ATE88222T1 - Anlage und verfahren zur ablagerung einer duennen schicht auf ein durchsichtiges substrat, insbesondere zur herstellung von glasscheiben. - Google Patents

Anlage und verfahren zur ablagerung einer duennen schicht auf ein durchsichtiges substrat, insbesondere zur herstellung von glasscheiben.

Info

Publication number
ATE88222T1
ATE88222T1 AT88830503T AT88830503T ATE88222T1 AT E88222 T1 ATE88222 T1 AT E88222T1 AT 88830503 T AT88830503 T AT 88830503T AT 88830503 T AT88830503 T AT 88830503T AT E88222 T1 ATE88222 T1 AT E88222T1
Authority
AT
Austria
Prior art keywords
thin layer
depositing
manufacture
equipment
transparent substrate
Prior art date
Application number
AT88830503T
Other languages
English (en)
Inventor
Liberto Massarelli
Francesco Sebastiano
Original Assignee
Siv Soc Italiana Vetro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siv Soc Italiana Vetro filed Critical Siv Soc Italiana Vetro
Application granted granted Critical
Publication of ATE88222T1 publication Critical patent/ATE88222T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/005—Other surface treatment of glass not in the form of fibres or filaments by irradiation by atoms
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
  • Chemically Coating (AREA)
AT88830503T 1987-11-27 1988-11-22 Anlage und verfahren zur ablagerung einer duennen schicht auf ein durchsichtiges substrat, insbesondere zur herstellung von glasscheiben. ATE88222T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT8748644A IT1211938B (it) 1987-11-27 1987-11-27 Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature
EP88830503A EP0318441B1 (de) 1987-11-27 1988-11-22 Anlage und Verfahren zur Ablagerung einer dünnen Schicht auf ein durchsichtiges Substrat, insbesondere zur Herstellung von Glasscheiben

Publications (1)

Publication Number Publication Date
ATE88222T1 true ATE88222T1 (de) 1993-04-15

Family

ID=11267817

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88830503T ATE88222T1 (de) 1987-11-27 1988-11-22 Anlage und verfahren zur ablagerung einer duennen schicht auf ein durchsichtiges substrat, insbesondere zur herstellung von glasscheiben.

Country Status (11)

Country Link
US (1) US4933057A (de)
EP (1) EP0318441B1 (de)
JP (1) JPH01168862A (de)
AT (1) ATE88222T1 (de)
BR (1) BR8806229A (de)
DD (1) DD275861A5 (de)
DE (1) DE3880275T2 (de)
ES (1) ES2040896T3 (de)
IT (1) IT1211938B (de)
PL (1) PL161618B1 (de)
RU (1) RU1809840C (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5437778A (en) * 1990-07-10 1995-08-01 Telic Technologies Corporation Slotted cylindrical hollow cathode/magnetron sputtering device
US5073245A (en) * 1990-07-10 1991-12-17 Hedgcoth Virgle L Slotted cylindrical hollow cathode/magnetron sputtering device
US5277779A (en) * 1992-04-14 1994-01-11 Henshaw William F Rectangular cavity magnetron sputtering vapor source
US6444100B1 (en) 2000-02-11 2002-09-03 Seagate Technology Llc Hollow cathode sputter source
SG90171A1 (en) * 2000-09-26 2002-07-23 Inst Data Storage Sputtering device
DE10227048A1 (de) * 2002-06-17 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt
JP5160730B2 (ja) * 2002-09-19 2013-03-13 ジェネラル・プラズマ・インコーポレーテッド ビーム状プラズマ源
US7411352B2 (en) * 2002-09-19 2008-08-12 Applied Process Technologies, Inc. Dual plasma beam sources and method
US7038389B2 (en) * 2003-05-02 2006-05-02 Applied Process Technologies, Inc. Magnetron plasma source
KR20200036065A (ko) * 2016-03-30 2020-04-06 케이힌 람테크 가부시키가이샤 스퍼터링 캐소드, 스퍼터링 장치 및 성막체의 제조 방법
US20230029343A1 (en) * 2021-07-20 2023-01-26 Canon Kabushiki Kaisha Sputtering apparatus, film formation method, and method for manufacturing product

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1425754A (en) * 1973-07-03 1976-02-18 Electricity Council Methods of and apparatus for coating wire rod or strip material by sputtering
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
DD141932B1 (de) * 1978-12-18 1982-06-30 Guenter Reisse Verfahren und vorrichtung zur teilchenstromionisierung und hochratebeschichtung
US4472259A (en) * 1981-10-29 1984-09-18 Materials Research Corporation Focusing magnetron sputtering apparatus
US4428816A (en) * 1983-05-25 1984-01-31 Materials Research Corporation Focusing magnetron sputtering apparatus
US4690744A (en) * 1983-07-20 1987-09-01 Konishiroku Photo Industry Co., Ltd. Method of ion beam generation and an apparatus based on such method
CH659484A5 (de) * 1984-04-19 1987-01-30 Balzers Hochvakuum Anordnung zur beschichtung von substraten mittels kathodenzerstaeubung.
JPS6277460A (ja) * 1985-09-30 1987-04-09 Tokuda Seisakusho Ltd 放電電極

Also Published As

Publication number Publication date
EP0318441A3 (en) 1990-07-25
IT1211938B (it) 1989-11-08
EP0318441B1 (de) 1993-04-14
DD275861A5 (de) 1990-02-07
EP0318441A2 (de) 1989-05-31
DE3880275D1 (de) 1993-05-19
BR8806229A (pt) 1989-08-15
IT8748644A0 (it) 1987-11-27
DE3880275T2 (de) 1993-10-21
JPH01168862A (ja) 1989-07-04
US4933057A (en) 1990-06-12
ES2040896T3 (es) 1993-11-01
PL275999A1 (en) 1989-07-24
PL161618B1 (pl) 1993-07-30
RU1809840C (ru) 1993-04-15

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