GB1371462A - Apparatus for coating workpieces - Google Patents

Apparatus for coating workpieces

Info

Publication number
GB1371462A
GB1371462A GB706172A GB706172A GB1371462A GB 1371462 A GB1371462 A GB 1371462A GB 706172 A GB706172 A GB 706172A GB 706172 A GB706172 A GB 706172A GB 1371462 A GB1371462 A GB 1371462A
Authority
GB
United Kingdom
Prior art keywords
plate
feb
magnet
ring
carried
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB706172A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CLARKE PJ
Original Assignee
CLARKE PJ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CLARKE PJ filed Critical CLARKE PJ
Publication of GB1371462A publication Critical patent/GB1371462A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1371462 Sputtering apparatus P J CLARKE 16 Feb 1972 [18 Feb 1971] 7061/72 Heading C7F Sputtering apparatus comprises a base-plate 10 over which is fitted a bell jar Fig.1 (not shown), the base-plate having attached to it a hollow cathode shell 27. The anode 33 is carried on a conductive stem 34, and the cathode shell 27 is surrounded by a magnet 31. A ring 30 of material to be sputtered is provided on the cathode. The field created by the magnet has a linear central portion (shown by A) and non-linear end portions (shown dotted), and the ring 30 intercepts a non- linear end portion. The substrates have an induced bias or a bias may be applied by a lead 45, and they are carried by a continuously or intermittently rotatable plate.
GB706172A 1971-02-18 1972-02-16 Apparatus for coating workpieces Expired GB1371462A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11638771A 1971-02-18 1971-02-18

Publications (1)

Publication Number Publication Date
GB1371462A true GB1371462A (en) 1974-10-23

Family

ID=22366874

Family Applications (1)

Application Number Title Priority Date Filing Date
GB706172A Expired GB1371462A (en) 1971-02-18 1972-02-16 Apparatus for coating workpieces

Country Status (4)

Country Link
US (1) US3711398A (en)
JP (1) JPS5129514B1 (en)
DE (1) DE2208032A1 (en)
GB (1) GB1371462A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138449A (en) * 1983-04-22 1984-10-24 White Eng Co Method for pure ion plating using magnetic fields

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030996A (en) * 1971-09-07 1977-06-21 Telic Corporation Electrode type glow discharge method and apparatus
CH551497A (en) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3892651A (en) * 1974-05-28 1975-07-01 Corning Glass Works Method and apparatus for coating a plurality of cylindrical articles
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
US4025410A (en) * 1975-08-25 1977-05-24 Western Electric Company, Inc. Sputtering apparatus and methods using a magnetic field
US4046660A (en) * 1975-12-29 1977-09-06 Bell Telephone Laboratories, Incorporated Sputter coating with charged particle flux control
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area
US4155825A (en) * 1977-05-02 1979-05-22 Fournier Paul R Integrated sputtering apparatus and method
US4305801A (en) * 1980-04-16 1981-12-15 The United States Of America As Represented By The United States Department Of Energy Line-of-sight deposition method
US4673480A (en) * 1980-05-16 1987-06-16 Varian Associates, Inc. Magnetically enhanced sputter source
US4457825A (en) * 1980-05-16 1984-07-03 Varian Associates, Inc. Sputter target for use in a sputter coating source
US4726890A (en) * 1985-08-12 1988-02-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method of producing high Tc superconducting NbN films
US5437778A (en) * 1990-07-10 1995-08-01 Telic Technologies Corporation Slotted cylindrical hollow cathode/magnetron sputtering device
US5073245A (en) * 1990-07-10 1991-12-17 Hedgcoth Virgle L Slotted cylindrical hollow cathode/magnetron sputtering device
US5334302A (en) * 1991-11-15 1994-08-02 Tokyo Electron Limited Magnetron sputtering apparatus and sputtering gun for use in the same
US6217716B1 (en) 1998-05-06 2001-04-17 Novellus Systems, Inc. Apparatus and method for improving target erosion in hollow cathode magnetron sputter source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138449A (en) * 1983-04-22 1984-10-24 White Eng Co Method for pure ion plating using magnetic fields

Also Published As

Publication number Publication date
DE2208032A1 (en) 1972-08-24
JPS5129514B1 (en) 1976-08-26
US3711398A (en) 1973-01-16

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee