JPS5240070A - Process for production of semiconductor device - Google Patents
Process for production of semiconductor deviceInfo
- Publication number
- JPS5240070A JPS5240070A JP11561675A JP11561675A JPS5240070A JP S5240070 A JPS5240070 A JP S5240070A JP 11561675 A JP11561675 A JP 11561675A JP 11561675 A JP11561675 A JP 11561675A JP S5240070 A JPS5240070 A JP S5240070A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- channels
- depositing
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
PURPOSE: A method of depositing glass by an electrophoresis method wherein depositing of glass powder on the portions other than the channels o a silicone semiconductor substrate having channels is prevented.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11561675A JPS5240070A (en) | 1975-09-26 | 1975-09-26 | Process for production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11561675A JPS5240070A (en) | 1975-09-26 | 1975-09-26 | Process for production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5240070A true JPS5240070A (en) | 1977-03-28 |
Family
ID=14667050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11561675A Pending JPS5240070A (en) | 1975-09-26 | 1975-09-26 | Process for production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5240070A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56108507A (en) * | 1980-01-31 | 1981-08-28 | Tadao Goto | Continuous automatic dedusting apparatus for water supply piping |
JPS6320914U (en) * | 1986-07-26 | 1988-02-12 |
-
1975
- 1975-09-26 JP JP11561675A patent/JPS5240070A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56108507A (en) * | 1980-01-31 | 1981-08-28 | Tadao Goto | Continuous automatic dedusting apparatus for water supply piping |
JPS5847209B2 (en) * | 1980-01-31 | 1983-10-21 | 直夫 後藤 | Continuous automatic dust removal device in water pipes |
JPS6320914U (en) * | 1986-07-26 | 1988-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS523583A (en) | Crystal film forming process | |
JPS5224478A (en) | Semiconductor device manufacturing process | |
JPS5246784A (en) | Process for production of semiconductor device | |
JPS5249772A (en) | Process for production of semiconductor device | |
JPS5240070A (en) | Process for production of semiconductor device | |
JPS5248468A (en) | Process for production of semiconductor device | |
JPS5279654A (en) | Production of semiconductor device | |
JPS51114445A (en) | An apparatus for controlling a coating process | |
JPS5279664A (en) | Forming method for electrodes of semiconductor devices | |
JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
JPS5247675A (en) | Process for production of semiconductor device | |
JPS5236975A (en) | Process for production of semiconductor device | |
JPS51151071A (en) | Manufacturing method of a semiconductor apparatus | |
JPS5263070A (en) | Production of semiconductor element | |
JPS5227363A (en) | Formation method of glass film | |
JPS51140484A (en) | Method of etching wafer | |
JPS5240078A (en) | Process for production of semiconductor device | |
JPS5248469A (en) | Process for production of semiconductor device | |
JPS5227368A (en) | Selection etching method | |
JPS5242375A (en) | Process for production of semiconductor device | |
JPS51147244A (en) | Adjustment system of coder | |
JPS5210070A (en) | Method for manufacturing silicon semiconductor device | |
JPS5242368A (en) | Process for production of semiconductor device | |
JPS51115695A (en) | Manufacturing method of thin plate magnet | |
JPS51113571A (en) | Precision processing method of semi-conductor |