JPS5217814A - Photoresist coating method - Google Patents
Photoresist coating methodInfo
- Publication number
- JPS5217814A JPS5217814A JP9239475A JP9239475A JPS5217814A JP S5217814 A JPS5217814 A JP S5217814A JP 9239475 A JP9239475 A JP 9239475A JP 9239475 A JP9239475 A JP 9239475A JP S5217814 A JPS5217814 A JP S5217814A
- Authority
- JP
- Japan
- Prior art keywords
- coating method
- photoresist coating
- photoresist
- coat
- circumference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
- G03C2001/7403—Air jets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Abstract
PURPOSE:To coat a photoresist in uniform thickness on a support by mechanically removing a coated film of a silver halide emulsion in its circumference.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9239475A JPS5217814A (en) | 1975-07-29 | 1975-07-29 | Photoresist coating method |
DE19762634144 DE2634144A1 (en) | 1975-07-29 | 1976-07-29 | Coating film or plates with silver halide emulsion - partic. centrifugal coating with subsequent removal of thickened edge zone |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9239475A JPS5217814A (en) | 1975-07-29 | 1975-07-29 | Photoresist coating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5217814A true JPS5217814A (en) | 1977-02-10 |
Family
ID=14053192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9239475A Pending JPS5217814A (en) | 1975-07-29 | 1975-07-29 | Photoresist coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5217814A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6031255A (en) * | 1983-07-29 | 1985-02-18 | Rohm Co Ltd | Method for flux deposition to semiconductor frame |
WO2005084825A1 (en) * | 2004-03-04 | 2005-09-15 | Hoya Corporation | Coating apparatus and method of manufacturing optical lens |
WO2005084824A1 (en) * | 2004-03-04 | 2005-09-15 | Hoya Corporation | Coating apparatus for optical lens |
-
1975
- 1975-07-29 JP JP9239475A patent/JPS5217814A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6031255A (en) * | 1983-07-29 | 1985-02-18 | Rohm Co Ltd | Method for flux deposition to semiconductor frame |
WO2005084825A1 (en) * | 2004-03-04 | 2005-09-15 | Hoya Corporation | Coating apparatus and method of manufacturing optical lens |
WO2005084824A1 (en) * | 2004-03-04 | 2005-09-15 | Hoya Corporation | Coating apparatus for optical lens |
US7779778B2 (en) | 2004-03-04 | 2010-08-24 | Hoya Corporation | Coating apparatus for optical lens |
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