JPS5217813A - Photographic light sensitive material and method of spin coating to provide the same - Google Patents
Photographic light sensitive material and method of spin coating to provide the sameInfo
- Publication number
- JPS5217813A JPS5217813A JP9239375A JP9239375A JPS5217813A JP S5217813 A JPS5217813 A JP S5217813A JP 9239375 A JP9239375 A JP 9239375A JP 9239375 A JP9239375 A JP 9239375A JP S5217813 A JPS5217813 A JP S5217813A
- Authority
- JP
- Japan
- Prior art keywords
- same
- spin coating
- sensitive material
- light sensitive
- photographic light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
- G03C2001/7403—Air jets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE:To coat a photoresist of uniform thickness on a support by feeding warm water in its circumference and dissolving a silver halide emulsion in this region.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9239375A JPS5217813A (en) | 1975-07-29 | 1975-07-29 | Photographic light sensitive material and method of spin coating to provide the same |
DE19762634144 DE2634144A1 (en) | 1975-07-29 | 1976-07-29 | Coating film or plates with silver halide emulsion - partic. centrifugal coating with subsequent removal of thickened edge zone |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9239375A JPS5217813A (en) | 1975-07-29 | 1975-07-29 | Photographic light sensitive material and method of spin coating to provide the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5217813A true JPS5217813A (en) | 1977-02-10 |
JPS5713863B2 JPS5713863B2 (en) | 1982-03-19 |
Family
ID=14053164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9239375A Granted JPS5217813A (en) | 1975-07-29 | 1975-07-29 | Photographic light sensitive material and method of spin coating to provide the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5217813A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5891637A (en) * | 1981-11-27 | 1983-05-31 | Nec Kyushu Ltd | Developing device |
JPS58107266U (en) * | 1982-01-11 | 1983-07-21 | 三菱電機株式会社 | Transistor type DC arc welding machine |
US4510176A (en) * | 1983-09-26 | 1985-04-09 | At&T Bell Laboratories | Removal of coating from periphery of a semiconductor wafer |
US5718763A (en) * | 1994-04-04 | 1998-02-17 | Tokyo Electron Limited | Resist processing apparatus for a rectangular substrate |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5892567U (en) * | 1981-12-17 | 1983-06-23 | いすゞ自動車株式会社 | Exhaust recirculation valve device for internal combustion engine with supercharger |
JPS6119665U (en) * | 1984-07-12 | 1986-02-04 | トヨタ自動車株式会社 | Exhaust gas recirculation device for supercharged engines |
-
1975
- 1975-07-29 JP JP9239375A patent/JPS5217813A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5891637A (en) * | 1981-11-27 | 1983-05-31 | Nec Kyushu Ltd | Developing device |
JPS58107266U (en) * | 1982-01-11 | 1983-07-21 | 三菱電機株式会社 | Transistor type DC arc welding machine |
US4510176A (en) * | 1983-09-26 | 1985-04-09 | At&T Bell Laboratories | Removal of coating from periphery of a semiconductor wafer |
US5718763A (en) * | 1994-04-04 | 1998-02-17 | Tokyo Electron Limited | Resist processing apparatus for a rectangular substrate |
US5853803A (en) * | 1994-04-04 | 1998-12-29 | Tokyo Electron Limited | Resist processing method and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5713863B2 (en) | 1982-03-19 |
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