DK0685571T3 - Fremgangsmåde og indretning til ved katodeforstøvning at coate et substrat - Google Patents

Fremgangsmåde og indretning til ved katodeforstøvning at coate et substrat

Info

Publication number
DK0685571T3
DK0685571T3 DK95870065T DK95870065T DK0685571T3 DK 0685571 T3 DK0685571 T3 DK 0685571T3 DK 95870065 T DK95870065 T DK 95870065T DK 95870065 T DK95870065 T DK 95870065T DK 0685571 T3 DK0685571 T3 DK 0685571T3
Authority
DK
Denmark
Prior art keywords
substrate
elements
surface layer
deposited
target
Prior art date
Application number
DK95870065T
Other languages
English (en)
Inventor
Rene U L B Winand
Alain R D C S Weymeersch
Brande Pierre U L B Vanden
Stephane Lucas
Lucien Renard
Original Assignee
Cockerill Rech & Dev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Rech & Dev filed Critical Cockerill Rech & Dev
Application granted granted Critical
Publication of DK0685571T3 publication Critical patent/DK0685571T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DK95870065T 1994-06-02 1995-06-02 Fremgangsmåde og indretning til ved katodeforstøvning at coate et substrat DK0685571T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9400552A BE1008303A3 (fr) 1994-06-02 1994-06-02 Procede et dispositif pour la formation d'un revetement sur un substrat par pulverisation cathodique.

Publications (1)

Publication Number Publication Date
DK0685571T3 true DK0685571T3 (da) 1999-08-23

Family

ID=3888189

Family Applications (1)

Application Number Title Priority Date Filing Date
DK95870065T DK0685571T3 (da) 1994-06-02 1995-06-02 Fremgangsmåde og indretning til ved katodeforstøvning at coate et substrat

Country Status (7)

Country Link
EP (1) EP0685571B1 (da)
AT (1) ATE174637T1 (da)
BE (1) BE1008303A3 (da)
DE (1) DE69506618T2 (da)
DK (1) DK0685571T3 (da)
ES (1) ES2128028T3 (da)
GR (1) GR3029503T3 (da)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6432281B2 (en) * 1995-12-20 2002-08-13 Recherche Et Developpement Due Groupe Cockerill Sambre Process for formation of a coating on a substrate
BE1009838A3 (fr) * 1995-12-20 1997-10-07 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat.
BE1010797A3 (fr) * 1996-12-10 1999-02-02 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat, par pulverisation cathodique.
EP1182272A1 (fr) * 2000-08-23 2002-02-27 Cold Plasma Applications C.P.A. Procédé et dispositif permettant le dépôt de couches métalliques en continu par plasma froid
EP3870735B1 (en) * 2018-10-24 2022-08-24 Evatec AG Sputtering device for a liquid target

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2528108B2 (de) * 1975-06-24 1977-11-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zum aufbringen von elektrisch leitenden schichten auf eine unterlage
JPH0192384A (ja) * 1987-10-02 1989-04-11 Hitachi Ltd プラズマ処理装置
JPH0219466A (ja) * 1988-07-07 1990-01-23 Matsushita Electric Ind Co Ltd 繊維・フィルム連続蒸着装置

Also Published As

Publication number Publication date
EP0685571B1 (fr) 1998-12-16
EP0685571A1 (fr) 1995-12-06
DE69506618D1 (de) 1999-01-28
BE1008303A3 (fr) 1996-04-02
ES2128028T3 (es) 1999-05-01
DE69506618T2 (de) 1999-07-08
GR3029503T3 (en) 1999-05-28
ATE174637T1 (de) 1999-01-15

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