JPS5249990A - Method for vacuum evaporation of multi layr film - Google Patents
Method for vacuum evaporation of multi layr filmInfo
- Publication number
- JPS5249990A JPS5249990A JP12493975A JP12493975A JPS5249990A JP S5249990 A JPS5249990 A JP S5249990A JP 12493975 A JP12493975 A JP 12493975A JP 12493975 A JP12493975 A JP 12493975A JP S5249990 A JPS5249990 A JP S5249990A
- Authority
- JP
- Japan
- Prior art keywords
- film
- vacuum evaporation
- layr
- evaporation
- multi layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:Method for vacuum evaporation of optical multi layer film, able to carrying out multi layer film evaporation with high accuracy, able to control the thickness of film with reliability by elevating temperature of plural monitor base plate at the same temperature with heating and making monitor plate exchangable at evaporation process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12493975A JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12493975A JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5249990A true JPS5249990A (en) | 1977-04-21 |
JPS5521106B2 JPS5521106B2 (en) | 1980-06-07 |
Family
ID=14897914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12493975A Granted JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5249990A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104647820A (en) * | 2015-03-16 | 2015-05-27 | 广东迪奥应用材料科技有限公司 | High-hardness high-dielectric constant cover plate with AR and AF functions |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204185U (en) * | 1981-06-19 | 1982-12-25 | ||
WO2002061169A1 (en) * | 2001-02-01 | 2002-08-08 | Nikon Corporation | Method and device for forming film, and method of manufacturing optical element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495834A (en) * | 1972-04-15 | 1974-01-19 |
-
1975
- 1975-10-17 JP JP12493975A patent/JPS5249990A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495834A (en) * | 1972-04-15 | 1974-01-19 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104647820A (en) * | 2015-03-16 | 2015-05-27 | 广东迪奥应用材料科技有限公司 | High-hardness high-dielectric constant cover plate with AR and AF functions |
Also Published As
Publication number | Publication date |
---|---|
JPS5521106B2 (en) | 1980-06-07 |
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