GB1284781A - Depositing layers by cathode sputtering - Google Patents
Depositing layers by cathode sputteringInfo
- Publication number
- GB1284781A GB1284781A GB5070969A GB5070969A GB1284781A GB 1284781 A GB1284781 A GB 1284781A GB 5070969 A GB5070969 A GB 5070969A GB 5070969 A GB5070969 A GB 5070969A GB 1284781 A GB1284781 A GB 1284781A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrode
- sputtered
- oct
- argon
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1284781 Sputtering apparatus PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 15 Oct 1969 [15 Oct 1968(3)] 50709/69. Heading C7F A sputtering apparatus comprises a cathode target electrode 16, an electrode 23 carrying e. g. glass substrates 28, 29, and guard rings 30, 22. The electrode 23 may be rotated and adjusted vertically by a shaft 24. Both electrodes may be cooled by circulating fluid. The target electrode may have sectors of e.g. three different materials. A central fixing member 31 may be made of aluminium which does not sputter readily. Silicon may be sputtered in an argon-ammonia mixture to give silicon nitride or a mixture of argon and oxygen may be used with Zn alone or Cu, Ni, and Fe to give a ternary composition of their oxides. Other mixtures that may be deposited are Fe-Ni-Zn, and Cu-Ni-Co-Mn. Ceramics may also be sputtered e.g. ferrites, garnets, thiospinels, and cermets. The electrodes 16, 23 may be at different potentials, and may have a bias voltage relative to their guard rings. The coating may be subsequently heated.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR170008 | 1968-10-15 | ||
| FR170009 | 1968-10-15 | ||
| FR170007 | 1968-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1284781A true GB1284781A (en) | 1972-08-09 |
Family
ID=27244897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5070969A Expired GB1284781A (en) | 1968-10-15 | 1969-10-15 | Depositing layers by cathode sputtering |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE1951735A1 (en) |
| FR (3) | FR1594667A (en) |
| GB (1) | GB1284781A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0058560A2 (en) * | 1981-02-18 | 1982-08-25 | Hitachi, Ltd. | Sputtering apparatus |
| GB2228948A (en) * | 1989-02-28 | 1990-09-12 | British Aerospace | Fabrication of thin films from a composite target |
| GB2345919A (en) * | 1999-01-20 | 2000-07-26 | Marconi Caswell Ltd | Depositing material |
| EP1448806A1 (en) * | 2001-11-03 | 2004-08-25 | Intevac, Inc. | Method and apparatus for multi-target sputtering field of the invention |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6011103B2 (en) * | 1981-02-23 | 1985-03-23 | レオニド パフロヴイツチ サブレフ | Consumable cathode for electric arc metal evaporation equipment |
-
1968
- 1968-10-15 FR FR1594667D patent/FR1594667A/fr not_active Expired
- 1968-10-15 FR FR1594668D patent/FR1594668A/fr not_active Expired
- 1968-10-15 FR FR1603217D patent/FR1603217A/fr not_active Expired
-
1969
- 1969-10-14 DE DE19691951735 patent/DE1951735A1/en active Pending
- 1969-10-15 GB GB5070969A patent/GB1284781A/en not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0058560A2 (en) * | 1981-02-18 | 1982-08-25 | Hitachi, Ltd. | Sputtering apparatus |
| EP0058560A3 (en) * | 1981-02-18 | 1982-12-01 | Hitachi, Ltd. | Sputtering apparatus |
| GB2228948A (en) * | 1989-02-28 | 1990-09-12 | British Aerospace | Fabrication of thin films from a composite target |
| GB2345919A (en) * | 1999-01-20 | 2000-07-26 | Marconi Caswell Ltd | Depositing material |
| EP1448806A1 (en) * | 2001-11-03 | 2004-08-25 | Intevac, Inc. | Method and apparatus for multi-target sputtering field of the invention |
| EP1448806A4 (en) * | 2001-11-03 | 2006-11-08 | Intevac Inc | Method and apparatus for multi-target sputtering field of the invention |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1951735A1 (en) | 1970-04-30 |
| FR1594668A (en) | 1970-06-08 |
| FR1603217A (en) | 1971-03-22 |
| FR1594667A (en) | 1970-06-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |