ATE155827T1 - Verfahren zur herstellung einer dünnen schicht mittels reaktiver kathodenzerstäubung - Google Patents
Verfahren zur herstellung einer dünnen schicht mittels reaktiver kathodenzerstäubungInfo
- Publication number
- ATE155827T1 ATE155827T1 AT94870066T AT94870066T ATE155827T1 AT E155827 T1 ATE155827 T1 AT E155827T1 AT 94870066 T AT94870066 T AT 94870066T AT 94870066 T AT94870066 T AT 94870066T AT E155827 T1 ATE155827 T1 AT E155827T1
- Authority
- AT
- Austria
- Prior art keywords
- sputting
- producing
- thin layer
- reactive
- cathode sputtering
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE9300378A BE1006967A3 (fr) | 1993-04-16 | 1993-04-16 | Procede pour la formation d'un revetement sur un substrat par pulverisation cathodique reactive. |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE155827T1 true ATE155827T1 (de) | 1997-08-15 |
Family
ID=3886980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT94870066T ATE155827T1 (de) | 1993-04-16 | 1994-04-14 | Verfahren zur herstellung einer dünnen schicht mittels reaktiver kathodenzerstäubung |
Country Status (7)
Country | Link |
---|---|
US (1) | US6485615B1 (de) |
EP (1) | EP0620290B1 (de) |
JP (1) | JP3485960B2 (de) |
AT (1) | ATE155827T1 (de) |
BE (1) | BE1006967A3 (de) |
DE (1) | DE69404361T2 (de) |
ES (1) | ES2107786T3 (de) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2069008B (en) * | 1980-01-16 | 1984-09-12 | Secr Defence | Coating in a glow discharge |
JPS60204626A (ja) * | 1984-03-30 | 1985-10-16 | Anelva Corp | 酸化鉄薄膜の形成方法および装置 |
JPH0772349B2 (ja) * | 1987-05-12 | 1995-08-02 | 住友電気工業株式会社 | 大面積化合物薄膜の作製方法および装置 |
JPH01108378A (ja) * | 1987-10-21 | 1989-04-25 | Mitsubishi Electric Corp | スパツタ装置 |
US5064520A (en) * | 1989-02-15 | 1991-11-12 | Hitachi, Ltd. | Method and apparatus for forming a film |
-
1993
- 1993-04-16 BE BE9300378A patent/BE1006967A3/fr not_active IP Right Cessation
-
1994
- 1994-04-11 US US08/225,942 patent/US6485615B1/en not_active Expired - Lifetime
- 1994-04-14 AT AT94870066T patent/ATE155827T1/de active
- 1994-04-14 DE DE69404361T patent/DE69404361T2/de not_active Expired - Lifetime
- 1994-04-14 EP EP94870066A patent/EP0620290B1/de not_active Expired - Lifetime
- 1994-04-14 ES ES94870066T patent/ES2107786T3/es not_active Expired - Lifetime
- 1994-04-15 JP JP07749694A patent/JP3485960B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69404361T2 (de) | 1998-02-19 |
DE69404361D1 (de) | 1997-09-04 |
EP0620290A1 (de) | 1994-10-19 |
US6485615B1 (en) | 2002-11-26 |
JPH07118843A (ja) | 1995-05-09 |
ES2107786T3 (es) | 1997-12-01 |
EP0620290B1 (de) | 1997-07-23 |
JP3485960B2 (ja) | 2004-01-13 |
BE1006967A3 (fr) | 1995-02-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification |