GB9324494D0 - Depositing different materials on a substrate - Google Patents

Depositing different materials on a substrate

Info

Publication number
GB9324494D0
GB9324494D0 GB939324494A GB9324494A GB9324494D0 GB 9324494 D0 GB9324494 D0 GB 9324494D0 GB 939324494 A GB939324494 A GB 939324494A GB 9324494 A GB9324494 A GB 9324494A GB 9324494 D0 GB9324494 D0 GB 9324494D0
Authority
GB
United Kingdom
Prior art keywords
substrate
different materials
depositing different
depositing
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB939324494A
Other versions
GB2273110B (en
GB2273110A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonardo MW Ltd
Original Assignee
GEC Marconi Avionics Holdings Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB929225270A external-priority patent/GB9225270D0/en
Application filed by GEC Marconi Avionics Holdings Ltd filed Critical GEC Marconi Avionics Holdings Ltd
Priority to GB9324494A priority Critical patent/GB2273110B/en
Publication of GB9324494D0 publication Critical patent/GB9324494D0/en
Publication of GB2273110A publication Critical patent/GB2273110A/en
Application granted granted Critical
Publication of GB2273110B publication Critical patent/GB2273110B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB9324494A 1992-12-03 1993-11-29 Depositing different materials on a substrate Expired - Fee Related GB2273110B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9324494A GB2273110B (en) 1992-12-03 1993-11-29 Depositing different materials on a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB929225270A GB9225270D0 (en) 1992-12-03 1992-12-03 Depositing different materials on a substrate
GB9324494A GB2273110B (en) 1992-12-03 1993-11-29 Depositing different materials on a substrate

Publications (3)

Publication Number Publication Date
GB9324494D0 true GB9324494D0 (en) 1994-01-12
GB2273110A GB2273110A (en) 1994-06-08
GB2273110B GB2273110B (en) 1996-01-24

Family

ID=26302090

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9324494A Expired - Fee Related GB2273110B (en) 1992-12-03 1993-11-29 Depositing different materials on a substrate

Country Status (1)

Country Link
GB (1) GB2273110B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07133192A (en) * 1993-11-04 1995-05-23 Sumitomo Electric Ind Ltd Film forming device and film forming method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB953556A (en) * 1959-12-31 1964-03-25 Siemens Ag Improvements in or relating to the preparation of the surfaces of metals or semi-conductor bodies
FR2183603B1 (en) * 1972-05-12 1974-08-30 Cit Alcatel
DE2307649B2 (en) * 1973-02-16 1980-07-31 Robert Bosch Gmbh, 7000 Stuttgart Arrangement for sputtering different materials on a substrate
JPS5385153A (en) * 1977-01-06 1978-07-27 Mitsubishi Electric Corp Forming method for light reflective metallic film and heat absorbent material film on face panel inside and its unit
US5015353A (en) * 1987-09-30 1991-05-14 The United States Of America As Represented By The Secretary Of The Navy Method for producing substoichiometric silicon nitride of preselected proportions
DE8801079U1 (en) * 1988-01-29 1989-06-01 Interatom Gmbh, 5060 Bergisch Gladbach, De
JPH01268859A (en) * 1988-04-20 1989-10-26 Casio Comput Co Ltd Formation of transparent conductive film and device therefor
EP0410627A1 (en) * 1989-07-27 1991-01-30 Kabushiki Kaisha Toshiba Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
ATE189272T1 (en) * 1989-11-13 2000-02-15 Optical Coating Laboratory Inc GEOMETRY AND DESIGNS OF A MAGNETRON SPUTTING DEVICE
EP0429993B1 (en) * 1989-11-17 1995-08-02 Nissin Electric Company, Limited Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head

Also Published As

Publication number Publication date
GB2273110B (en) 1996-01-24
GB2273110A (en) 1994-06-08

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20051129