CH551497A - ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE. - Google Patents

ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.

Info

Publication number
CH551497A
CH551497A CH1476071A CH1476071A CH551497A CH 551497 A CH551497 A CH 551497A CH 1476071 A CH1476071 A CH 1476071A CH 1476071 A CH1476071 A CH 1476071A CH 551497 A CH551497 A CH 551497A
Authority
CH
Switzerland
Prior art keywords
atomization
substances
arrangement
low voltage
voltage discharge
Prior art date
Application number
CH1476071A
Other languages
German (de)
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1476071A priority Critical patent/CH551497A/en
Priority to NL7116297A priority patent/NL7116297A/xx
Priority to DE19722246983 priority patent/DE2246983C3/en
Priority to US00293503A priority patent/US3839182A/en
Priority to GB4550572A priority patent/GB1405489A/en
Priority to FR7235267A priority patent/FR2155589A5/fr
Publication of CH551497A publication Critical patent/CH551497A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH1476071A 1971-10-06 1971-10-06 ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE. CH551497A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CH1476071A CH551497A (en) 1971-10-06 1971-10-06 ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.
NL7116297A NL7116297A (en) 1971-10-06 1971-11-26
DE19722246983 DE2246983C3 (en) 1971-10-06 1972-09-25 Triode arrangement for cathode sputtering of substances by means of an electrical low-voltage discharge
US00293503A US3839182A (en) 1971-10-06 1972-09-29 Triode device for sputtering material by means of a low voltage discharge
GB4550572A GB1405489A (en) 1971-10-06 1972-10-03 Sputtering apparatus
FR7235267A FR2155589A5 (en) 1971-10-06 1972-10-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1476071A CH551497A (en) 1971-10-06 1971-10-06 ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.

Publications (1)

Publication Number Publication Date
CH551497A true CH551497A (en) 1974-07-15

Family

ID=4403604

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1476071A CH551497A (en) 1971-10-06 1971-10-06 ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.

Country Status (5)

Country Link
US (1) US3839182A (en)
CH (1) CH551497A (en)
FR (1) FR2155589A5 (en)
GB (1) GB1405489A (en)
NL (1) NL7116297A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4310941B4 (en) * 1992-05-26 2005-12-01 Unaxis Balzers Ag Vacuum treatment chamber - with a low voltage discharge with arcing on treatment chamber walls prevented

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH631743A5 (en) * 1977-06-01 1982-08-31 Balzers Hochvakuum METHOD FOR EVAPORATING MATERIAL IN A VACUUM EVAPORATION SYSTEM.
US4111783A (en) * 1977-11-08 1978-09-05 Bell Telephone Laboratories, Incorporated Triode sputtering system
JPS57134559A (en) * 1981-02-12 1982-08-19 Toyota Central Res & Dev Lab Inc Physical vapor deposition device
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
US5084151A (en) * 1985-11-26 1992-01-28 Sorin Biomedica S.P.A. Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon
US5133845A (en) * 1986-12-12 1992-07-28 Sorin Biomedica, S.P.A. Method for making prosthesis of polymeric material coated with biocompatible carbon
DE3880135T2 (en) * 1988-09-08 1993-09-16 Asahi Glass Co Ltd SPRAYING METHOD BY MEANS OF A BAND-SHAPED PLASMA FLOW AND DEVICE FOR HANDLING THIS METHOD.
US4943325A (en) * 1988-10-19 1990-07-24 Black & Veatch, Engineers-Architects Reflector assembly
US4936960A (en) * 1989-01-03 1990-06-26 Advanced Energy Industries, Inc. Method and apparatus for recovery from low impedance condition during cathodic arc processes
US4963238A (en) * 1989-01-13 1990-10-16 Siefkes Jerry D Method for removal of electrical shorts in a sputtering system
ATE102742T1 (en) * 1989-02-09 1994-03-15 Balzers Hochvakuum METHOD OF CENTERING AN ELECTRON BEAM.
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
WO1996031899A1 (en) 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
JP4806146B2 (en) * 1999-07-13 2011-11-02 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ Apparatus and method for vacuum processing or powder production
US20090065045A1 (en) * 2007-09-10 2009-03-12 Zenith Solar Ltd. Solar electricity generation system
US9893223B2 (en) 2010-11-16 2018-02-13 Suncore Photovoltaics, Inc. Solar electricity generation system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130959C (en) * 1965-12-17
FR1534917A (en) * 1967-06-22 1968-08-02 Alcatel Sa Improvements in obtaining deposits by cathodic sputtering
US3708418A (en) * 1970-03-05 1973-01-02 Rca Corp Apparatus for etching of thin layers of material by ion bombardment
US3711398A (en) * 1971-02-18 1973-01-16 P Clarke Sputtering apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4310941B4 (en) * 1992-05-26 2005-12-01 Unaxis Balzers Ag Vacuum treatment chamber - with a low voltage discharge with arcing on treatment chamber walls prevented
DE4345602B4 (en) * 1992-05-26 2010-11-25 Oc Oerlikon Balzers Ag Method for igniting and operating a low-voltage arc discharge, vacuum treatment plant and cathode chamber therefor and use of the method

Also Published As

Publication number Publication date
DE2246983A1 (en) 1973-04-12
GB1405489A (en) 1975-09-10
FR2155589A5 (en) 1973-05-18
NL7116297A (en) 1973-04-10
DE2246983B2 (en) 1975-11-20
US3839182A (en) 1974-10-01

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Legal Events

Date Code Title Description
PL Patent ceased