JPS5217813A - Photographic light sensitive material and method of spin coating to provide the same - Google Patents

Photographic light sensitive material and method of spin coating to provide the same

Info

Publication number
JPS5217813A
JPS5217813A JP9239375A JP9239375A JPS5217813A JP S5217813 A JPS5217813 A JP S5217813A JP 9239375 A JP9239375 A JP 9239375A JP 9239375 A JP9239375 A JP 9239375A JP S5217813 A JPS5217813 A JP S5217813A
Authority
JP
Japan
Prior art keywords
same
spin coating
sensitive material
light sensitive
photographic light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9239375A
Other languages
Japanese (ja)
Other versions
JPS5713863B2 (en
Inventor
Masamichi Sato
Itsuo Fujii
Kazuhiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP9239375A priority Critical patent/JPS5217813A/en
Priority to DE19762634144 priority patent/DE2634144A1/en
Publication of JPS5217813A publication Critical patent/JPS5217813A/en
Publication of JPS5713863B2 publication Critical patent/JPS5713863B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G03C2001/7403—Air jets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To coat a photoresist of uniform thickness on a support by feeding warm water in its circumference and dissolving a silver halide emulsion in this region.
JP9239375A 1975-07-29 1975-07-29 Photographic light sensitive material and method of spin coating to provide the same Granted JPS5217813A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9239375A JPS5217813A (en) 1975-07-29 1975-07-29 Photographic light sensitive material and method of spin coating to provide the same
DE19762634144 DE2634144A1 (en) 1975-07-29 1976-07-29 Coating film or plates with silver halide emulsion - partic. centrifugal coating with subsequent removal of thickened edge zone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9239375A JPS5217813A (en) 1975-07-29 1975-07-29 Photographic light sensitive material and method of spin coating to provide the same

Publications (2)

Publication Number Publication Date
JPS5217813A true JPS5217813A (en) 1977-02-10
JPS5713863B2 JPS5713863B2 (en) 1982-03-19

Family

ID=14053164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9239375A Granted JPS5217813A (en) 1975-07-29 1975-07-29 Photographic light sensitive material and method of spin coating to provide the same

Country Status (1)

Country Link
JP (1) JPS5217813A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891637A (en) * 1981-11-27 1983-05-31 Nec Kyushu Ltd Developing device
JPS58107266U (en) * 1982-01-11 1983-07-21 三菱電機株式会社 Transistor type DC arc welding machine
US4510176A (en) * 1983-09-26 1985-04-09 At&T Bell Laboratories Removal of coating from periphery of a semiconductor wafer
US5718763A (en) * 1994-04-04 1998-02-17 Tokyo Electron Limited Resist processing apparatus for a rectangular substrate

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5892567U (en) * 1981-12-17 1983-06-23 いすゞ自動車株式会社 Exhaust recirculation valve device for internal combustion engine with supercharger
JPS6119665U (en) * 1984-07-12 1986-02-04 トヨタ自動車株式会社 Exhaust gas recirculation device for supercharged engines

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891637A (en) * 1981-11-27 1983-05-31 Nec Kyushu Ltd Developing device
JPS58107266U (en) * 1982-01-11 1983-07-21 三菱電機株式会社 Transistor type DC arc welding machine
US4510176A (en) * 1983-09-26 1985-04-09 At&T Bell Laboratories Removal of coating from periphery of a semiconductor wafer
US5718763A (en) * 1994-04-04 1998-02-17 Tokyo Electron Limited Resist processing apparatus for a rectangular substrate
US5853803A (en) * 1994-04-04 1998-12-29 Tokyo Electron Limited Resist processing method and apparatus

Also Published As

Publication number Publication date
JPS5713863B2 (en) 1982-03-19

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