CN113025978A - Magnetron sputtering coating device - Google Patents
Magnetron sputtering coating device Download PDFInfo
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- CN113025978A CN113025978A CN202110213434.XA CN202110213434A CN113025978A CN 113025978 A CN113025978 A CN 113025978A CN 202110213434 A CN202110213434 A CN 202110213434A CN 113025978 A CN113025978 A CN 113025978A
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- 238000000576 coating method Methods 0.000 title claims abstract description 28
- 239000011248 coating agent Substances 0.000 title claims abstract description 26
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 12
- 238000000926 separation method Methods 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims 8
- 230000000694 effects Effects 0.000 claims 1
- 210000003437 trachea Anatomy 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 16
- 230000008569 process Effects 0.000 abstract description 11
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 239000012528 membrane Substances 0.000 abstract description 3
- 238000001771 vacuum deposition Methods 0.000 abstract description 3
- 239000013077 target material Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- -1 argon ion Chemical class 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of vacuum coating, and discloses a magnetron sputtering coating device which comprises a vacuum box, an electric conducting rod, a workpiece, an air pump and a motor, wherein the electric conducting rod is positioned at the top of the vacuum box, a movable frame is movably sleeved on the electric conducting rod and is movably connected with the top of the vacuum box, and a worm and gear are fixedly arranged on the upper surface of the vacuum box. Through the setting of a room and the belt pulley of trading, make can directly lay the work piece and send into the vacuum chamber on the belt pulley and carry out the coating film in, utilize the separation device with the vacuum chamber with trade between the room the passageway cut off, effectively reduce the fluctuation of the inside atmospheric pressure of vacuum chamber, utilize the cooperation between the three, realize incessant the reloading in succession, make the coating film process last incessantly, effectively avoid the energy consumption that the repeated start-stop brought, reduce the coating film cost, and, can directly replace the lapping type work piece with the belt pulley and plate the membrane, realize a tractor serves two-purpose of equipment, strengthen the functionality of equipment.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a magnetron sputtering coating device.
Background
Vacuum coating equipment is widely applied in the production and development processes of components in the electronic industry, is the most widely applied equipment for obtaining vacuum conditions by evaporation by applying an electronic technology at present, and is mainly divided into three forms: the method comprises the following steps of evaporation coating, sputtering coating and ion plating, wherein the sputtering coating is to bombard a solid surface with high-energy particles so that the particles on the solid surface can obtain energy and escape from the surface to be finally deposited on a substrate, but the existing sputtering coating equipment has some defects in the using process, such as the following:
one is that the existing magnetic control equipment is roughly divided into two structures aiming at different coating objects, one is to coat a winding type workpiece, the winding type workpiece is arranged in a vacuum box, the coating position is changed by winding the magnetic control equipment per se in the coating process, the other is to coat a single individual, but the individual needs to be taken out of the vacuum box under the condition of not damaging the gas of the air pressure in the vacuum box in the process, and a new workpiece is arranged and clamped, but in the existing structure, the process is not only complicated, the working procedures are multiple, the time for replacing the workpiece is long, the processing efficiency is greatly reduced, and the winding type workpiece and the single workpiece cannot be matched with the same equipment.
Secondly, the argon ion strikes the surface of target, forms the target of sputter, but in this process, the direction of motion of target is irregular, sputters the surface of vacuum chamber easily and forms one deck coating film, in long-time working process for vacuum chamber surface deposit a large amount of targets, waste raw materials after all, follow-up difficult to clear up moreover, increase the clearance cost.
Disclosure of Invention
The invention provides a magnetron sputtering coating device, which has the advantages of high processing efficiency and low cost and solves the problems in the background technology.
The invention provides the following technical scheme: a magnetron sputtering coating device comprises a vacuum box, an electric conducting rod, a workpiece, an air pump and a motor, wherein the electric conducting rod is positioned at the top of the vacuum box, a movable frame is movably sleeved on the electric conducting rod and is movably connected with the top of the vacuum box, a turbine worm is fixedly arranged on the upper surface of the vacuum box, the turbine of the turbine worm is fixedly sleeved with the movable frame, the bottom end of the electric conducting rod is fixedly connected with a cathode plate positioned in the vacuum box, the center of the bottom surface of the cathode plate is fixedly connected with a magnet, the magnet is divided into an anode and a cathode, the anode is fixedly connected with the cathode plate, two sides of the bottom surface of the movable frame are respectively fixedly connected with the cathode, the bottom end of the anode is fixedly connected with a metal plate, the bottom surface of the metal plate is fixedly connected with a target, a cluster box is fixedly arranged in the inner cavity of the vacuum box and positioned at the bottom, the utility model discloses a vacuum box, including vacuum box, last fixed surface installs the separation device, the right side and the vacuum box fixed connection of separation device, the left side fixed mounting of separation device has the interface channel, the interface channel with trade a room intercommunication, the right side fixed mounting who trades a room has the closing cap, the inside fixed mounting who trades a room has air compression telescopic rod, air compression telescopic rod's bottom and the inside movable mounting who is located a room of trading have the belt pulley, the one end and the motor fixed connection of belt pulley center pin, work piece and belt pulley swing joint, vacuum box's inner chamber bottom has the anode plate through electric conductance stick fixed mounting.
Preferably, the separation device comprises a separation box, an air hole is formed in the top of the separation box, the air hole is communicated with the air pump through an air pipe, a spring is fixedly connected to the top of an inner cavity of the separation box, a piston plate is movably mounted in the inner cavity of the separation box, the piston plate is movably connected with the piece changing chamber, a communicating pipe is formed in the right side of the separation box, and the communicating pipe is communicated with the connecting channel.
Preferably, the bundling box comprises a connecting frame and a supporting frame, the bottom of the connecting frame is fixedly connected with a side target, the supporting frame is fixedly connected with the inner wall of the vacuum box, the bottom of the side target is movably connected with the supporting frame, the connecting frame is movably clamped with the target, and the side target is made of the same material as the target.
Preferably, the cross section of the side target is trapezoidal, and the included angle between the side target and the target is 120 degrees.
Preferably, the vacuum box and the inner wall of the piece changing chamber are provided with movable grooves, and the belt pulley is movably connected with the movable grooves.
The invention has the following beneficial effects:
1. through the setting of a room and the belt pulley of trading, make can directly lay the work piece and send into the vacuum chamber on the belt pulley and carry out the coating film in, utilize the separation device with the vacuum chamber with trade between the room the passageway cut off, effectively reduce the fluctuation of the inside atmospheric pressure of vacuum chamber, utilize the cooperation between the three, realize incessant the reloading in succession, make the coating film process last incessantly, effectively avoid the energy consumption that the repeated start-stop brought, reduce the coating film cost, and, can directly replace the lapping type work piece with the belt pulley and plate the membrane, realize a tractor serves two-purpose of equipment, strengthen the functionality of equipment.
2. Through the setting of case tied in a bundle, make argon ion striking target spare produce the motion in-process of the target of irregular motion sputtering to the work piece, the target of directive vacuum incasement wall is intercepted to the side target spare, effectively avoid the internal surface of vacuum case to be plated the membrane that the one deck is difficult to the clearance on the one hand, reduce follow-up clearance cost, on the other hand, reduce the waste of target, be convenient for follow-up recovery reuse, reduce the processing cost, simultaneously through the setting of adjustable shelf and negative pole, make the magnetic field that acts on the target spare, rotate as the center with the positive pole, reinforcing magnetic field complexity, make the change of ion motion law changeable, reinforcing ion and target spare's collision probability, sputtering efficiency is improved, reinforcing deposition rate.
Drawings
FIG. 1 is a schematic front view of the structure of the present invention;
FIG. 2 is a side view partially in schematic form of the structure of the present invention;
FIG. 3 is a schematic view of the structural bundling box of the present invention;
FIG. 4 is an enlarged view of the point A in FIG. 1;
FIG. 5 is an enlarged view of the point B in FIG. 1.
In the figure: 1. a vacuum box; 2. an electrically conductive rod; 3. a cathode plate; 4. a magnet; 41. a positive electrode; 42. a negative electrode; 5. a metal plate; 6. a target; 7. a bundling box; 71. a connecting frame; 72. a side target; 73. a support frame; 8. a movable frame; 9. a barrier device; 91. a barrier box; 92. air holes; 93. a spring; 94. a piston plate; 95. a communicating pipe; 10. a connecting channel; 11. a workpiece changing chamber; 12. a belt pulley; 13. a workpiece; 14. an anode plate; 15. an air pressure telescopic rod; 16. sealing the cover; 17. a worm gear.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-5, a magnetron sputtering coating device comprises a vacuum box 1, a conductive rod 2, a workpiece 13, an air pump and a motor, wherein the conductive rod 2 is positioned at the top of the vacuum box 1, a movable frame 8 is movably sleeved on the conductive rod 2, the movable frame 8 is movably connected with the top of the vacuum box 1, a turbine worm 17 is fixedly arranged on the upper surface of the vacuum box 1, a turbine of the turbine worm 17 is fixedly sleeved with the movable frame 8, the bottom end of the conductive rod 2 is fixedly connected with a cathode plate 3 positioned in the vacuum box 1, the center of the bottom surface of the cathode plate 3 is fixedly connected with a magnet 4, the magnet 4 is divided into an anode 41 and a cathode 42, the anode 41 is fixedly connected with the cathode plate 3, two sides of the bottom surface of the movable frame 8 are respectively fixedly connected with the cathode 42, the bottom end of the anode 41 is fixedly connected with a metal plate 5, the bottom surface of the metal plate 5 is fixedly connected with a target 6, a cluster box 7, vacuum chamber 1's both sides bottom respectively fixed mounting have a room 11 of changing, the last fixed surface of a room 11 of changing installs separation device 9, separation device 9's right side and vacuum chamber 1 fixed connection, separation device 9's left side fixed mounting has connect channel 10, connect channel 10 and a room 11 intercommunication of changing, the right side fixed mounting of a room 11 of changing has a closing cap 16, the inside fixed mounting of a room 11 of changing has air pressure telescopic link 15, the inside movable mounting that air pressure telescopic link 15's bottom just is located a room 11 of changing has belt pulley 12, the one end and the motor fixed connection of belt pulley 12 center pin, work piece 13 and belt pulley 12 swing joint, there is anode plate 14 through electric conducting rod 2 fixed mounting in vacuum chamber 1's inner chamber bottom.
Wherein, the separation device 9 comprises a separation box 91, an air hole 92 is arranged at the top of the separation box 91, the air hole 92 is communicated with an air pump through an air pipe, the top of the inner cavity of the separation box 91 is fixedly connected with a spring 93, a piston plate 94 is movably arranged in the inner cavity of the separation box 91, the piston plate 94 is movably connected with a piece changing chamber 11, a communicating pipe 95 is arranged at the right side of the separation box 91, the communicating pipe 95 is communicated with a connecting channel 10, the workpiece 13 in the vacuum box 1 is replaced by utilizing a belt pulley 12 to bear the workpiece 13 which is not coated with a film, but when the workpiece is replaced, in order to reduce the fluctuation of the air pressure in the vacuum box 1, the air in the piece changing chamber 11 needs to be pumped, so that the air pressure in the vacuum box 1 is kept consistent, the air is pumped from the air hole 92, when the air pressure reaches a certain time, the piston plate 94 is pulled to rise, the channel between the vacuum box 1 and, the coating process is continuous, energy consumption caused by repeated shutdown and startup is effectively avoided, and the coating cost is reduced.
The bundling box 7 comprises a connecting frame 71 and a supporting frame 73, the bottom of the connecting frame 71 is fixedly connected with a side target piece 72, the supporting frame 73 is fixedly connected with the inner wall of the vacuum box 1, the bottom of the side target piece 72 is movably connected with the supporting frame 73, the connecting frame 71 is movably clamped with the target piece 6, the side target piece 72 and the target piece 6 are made of the same material, when argon ions impact the target piece 6 to generate irregular movement sputtering, the target material towards the inner wall of the vacuum box 1 is intercepted by the side target piece 72 in the movement process of the target material towards the workpiece 13, on one hand, the inner surface of the vacuum box 1 is effectively prevented from being plated with a film which is difficult to clean, the subsequent cleaning cost is reduced, on the other hand, the waste of the target material is reduced, the subsequent recycling and the processing cost is reduced.
The cross section of the side target piece 72 is trapezoidal, and the included angle between the side target piece and the target piece 6 is 120 degrees, so that enough space is reserved for the downward target material, the target material is quickly deposited on the workpiece 13, and a film is formed.
Wherein, the inner walls of the vacuum box 1 and the workpiece changing chamber 11 are provided with movable grooves, and the belt pulley 12 is movably connected with the movable grooves, so that the transmission belt of the belt pulley 12 runs in the movable grooves, and the running of the workpiece 13 is kept stable.
The working principle is that firstly, workpieces 13 are sequentially placed on a belt pulley 12, one workpiece 13 is conveyed into a vacuum box 1 and is right above an anode plate 14, then air is respectively pumped between the vacuum box 1 and a separation device 9 to form vacuum, then a motor is used for driving a worm gear 17 to rotate, the worm gear 17 drives a cathode 42 to rotate around an anode 41 through a movable frame 8 to form a rotating magnetic field, the cathode plate 3 and the anode plate 14 are electrified through a conducting rod 2 to form an electric field, then argon is introduced into the vacuum box 1 to form collision particles, argon ions collide onto a target 6 to form a sputtered target material, the target material is sputtered onto the workpiece 13 under the action of the electric field to deposit a film layer to complete the film coating of the workpiece 13, and then the workpiece 13 is conveyed out of the vacuum box 1 by the belt pulley 12 to enter a workpiece changing chamber 11, at this time, the workpiece 13 in the other workpiece changing chamber 11 is also conveyed into the vacuum box 1 by the belt pulley 12 again for film coating, then, clean air is injected into the air hole 92, so that the air hole 92 descends, then, the piston plate 94 is used for sealing the passage between the vacuum box 1 and the workpiece changing chamber 11, the sealing cover 16 is opened, the workpiece 13 after film coating and the workpiece 13 to be coated are respectively taken out, then, the sealing cover 16 is closed, air is pumped into the air hole 92 by the air pump, and the piston plate 94 is opened to sequentially form a cycle.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (5)
1. The utility model provides a magnetron sputtering coating device, includes vacuum chamber (1), conductance stick (2), work piece (13), air pump and motor, conductance stick (2) are located the top of vacuum chamber (1), its characterized in that: the movable frame (8) is movably sleeved on the electric guide rod (2), the movable frame (8) is movably connected with the top of the vacuum box (1), a turbine worm (17) is fixedly installed on the upper surface of the vacuum box (1), a turbine of the turbine worm (17) is fixedly sleeved with the movable frame (8), the bottom end of the electric guide rod (2) is located at the inner fixedly connected cathode plate (3) of the vacuum box (1), a magnet (4) is fixedly connected with the center of the bottom surface of the cathode plate (3), the magnet (4) is divided into an anode (41) and a cathode (42), the anode (41) is fixedly connected with the cathode plate (3), two sides of the bottom surface of the movable frame (8) are respectively fixedly connected with the cathode (42), a metal plate (5) is fixedly connected with the bottom end of the anode (41), and a target piece (6) is fixedly connected with the bottom surface of the metal plate (5), the vacuum box comprises a vacuum box (1), a bundling box (7) is fixedly mounted at the bottom of a target piece (6) in an inner cavity of the vacuum box (1), a piece changing chamber (11) is fixedly mounted at the bottom of two sides of the vacuum box (1) respectively, a blocking device (9) is fixedly mounted on the upper surface of the piece changing chamber (11), the right side of the blocking device (9) is fixedly connected with the vacuum box (1), a connecting passage (10) is fixedly mounted at the left side of the blocking device (9), the connecting passage (10) is communicated with the piece changing chamber (11), a sealing cover (16) is fixedly mounted at the right side of the piece changing chamber (11), an air pressure telescopic rod (15) is fixedly mounted inside the piece changing chamber (11), a belt pulley (12) is movably mounted at the bottom end of the air pressure telescopic rod (15) and inside the piece changing chamber (11), and one end of a central shaft of the belt pulley (12), the workpiece (13) is movably connected with the belt pulley (12), and an anode plate (14) is fixedly arranged at the bottom of the inner cavity of the vacuum box (1) through an electric conducting rod (2).
2. The magnetron sputtering coating device according to claim 1, characterized in that: separation device (9) are including blocking box (91), gas pocket (92) have been seted up at the top of blocking box (91), gas pocket (92) are through trachea and air pump intercommunication, the inner chamber top fixedly connected with spring (93) of blocking box (91), movable mounting has piston plate (94) in the inner chamber of blocking box (91), piston plate (94) and trade a room (11) swing joint, communicating pipe (95) have been seted up on the right side of blocking box (91), communicating pipe (95) and interface channel (10) intercommunication.
3. The magnetron sputtering coating device according to claim 1, characterized in that: gather a bundle case (7) and include adapter frame (71) and carriage (73), the bottom fixedly connected with side target (72) of adapter frame (71), the inner wall fixed connection of carriage (73) and vacuum box (1), the bottom and carriage (73) swing joint of side target (72), adapter frame (71) and target (6) activity joint, the material of side target (72) and target (6) is the same.
4. The magnetron sputtering coating device according to claim 3, characterized in that: the cross section of the side target piece (72) is trapezoidal, and the included angle between the side target piece and the target piece (6) is 120 degrees.
5. The magnetron sputtering coating device according to claim 1, characterized in that: the inner walls of the vacuum box (1) and the piece changing chamber (11) are provided with movable grooves, and the belt pulley (12) is movably connected with the movable grooves.
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CN202110213434.XA CN113025978A (en) | 2021-02-26 | 2021-02-26 | Magnetron sputtering coating device |
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CN202110213434.XA CN113025978A (en) | 2021-02-26 | 2021-02-26 | Magnetron sputtering coating device |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1195287A (en) * | 1982-11-17 | 1985-10-15 | Michael L. Hill | Focusing magnetron sputtering apparatus |
CA1239115A (en) * | 1987-10-29 | 1988-07-12 | Canadian Patents And Development Limited - Societe Canadienne Des Brevets Et D'exploitation Limitee | Sputtering apparatus and method |
WO2013099061A1 (en) * | 2011-12-27 | 2013-07-04 | キヤノンアネルバ株式会社 | Sputtering device |
CN205893384U (en) * | 2016-07-29 | 2017-01-18 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Continuous type vacuum coating equipment |
CN108545959A (en) * | 2018-04-18 | 2018-09-18 | 安徽通显新材料股份有限公司 | A kind of vacuum coating equipment, glass processing system, film plating process and glass processing method |
CN111876738A (en) * | 2020-07-25 | 2020-11-03 | 童玲 | Vacuum magnetron sputtering coating machine for preparing low-emissivity glass |
-
2021
- 2021-02-26 CN CN202110213434.XA patent/CN113025978A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1195287A (en) * | 1982-11-17 | 1985-10-15 | Michael L. Hill | Focusing magnetron sputtering apparatus |
CA1239115A (en) * | 1987-10-29 | 1988-07-12 | Canadian Patents And Development Limited - Societe Canadienne Des Brevets Et D'exploitation Limitee | Sputtering apparatus and method |
WO2013099061A1 (en) * | 2011-12-27 | 2013-07-04 | キヤノンアネルバ株式会社 | Sputtering device |
CN205893384U (en) * | 2016-07-29 | 2017-01-18 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Continuous type vacuum coating equipment |
CN108545959A (en) * | 2018-04-18 | 2018-09-18 | 安徽通显新材料股份有限公司 | A kind of vacuum coating equipment, glass processing system, film plating process and glass processing method |
CN111876738A (en) * | 2020-07-25 | 2020-11-03 | 童玲 | Vacuum magnetron sputtering coating machine for preparing low-emissivity glass |
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Application publication date: 20210625 |