JPS57192097A - Formation of metal film - Google Patents
Formation of metal filmInfo
- Publication number
- JPS57192097A JPS57192097A JP56077219A JP7721981A JPS57192097A JP S57192097 A JPS57192097 A JP S57192097A JP 56077219 A JP56077219 A JP 56077219A JP 7721981 A JP7721981 A JP 7721981A JP S57192097 A JPS57192097 A JP S57192097A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- layer
- pedestal
- film
- blocks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0233—Mounting configuration of laser chips
- H01S5/0234—Up-side down mountings, e.g. Flip-chip, epi-side down mountings or junction down mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Die Bonding (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To enable to perform the evaporation treatment of In to a laser mount material and the surface treatment by etching with plural number of pieces at the same time when formation of metal film is to be performed by a method wherein platinum is provided on the surface of an evaporation pedestal. CONSTITUTION:Cu blocks 19 of plural number of pieces being the laser mount material are put at the same time as the material to be evaporated on a flat glass plate 15 to be used as the evaporation pedestal. A Pt layer 17 is formed on the glass plate 15 interposing a Ti layer 16 between them to form the evaporation pedestal. The Ti layer 16 is provided for intensification of adhesion between the glass plate 15 and the Pt layer 17. In of the solder material is evaporated on the Cu blocks 19 put on the evaporation pedestal by this way, and the In solder film 18 is formed on the evaporation pedestral consisting of the Cu blocks 19, the glass plate 15, the Ti layer 16, and the Pt layer 17. The Pt layer 17 is made to be exposed on the surface of the evaporation pedestral like this. Because mutually adhering intensity of the Pt layer 17 and the In solder film 18 is sufficiently large, even when etching of the film 18 is performed in the condition that the blocks 19 are put thereon, the situation that the film 18 is peeled off from the evaporation pedestal is not generated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077219A JPS57192097A (en) | 1981-05-20 | 1981-05-20 | Formation of metal film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077219A JPS57192097A (en) | 1981-05-20 | 1981-05-20 | Formation of metal film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57192097A true JPS57192097A (en) | 1982-11-26 |
JPS6250073B2 JPS6250073B2 (en) | 1987-10-22 |
Family
ID=13627732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56077219A Granted JPS57192097A (en) | 1981-05-20 | 1981-05-20 | Formation of metal film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192097A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136829A (en) * | 1985-12-10 | 1987-06-19 | Sharp Corp | Die bonding method for optical semiconductor element |
-
1981
- 1981-05-20 JP JP56077219A patent/JPS57192097A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136829A (en) * | 1985-12-10 | 1987-06-19 | Sharp Corp | Die bonding method for optical semiconductor element |
Also Published As
Publication number | Publication date |
---|---|
JPS6250073B2 (en) | 1987-10-22 |
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