JPS5763912A - Electrode forming method - Google Patents

Electrode forming method

Info

Publication number
JPS5763912A
JPS5763912A JP13938280A JP13938280A JPS5763912A JP S5763912 A JPS5763912 A JP S5763912A JP 13938280 A JP13938280 A JP 13938280A JP 13938280 A JP13938280 A JP 13938280A JP S5763912 A JPS5763912 A JP S5763912A
Authority
JP
Japan
Prior art keywords
resist
films
conductive film
adhered onto
metallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13938280A
Other languages
Japanese (ja)
Inventor
Mamoru Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13938280A priority Critical patent/JPS5763912A/en
Publication of JPS5763912A publication Critical patent/JPS5763912A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Abstract

PURPOSE:To form extremely small electrodes on an insulator substrate by providing a conductive film previously under resist films to be lifted off by applying a lift- off method. CONSTITUTION:A conductive film 20 is adhered onto an insulator substrate 10, on which electronic resist films are provided. Then, the resist films 30 are irradiated selectively with electron beams and dipped in a developing solution to be worked in a prescribed pattern. A metallic film 40 is then adhered onto the entire surface. Simultaneously with the removal of the resist 30, the metallic films 40 adhered onto the resist 30 are also removed. The metallic films 40 left on the substrate 10 surface are used as a mask to remove the conductive film 20 selectively, thus forming electrodes. Consequently, the work of the extremely small electrodes is realized.
JP13938280A 1980-10-07 1980-10-07 Electrode forming method Pending JPS5763912A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13938280A JPS5763912A (en) 1980-10-07 1980-10-07 Electrode forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13938280A JPS5763912A (en) 1980-10-07 1980-10-07 Electrode forming method

Publications (1)

Publication Number Publication Date
JPS5763912A true JPS5763912A (en) 1982-04-17

Family

ID=15244007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13938280A Pending JPS5763912A (en) 1980-10-07 1980-10-07 Electrode forming method

Country Status (1)

Country Link
JP (1) JPS5763912A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7243642B2 (en) 2001-09-18 2007-07-17 Yanmar Co., Ltd. Breather device of engine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7243642B2 (en) 2001-09-18 2007-07-17 Yanmar Co., Ltd. Breather device of engine

Similar Documents

Publication Publication Date Title
GB2034526B (en) Method for forming an electrode pattern on a substrate
JPS5763912A (en) Electrode forming method
JPS53147531A (en) Forming method for thin film pattern
JPS57155539A (en) Mask
JPS5443681A (en) Electron beam light-exposing method
JPS5713740A (en) Forming method for conductor pattern
JPS57202519A (en) Production of transparent pattern electrode
JPS56110283A (en) Manufacture of embedded circuit structure-type semiconductor laser device
JPS57125053A (en) Manufacturing of screen mask
JPS56137622A (en) Forming of cross pattern electrode
JPS56101745A (en) Formation of microminiature electrode
JPS56115534A (en) Formation of pattern
JPS5749230A (en) Forming method for electrode
JPS6438253A (en) Manufacture of recording head
JPS57100727A (en) Correcting method for metal mask
JPS5596681A (en) Method of fabricating semiconductor device
JPS5261472A (en) Fluorescent surface formation method of cathode-ray tube
JPS5660435A (en) Mask pattern forming method
JPS56130716A (en) Manufacture of electrode substrate for liquid-crystal display element
JPS56156807A (en) Production of high molecular optical circuit
JPS57118641A (en) Lifting-off method
JPS56137623A (en) Forming of cross pattern electrode
JPS57176728A (en) Forming method for conductor pattern
JPS56165244A (en) Manufacture of multilayer thin film electrode
JPS57128030A (en) Exposing method for electron beam