GB2273110B - Depositing different materials on a substrate - Google Patents
Depositing different materials on a substrateInfo
- Publication number
- GB2273110B GB2273110B GB9324494A GB9324494A GB2273110B GB 2273110 B GB2273110 B GB 2273110B GB 9324494 A GB9324494 A GB 9324494A GB 9324494 A GB9324494 A GB 9324494A GB 2273110 B GB2273110 B GB 2273110B
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- different materials
- depositing different
- depositing
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
- C23C14/0052—Bombardment of substrates by reactive ion beams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9324494A GB2273110B (en) | 1992-12-03 | 1993-11-29 | Depositing different materials on a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB929225270A GB9225270D0 (en) | 1992-12-03 | 1992-12-03 | Depositing different materials on a substrate |
GB9324494A GB2273110B (en) | 1992-12-03 | 1993-11-29 | Depositing different materials on a substrate |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9324494D0 GB9324494D0 (en) | 1994-01-12 |
GB2273110A GB2273110A (en) | 1994-06-08 |
GB2273110B true GB2273110B (en) | 1996-01-24 |
Family
ID=26302090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9324494A Expired - Fee Related GB2273110B (en) | 1992-12-03 | 1993-11-29 | Depositing different materials on a substrate |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2273110B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07133192A (en) * | 1993-11-04 | 1995-05-23 | Sumitomo Electric Ind Ltd | Film forming device and film forming method |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB953556A (en) * | 1959-12-31 | 1964-03-25 | Siemens Ag | Improvements in or relating to the preparation of the surfaces of metals or semi-conductor bodies |
GB1372167A (en) * | 1972-05-12 | 1974-10-30 | Cit Alcatel | Method of depositing thin metallic layers |
GB1465745A (en) * | 1973-02-16 | 1977-03-02 | Bosch Gmbh Robert | Sputtering apparatus |
GB1604056A (en) * | 1977-01-06 | 1981-12-02 | Mitsubishi Electric Corp | Process for forming reflective metallic film and thermal absorption film on inner surface of face panel and apparatus therefor |
EP0326843A1 (en) * | 1988-01-29 | 1989-08-09 | Multi-Arc Oberflächentechnik GmbH | Coating chamber with regulated composition of the gas mixture |
US4975168A (en) * | 1988-04-20 | 1990-12-04 | Casio Computer Co., Ltd. | Method of forming transparent conductive film and apparatus for forming the same |
EP0410627A1 (en) * | 1989-07-27 | 1991-01-30 | Kabushiki Kaisha Toshiba | Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium |
US5015353A (en) * | 1987-09-30 | 1991-05-14 | The United States Of America As Represented By The Secretary Of The Navy | Method for producing substoichiometric silicon nitride of preselected proportions |
EP0428358A2 (en) * | 1989-11-13 | 1991-05-22 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
EP0429993A2 (en) * | 1989-11-17 | 1991-06-05 | Nissin Electric Company, Limited | Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head |
-
1993
- 1993-11-29 GB GB9324494A patent/GB2273110B/en not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB953556A (en) * | 1959-12-31 | 1964-03-25 | Siemens Ag | Improvements in or relating to the preparation of the surfaces of metals or semi-conductor bodies |
GB1372167A (en) * | 1972-05-12 | 1974-10-30 | Cit Alcatel | Method of depositing thin metallic layers |
GB1465745A (en) * | 1973-02-16 | 1977-03-02 | Bosch Gmbh Robert | Sputtering apparatus |
GB1604056A (en) * | 1977-01-06 | 1981-12-02 | Mitsubishi Electric Corp | Process for forming reflective metallic film and thermal absorption film on inner surface of face panel and apparatus therefor |
US5015353A (en) * | 1987-09-30 | 1991-05-14 | The United States Of America As Represented By The Secretary Of The Navy | Method for producing substoichiometric silicon nitride of preselected proportions |
EP0326843A1 (en) * | 1988-01-29 | 1989-08-09 | Multi-Arc Oberflächentechnik GmbH | Coating chamber with regulated composition of the gas mixture |
US4975168A (en) * | 1988-04-20 | 1990-12-04 | Casio Computer Co., Ltd. | Method of forming transparent conductive film and apparatus for forming the same |
EP0410627A1 (en) * | 1989-07-27 | 1991-01-30 | Kabushiki Kaisha Toshiba | Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium |
EP0428358A2 (en) * | 1989-11-13 | 1991-05-22 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
EP0429993A2 (en) * | 1989-11-17 | 1991-06-05 | Nissin Electric Company, Limited | Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head |
Also Published As
Publication number | Publication date |
---|---|
GB2273110A (en) | 1994-06-08 |
GB9324494D0 (en) | 1994-01-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20051129 |