GB1147318A - Improvements in r.f. cathodic sputtering systems - Google Patents

Improvements in r.f. cathodic sputtering systems

Info

Publication number
GB1147318A
GB1147318A GB874468A GB874468A GB1147318A GB 1147318 A GB1147318 A GB 1147318A GB 874468 A GB874468 A GB 874468A GB 874468 A GB874468 A GB 874468A GB 1147318 A GB1147318 A GB 1147318A
Authority
GB
United Kingdom
Prior art keywords
target
substrate
sputtering
substrates
arrow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB874468A
Inventor
Peter Alan Birrell Toombs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB874468A priority Critical patent/GB1147318A/en
Publication of GB1147318A publication Critical patent/GB1147318A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Abstract

1,147,318. R. F. cathodic sputtering. STANDARD TELEPHONES & CABLES Ltd. Feb.22, 1968, No. 8744/68. Heading C7F. In an R. F. cathode sputtering apparatus relative movement between the target assembly and the substrate is effected during the sputtering. As shown in Figure 1 the apparatus comprises a target 2 connected via backing electrode 13 to an H. F. source 7, a substrate 1 on holder 11 and guard rings 3 and 4 connected to earth potential. As shown in Figure 2 the target 2 as a rod or strip is parallel to and extends across the width of the substrate 1 which is moved in direction of arrow "A". More than one target may be used so that layers of the target material or materials are sequentially deposited on the substrate. Alternatively oscillatory movement may be effected. An alternative embodiment for coating a series of substrates is shown in Figure 3 where the target is in the form of a cylindrical cage comprising a number of rod shaped targets 8 mounted on a baseplate 9. The substrates 1 surround the target as a concentric cylindrical array and are moved in the direction of arrow "B". The targets may be solid or coated with the material to be sputtered.
GB874468A 1968-02-22 1968-02-22 Improvements in r.f. cathodic sputtering systems Expired GB1147318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB874468A GB1147318A (en) 1968-02-22 1968-02-22 Improvements in r.f. cathodic sputtering systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB874468A GB1147318A (en) 1968-02-22 1968-02-22 Improvements in r.f. cathodic sputtering systems

Publications (1)

Publication Number Publication Date
GB1147318A true GB1147318A (en) 1969-04-02

Family

ID=9858442

Family Applications (1)

Application Number Title Priority Date Filing Date
GB874468A Expired GB1147318A (en) 1968-02-22 1968-02-22 Improvements in r.f. cathodic sputtering systems

Country Status (1)

Country Link
GB (1) GB1147318A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4006070A (en) 1971-02-05 1977-02-01 Triplex Safety Glass Company Limited Metal oxide films
FR2354393A1 (en) * 1976-06-10 1978-01-06 Univ Sydney REACTIVE CATHODIC SPRAYING METHOD AND DEVICE
US4094763A (en) * 1970-07-31 1978-06-13 Ppg Industries, Inc. Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof
US4126530A (en) * 1977-08-04 1978-11-21 Telic Corporation Method and apparatus for sputter cleaning and bias sputtering
US4132624A (en) * 1971-02-05 1979-01-02 Triplex Safety Glass Company Limited Apparatus for producing metal oxide films
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
EP0119631A2 (en) * 1983-03-21 1984-09-26 The BOC Group plc Magnetron cathode sputtering apparatus
EP0172916A1 (en) * 1984-02-17 1986-03-05 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Film forming method
US5182256A (en) * 1990-06-21 1993-01-26 Sumitomo Electric Industries, Ltd. Process and apparatus for preparing superconducting thin films

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094763A (en) * 1970-07-31 1978-06-13 Ppg Industries, Inc. Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof
US4006070A (en) 1971-02-05 1977-02-01 Triplex Safety Glass Company Limited Metal oxide films
US4132624A (en) * 1971-02-05 1979-01-02 Triplex Safety Glass Company Limited Apparatus for producing metal oxide films
FR2354393A1 (en) * 1976-06-10 1978-01-06 Univ Sydney REACTIVE CATHODIC SPRAYING METHOD AND DEVICE
US4126530A (en) * 1977-08-04 1978-11-21 Telic Corporation Method and apparatus for sputter cleaning and bias sputtering
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
EP0119631A2 (en) * 1983-03-21 1984-09-26 The BOC Group plc Magnetron cathode sputtering apparatus
EP0119631A3 (en) * 1983-03-21 1986-03-12 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
EP0172916A1 (en) * 1984-02-17 1986-03-05 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Film forming method
EP0172916A4 (en) * 1984-02-17 1986-08-21 Kanegafuchi Chemical Ind Film forming method.
US5182256A (en) * 1990-06-21 1993-01-26 Sumitomo Electric Industries, Ltd. Process and apparatus for preparing superconducting thin films

Similar Documents

Publication Publication Date Title
TW315980U (en) Dual cylindrical target magnetron with multiple anodes
GB1209968A (en) Rf sputtering method and system
GB1485331A (en) Multitarget sequential sputtering apparatus
ES333127A1 (en) A procedure for depositing by cathodized spraying on a substrate a thin metal layer. (Machine-translation by Google Translate, not legally binding)
GB1462241A (en) Thin film deposition apparatus using segmented target means
ES8303552A1 (en) Magnetron cathode sputtering apparatus.
IT1173906B (en) APPARATUS AND METHOD FOR CATHODIC SPRAYING IN MAGNETRON
ATE47893T1 (en) DECORATIVE CARBON COATING AND PROCESS.
GB1147318A (en) Improvements in r.f. cathodic sputtering systems
GB1371462A (en) Apparatus for coating workpieces
JPS56143519A (en) Magnetic recording medium and manufacturing device
GB1394942A (en) Target changing device for sputtering by means of ions
GB1391842A (en) Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel
GB1132867A (en) Improvements in or relating to apparatus for depositing thin films
GB1297661A (en)
GB1458353A (en)
SE386286B (en) ELECTRICAL CONDUCTIVE, NON-METALLIC SUBSTRATE INTENDED FOR SEPROGRAPHIC PURPOSES, AQUATIC ELECTRICAL CONDUCTIVE HARD COATING COMPOSITION FOR MANUFACTURE OF THE SUBSTRATE AND PROCEDURE FOR ...
ES420944A1 (en) Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
GB1186669A (en) Improvements relating to Target Electrodes for Sputtering Apparatus
JPS57158381A (en) Magnetron sputtering device
JPS5399082A (en) High frequency sputtering apparatus
ES2002466A6 (en) Cathode/ground shield arrangement in a target for a sputter coating apparatus.
GB1284781A (en) Depositing layers by cathode sputtering
GB1103036A (en) Thermoplastic recording medium
GB1300193A (en) Improvements in recording carriers