DE69404361D1 - Verfahren zur Herstellung einer dünnen Schicht mittels reaktiver Kathodenzerstäubung - Google Patents

Verfahren zur Herstellung einer dünnen Schicht mittels reaktiver Kathodenzerstäubung

Info

Publication number
DE69404361D1
DE69404361D1 DE69404361T DE69404361T DE69404361D1 DE 69404361 D1 DE69404361 D1 DE 69404361D1 DE 69404361 T DE69404361 T DE 69404361T DE 69404361 T DE69404361 T DE 69404361T DE 69404361 D1 DE69404361 D1 DE 69404361D1
Authority
DE
Germany
Prior art keywords
cathode sputtering
producing
thin layer
reactive
reactive cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69404361T
Other languages
English (en)
Other versions
DE69404361T2 (de
Inventor
Rene U L B Winand
Stephane U L B Lucas
Brande Pierre U L B Vanden
Alain R D C S Weymeersch
Lucien R D C S Renard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Application granted granted Critical
Publication of DE69404361D1 publication Critical patent/DE69404361D1/de
Publication of DE69404361T2 publication Critical patent/DE69404361T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
DE69404361T 1993-04-16 1994-04-14 Verfahren zur Herstellung einer dünnen Schicht mittels reaktiver Kathodenzerstäubung Expired - Lifetime DE69404361T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9300378A BE1006967A3 (fr) 1993-04-16 1993-04-16 Procede pour la formation d'un revetement sur un substrat par pulverisation cathodique reactive.

Publications (2)

Publication Number Publication Date
DE69404361D1 true DE69404361D1 (de) 1997-09-04
DE69404361T2 DE69404361T2 (de) 1998-02-19

Family

ID=3886980

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69404361T Expired - Lifetime DE69404361T2 (de) 1993-04-16 1994-04-14 Verfahren zur Herstellung einer dünnen Schicht mittels reaktiver Kathodenzerstäubung

Country Status (7)

Country Link
US (1) US6485615B1 (de)
EP (1) EP0620290B1 (de)
JP (1) JP3485960B2 (de)
AT (1) ATE155827T1 (de)
BE (1) BE1006967A3 (de)
DE (1) DE69404361T2 (de)
ES (1) ES2107786T3 (de)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2069008B (en) * 1980-01-16 1984-09-12 Secr Defence Coating in a glow discharge
JPS60204626A (ja) * 1984-03-30 1985-10-16 Anelva Corp 酸化鉄薄膜の形成方法および装置
JPH0772349B2 (ja) * 1987-05-12 1995-08-02 住友電気工業株式会社 大面積化合物薄膜の作製方法および装置
JPH01108378A (ja) * 1987-10-21 1989-04-25 Mitsubishi Electric Corp スパツタ装置
DE69033286T2 (de) * 1989-02-15 2000-05-25 Hitachi Ltd Verfahren und Vorrichtung zur Bildung eines Films

Also Published As

Publication number Publication date
EP0620290B1 (de) 1997-07-23
US6485615B1 (en) 2002-11-26
ES2107786T3 (es) 1997-12-01
DE69404361T2 (de) 1998-02-19
ATE155827T1 (de) 1997-08-15
EP0620290A1 (de) 1994-10-19
BE1006967A3 (fr) 1995-02-07
JPH07118843A (ja) 1995-05-09
JP3485960B2 (ja) 2004-01-13

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