
US5029555A (en) * 1988-03-10 1991-07-09 International Business Machines Corporation Wafer holder method and apparatus in a vacuum deposition system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3853091A (en) * 1973-12-03 1974-12-10 Ibm Thin film coating apparatus
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
GB2087766A (en) * 1980-11-21 1982-06-03 United Technologies Corp Indexing apparatus for electron beam drilling or welding
GB2191335A (en) * 1986-05-29 1987-12-09 Mitsubishi Electric Corp Substrate support structure for ion implantation device
US5029555A (en) * 1988-03-10 1991-07-09 International Business Machines Corporation Wafer holder method and apparatus in a vacuum deposition system

Also Published As

Publication number Publication date
GB2291889A (en) 1996-02-07
GB9415094D0 (en) 1994-09-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20010727