CH551498A - ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE. - Google Patents

ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE.

Info

Publication number
CH551498A
CH551498A CH691072A CH691072A CH551498A CH 551498 A CH551498 A CH 551498A CH 691072 A CH691072 A CH 691072A CH 691072 A CH691072 A CH 691072A CH 551498 A CH551498 A CH 551498A
Authority
CH
Switzerland
Prior art keywords
documents
arrangement
low voltage
voltage discharge
electric low
Prior art date
Application number
CH691072A
Other languages
German (de)
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH691072A priority Critical patent/CH551498A/en
Priority to NL7207901A priority patent/NL7207901A/xx
Priority to DE19732321665 priority patent/DE2321665A1/en
Priority to FR7316647A priority patent/FR2183978A1/en
Publication of CH551498A publication Critical patent/CH551498A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH691072A 1972-05-09 1972-05-09 ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE. CH551498A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CH691072A CH551498A (en) 1972-05-09 1972-05-09 ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE.
NL7207901A NL7207901A (en) 1972-05-09 1972-06-09
DE19732321665 DE2321665A1 (en) 1972-05-09 1973-04-28 ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE
FR7316647A FR2183978A1 (en) 1972-05-09 1973-05-09 Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH691072A CH551498A (en) 1972-05-09 1972-05-09 ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE.

Publications (1)

Publication Number Publication Date
CH551498A true CH551498A (en) 1974-07-15

Family

ID=4316966

Family Applications (1)

Application Number Title Priority Date Filing Date
CH691072A CH551498A (en) 1972-05-09 1972-05-09 ARRANGEMENT FOR COLLECTING SUBSTANCES ON DOCUMENTS BY MEANS OF AN ELECTRIC LOW VOLTAGE DISCHARGE.

Country Status (4)

Country Link
CH (1) CH551498A (en)
DE (1) DE2321665A1 (en)
FR (1) FR2183978A1 (en)
NL (1) NL7207901A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090067A1 (en) * 1982-03-31 1983-10-05 Ibm Deutschland Gmbh Reactor for reactive ion etching, and etching process
DE3615361A1 (en) * 1986-05-06 1987-11-12 Santos Pereira Ribeiro Car Dos DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2800852C2 (en) * 1978-01-10 1983-07-14 Jurij Akimovič Moskva Dmitriev Device for ion plasma coating
DE2857102C2 (en) * 1978-07-08 1983-12-01 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Device for diffusing in and depositing a metal or alloy layer on an electrically conductive workpiece
KR910000508B1 (en) * 1984-08-31 1991-01-26 니찌덴 아넬바 가부시끼가이샤 Discharge Reactor Using Dynamic Magnetic Field
AU9410498A (en) * 1997-11-26 1999-06-17 Vapor Technologies, Inc. Apparatus for sputtering or arc evaporation
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9412569B2 (en) 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
CN104046943B (en) * 2013-03-15 2018-06-05 蒸汽技术公司 Low-tension arc plasma immersion coat vapor deposits and ion processing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090067A1 (en) * 1982-03-31 1983-10-05 Ibm Deutschland Gmbh Reactor for reactive ion etching, and etching process
US4424102A (en) 1982-03-31 1984-01-03 International Business Machines Corporation Reactor for reactive ion etching and etching method
DE3615361A1 (en) * 1986-05-06 1987-11-12 Santos Pereira Ribeiro Car Dos DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES

Also Published As

Publication number Publication date
FR2183978B3 (en) 1976-04-23
DE2321665A1 (en) 1973-11-22
NL7207901A (en) 1973-11-13
FR2183978A1 (en) 1973-12-21

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Legal Events

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