JPS6455382A - Apparatus for forming uniform layer on substrate by cathodic sputtering - Google Patents
Apparatus for forming uniform layer on substrate by cathodic sputteringInfo
- Publication number
- JPS6455382A JPS6455382A JP63190757A JP19075788A JPS6455382A JP S6455382 A JPS6455382 A JP S6455382A JP 63190757 A JP63190757 A JP 63190757A JP 19075788 A JP19075788 A JP 19075788A JP S6455382 A JPS6455382 A JP S6455382A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- uniform layer
- forming uniform
- cathodic sputtering
- cathodic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3725571A DE3725571A1 (en) | 1987-08-01 | 1987-08-01 | DEVICE FOR PRODUCING LAYERS WITH EVEN THICKNESS PROFILE ON SUBSTRATES BY CATHODE SPRAYING |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6455382A true JPS6455382A (en) | 1989-03-02 |
Family
ID=6332880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63190757A Pending JPS6455382A (en) | 1987-08-01 | 1988-08-01 | Apparatus for forming uniform layer on substrate by cathodic sputtering |
Country Status (5)
Country | Link |
---|---|
US (1) | US4793911A (en) |
EP (1) | EP0302167B1 (en) |
JP (1) | JPS6455382A (en) |
KR (1) | KR890003985A (en) |
DE (2) | DE3725571A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5130005A (en) * | 1990-10-31 | 1992-07-14 | Materials Research Corporation | Magnetron sputter coating method and apparatus with rotating magnet cathode |
CA2137471A1 (en) | 1992-06-26 | 1994-01-06 | Tugrul Yasar | Transport system for wafer processing line |
DE4301189C2 (en) * | 1993-01-19 | 2000-12-14 | Leybold Ag | Device for coating substrates |
US5468299A (en) * | 1995-01-09 | 1995-11-21 | Tsai; Charles S. | Device comprising a flat susceptor rotating parallel to a reference surface about a shaft perpendicular to this surface |
US5795448A (en) * | 1995-12-08 | 1998-08-18 | Sony Corporation | Magnetic device for rotating a substrate |
US6497799B1 (en) | 2000-04-14 | 2002-12-24 | Seagate Technology Llc | Method and apparatus for sputter deposition of multilayer films |
US6770146B2 (en) | 2001-02-02 | 2004-08-03 | Mattson Technology, Inc. | Method and system for rotating a semiconductor wafer in processing chambers |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2039416A1 (en) * | 1969-08-11 | 1971-02-25 | Varian Associates | Vacuum electroplating device |
US3785853A (en) * | 1972-05-24 | 1974-01-15 | Unicorp Inc | Continuous deposition reactor |
GB1478464A (en) * | 1973-10-11 | 1977-06-29 | Triplex Safety Glass Co | Reactive sputtering apparatus and supply leads therefor |
DE2900724C2 (en) * | 1979-01-10 | 1986-05-28 | Siemens AG, 1000 Berlin und 8000 München | Device for coating substrates in a vacuum |
DE3306870A1 (en) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | DEVICE FOR PRODUCING LAYERS WITH ROTATIONALLY SYMMETRIC THICK PROFILE BY CATODENSIONING |
GB8332089D0 (en) * | 1983-12-01 | 1984-01-11 | Atomic Energy Authority Uk | Electrodes |
US4701251A (en) * | 1986-02-03 | 1987-10-20 | Bvt Limited | Apparatus for sputter coating discs |
US4808291A (en) * | 1987-09-09 | 1989-02-28 | Denton Vacuum Inc. | Apparatus for coating compact disks |
-
1987
- 1987-08-01 DE DE3725571A patent/DE3725571A1/en not_active Withdrawn
- 1987-11-12 US US07/119,628 patent/US4793911A/en not_active Expired - Fee Related
-
1988
- 1988-03-09 DE DE8888103670T patent/DE3870752D1/en not_active Expired - Fee Related
- 1988-03-09 EP EP88103670A patent/EP0302167B1/en not_active Expired - Lifetime
- 1988-07-06 KR KR1019880008388A patent/KR890003985A/en not_active Application Discontinuation
- 1988-08-01 JP JP63190757A patent/JPS6455382A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0302167A2 (en) | 1989-02-08 |
DE3870752D1 (en) | 1992-06-11 |
EP0302167A3 (en) | 1990-03-28 |
KR890003985A (en) | 1989-04-19 |
EP0302167B1 (en) | 1992-05-06 |
DE3725571A1 (en) | 1989-02-09 |
US4793911A (en) | 1988-12-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2157715B (en) | Apparatus for cathodic sputtering | |
GB2055403B (en) | Method for depositing hard wear-resistant coatings on substrates | |
AU575056B2 (en) | Cathodic sputtering apparatus | |
EP0476652A3 (en) | Method for depositing thin film on substrate by sputtering process | |
EP0354294A3 (en) | Carousel-type apparatus for coating substrates | |
AU3058789A (en) | Method for obtaining transverse uniformity during thin film deposition on extended substrate | |
GB2075063B (en) | Process for plating polumeric substrates | |
IL84042A0 (en) | Apparatus for coating substrates | |
AU2120388A (en) | Process for the deposition of diamond films | |
GB2161837B (en) | Target plate for cathodic sputter coating | |
EP0295649A3 (en) | Magnetron sputter apparatus and method for forming films by using the same apparatus | |
EP0243995A3 (en) | Process for manufacturing a target for cathodic sputtering | |
DE3472574D1 (en) | Process for forming an organic thin film | |
GB2208390B (en) | Thin film deposition process | |
EP0241317A3 (en) | Process for forming deposited film | |
JPS5448689A (en) | Cathode apparatus having target for sputtering apparatus accumulating derivative or nonnmagnetic layer on substrate | |
GB2257987B (en) | An apparatus for coating structural parts or shaped parts by cathodic sputtering | |
DE3571779D1 (en) | Process for forming a wear-resistant layer on a substrate | |
GB8813735D0 (en) | Apparatus for forming thin film | |
DE3570458D1 (en) | Process for forming a wear-resistant layer on a substrate | |
GB8707322D0 (en) | Thin film deposition process | |
EP0238084A3 (en) | Apparatus for depositing mono-molecular layer | |
JPS6455382A (en) | Apparatus for forming uniform layer on substrate by cathodic sputtering | |
EP0301604A3 (en) | Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus | |
GB2098241B (en) | Thin layer depositing apparatus |