CA1239115B - Sputtering apparatus and method - Google Patents

Sputtering apparatus and method

Info

Publication number
CA1239115B
CA1239115B CA000550621A CA550621A CA1239115B CA 1239115 B CA1239115 B CA 1239115B CA 000550621 A CA000550621 A CA 000550621A CA 550621 A CA550621 A CA 550621A CA 1239115 B CA1239115 B CA 1239115B
Authority
CA
Canada
Prior art keywords
sputtering apparatus
cathode target
workpiece
deposit
vicinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA000550621A
Other languages
French (fr)
Other versions
CA1239115A (en
Inventor
Kovilvila Ramachandran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canadian Patents and Development Ltd
Original Assignee
Canadian Patents and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication of CA1239115B publication Critical patent/CA1239115B/en
Application filed by Canadian Patents and Development Ltd filed Critical Canadian Patents and Development Ltd
Priority to CA 550621 priority Critical patent/CA1239115A/en
Application granted granted Critical
Publication of CA1239115A publication Critical patent/CA1239115A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An apparatus and method is described for the magnetron sputtering onto a workpiece to deposit a thin metallic film. A rotating magnetic field is provided in the vicinity of the cathode target to produce higher yield from a given cathode target.
CA 550621 1987-10-29 1987-10-29 Sputtering apparatus and method Expired CA1239115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA 550621 CA1239115A (en) 1987-10-29 1987-10-29 Sputtering apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA 550621 CA1239115A (en) 1987-10-29 1987-10-29 Sputtering apparatus and method

Publications (2)

Publication Number Publication Date
CA1239115B true CA1239115B (en)
CA1239115A CA1239115A (en) 1988-07-12

Family

ID=4136752

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 550621 Expired CA1239115A (en) 1987-10-29 1987-10-29 Sputtering apparatus and method

Country Status (1)

Country Link
CA (1) CA1239115A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2926161A1 (en) * 2008-01-04 2009-07-10 Horiba Jobin Yvon Sas Soc Par SOURCE MAGNETRON FOR SPECTROMETER WITH LUMINESCENT DISCHARGE.

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5320728A (en) * 1990-03-30 1994-06-14 Applied Materials, Inc. Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity
US5108574A (en) * 1991-01-29 1992-04-28 The Boc Group, Inc. Cylindrical magnetron shield structure
CN113025978A (en) * 2021-02-26 2021-06-25 张鹏成 Magnetron sputtering coating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2926161A1 (en) * 2008-01-04 2009-07-10 Horiba Jobin Yvon Sas Soc Par SOURCE MAGNETRON FOR SPECTROMETER WITH LUMINESCENT DISCHARGE.
WO2009130424A1 (en) * 2008-01-04 2009-10-29 Horiba Jobin Yvon Sas Magnetron source for a glow discharge spectrometer

Also Published As

Publication number Publication date
CA1239115A (en) 1988-07-12

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Legal Events

Date Code Title Description
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MKEC Expiry (correction)
MKEX Expiry