CA984334A - Deposition of magnetizable layers by means of cathode sputtering - Google Patents
Deposition of magnetizable layers by means of cathode sputteringInfo
- Publication number
- CA984334A CA984334A CA143,242A CA143242A CA984334A CA 984334 A CA984334 A CA 984334A CA 143242 A CA143242 A CA 143242A CA 984334 A CA984334 A CA 984334A
- Authority
- CA
- Canada
- Prior art keywords
- deposition
- cathode sputtering
- magnetizable layers
- magnetizable
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/265—Magnetic multilayers non exchange-coupled
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19712126887 DE2126887C3 (en) | 1971-05-29 | 1971-05-29 | Deposition of magnetizable layers by cathode sputtering |
Publications (1)
Publication Number | Publication Date |
---|---|
CA984334A true CA984334A (en) | 1976-02-24 |
Family
ID=5809356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA143,242A Expired CA984334A (en) | 1971-05-29 | 1972-05-24 | Deposition of magnetizable layers by means of cathode sputtering |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5328631B1 (en) |
CA (1) | CA984334A (en) |
DE (1) | DE2126887C3 (en) |
FR (1) | FR2139841B1 (en) |
GB (1) | GB1331038A (en) |
IT (1) | IT947677B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5155995A (en) * | 1974-11-12 | 1976-05-17 | Nippon Telegraph & Telephone | Sankabutsujiseihakumakuno seizohoho |
CH595458A5 (en) * | 1975-03-07 | 1978-02-15 | Balzers Patent Beteilig Ag | |
US4481999A (en) * | 1982-02-23 | 1984-11-13 | The United States Of America As Represented By The United States Department Of Energy | Method of forming a thin unbacked metal foil |
JPS60138720A (en) * | 1983-12-27 | 1985-07-23 | Sharp Corp | Vertical magnetic recording medium |
JPS6115941A (en) * | 1984-06-30 | 1986-01-24 | Res Dev Corp Of Japan | Ferromagnetic amorphous alloy containing oxygen and its manufacture |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3400066A (en) * | 1965-11-15 | 1968-09-03 | Ibm | Sputtering processes for depositing thin films of controlled thickness |
DE1955716A1 (en) * | 1969-11-05 | 1971-05-13 | Siemens Ag | Deposition of metal contact layers for - beam lead mfd semiconductors |
-
1971
- 1971-05-29 DE DE19712126887 patent/DE2126887C3/en not_active Expired
-
1972
- 1972-02-18 IT IT2071672A patent/IT947677B/en active
- 1972-03-24 JP JP2907172A patent/JPS5328631B1/ja active Pending
- 1972-04-18 FR FR7214368A patent/FR2139841B1/fr not_active Expired
- 1972-04-24 GB GB1886272A patent/GB1331038A/en not_active Expired
- 1972-05-24 CA CA143,242A patent/CA984334A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2139841B1 (en) | 1978-03-03 |
FR2139841A1 (en) | 1973-01-12 |
JPS5328631B1 (en) | 1978-08-16 |
GB1331038A (en) | 1973-09-19 |
DE2126887C3 (en) | 1981-11-19 |
DE2126887B2 (en) | 1981-01-08 |
IT947677B (en) | 1973-05-30 |
DE2126887A1 (en) | 1972-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU448790B2 (en) | Dual. layer magnetic recording tape | |
CA992811A (en) | Coating of workpieces by vapor deposition | |
CA949332A (en) | Deposition of copper values | |
CA984334A (en) | Deposition of magnetizable layers by means of cathode sputtering | |
CA941781A (en) | Metal deposition by liquid phase sputtering | |
CA960922A (en) | Vapor deposition process | |
JPS5248527A (en) | High adherence vacuum deposition process | |
CA997228A (en) | Deposition of films | |
CA785269A (en) | Magnetic control of film deposition | |
CA882065A (en) | Deposition of thin metal films | |
CA964134A (en) | Metal deposition process | |
AU448764B2 (en) | Film deposition | |
CA1003850A (en) | Dehydrogenation of organic compounds | |
CA866755A (en) | Deposition of one metal on another | |
CA872193A (en) | Deposition of metals | |
CA926280A (en) | Method of siliconizing by vapor deposition | |
CA868723A (en) | Magnetic valve | |
AU2632071A (en) | Film deposition | |
CA795277A (en) | Deposition of magnetic composition | |
CA784701A (en) | Deposition of thin films by cathodic sputtering | |
CA871303A (en) | Electron guns | |
CA970846A (en) | Fabrication of anodes by plasma spray deposition | |
CA979752A (en) | Method for vapor deposition of materials | |
CA850076A (en) | Deposition of thin insulating film | |
CA879049A (en) | Formation of thin oxide layers |