CA984334A - Deposition of magnetizable layers by means of cathode sputtering - Google Patents

Deposition of magnetizable layers by means of cathode sputtering

Info

Publication number
CA984334A
CA984334A CA143,242A CA143242A CA984334A CA 984334 A CA984334 A CA 984334A CA 143242 A CA143242 A CA 143242A CA 984334 A CA984334 A CA 984334A
Authority
CA
Canada
Prior art keywords
deposition
cathode sputtering
magnetizable layers
magnetizable
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA143,242A
Other versions
CA143242S (en
Inventor
Johannes Heller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA984334A publication Critical patent/CA984334A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
    • H01F10/265—Magnetic multilayers non exchange-coupled

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
CA143,242A 1971-05-29 1972-05-24 Deposition of magnetizable layers by means of cathode sputtering Expired CA984334A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712126887 DE2126887C3 (en) 1971-05-29 1971-05-29 Deposition of magnetizable layers by cathode sputtering

Publications (1)

Publication Number Publication Date
CA984334A true CA984334A (en) 1976-02-24

Family

ID=5809356

Family Applications (1)

Application Number Title Priority Date Filing Date
CA143,242A Expired CA984334A (en) 1971-05-29 1972-05-24 Deposition of magnetizable layers by means of cathode sputtering

Country Status (6)

Country Link
JP (1) JPS5328631B1 (en)
CA (1) CA984334A (en)
DE (1) DE2126887C3 (en)
FR (1) FR2139841B1 (en)
GB (1) GB1331038A (en)
IT (1) IT947677B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155995A (en) * 1974-11-12 1976-05-17 Nippon Telegraph & Telephone Sankabutsujiseihakumakuno seizohoho
CH595458A5 (en) * 1975-03-07 1978-02-15 Balzers Patent Beteilig Ag
US4481999A (en) * 1982-02-23 1984-11-13 The United States Of America As Represented By The United States Department Of Energy Method of forming a thin unbacked metal foil
JPS60138720A (en) * 1983-12-27 1985-07-23 Sharp Corp Vertical magnetic recording medium
JPS6115941A (en) * 1984-06-30 1986-01-24 Res Dev Corp Of Japan Ferromagnetic amorphous alloy containing oxygen and its manufacture

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3400066A (en) * 1965-11-15 1968-09-03 Ibm Sputtering processes for depositing thin films of controlled thickness
DE1955716A1 (en) * 1969-11-05 1971-05-13 Siemens Ag Deposition of metal contact layers for - beam lead mfd semiconductors

Also Published As

Publication number Publication date
FR2139841B1 (en) 1978-03-03
FR2139841A1 (en) 1973-01-12
JPS5328631B1 (en) 1978-08-16
GB1331038A (en) 1973-09-19
DE2126887C3 (en) 1981-11-19
DE2126887B2 (en) 1981-01-08
IT947677B (en) 1973-05-30
DE2126887A1 (en) 1972-11-30

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