ATE265089T1 - Eine plasmaanlage mit atmosphärischem druck - Google Patents

Eine plasmaanlage mit atmosphärischem druck

Info

Publication number
ATE265089T1
ATE265089T1 AT01904276T AT01904276T ATE265089T1 AT E265089 T1 ATE265089 T1 AT E265089T1 AT 01904276 T AT01904276 T AT 01904276T AT 01904276 T AT01904276 T AT 01904276T AT E265089 T1 ATE265089 T1 AT E265089T1
Authority
AT
Austria
Prior art keywords
gases
atmospheric pressure
enclosure housing
ambient
plasma region
Prior art date
Application number
AT01904276T
Other languages
English (en)
Inventor
Anthony Herbert
Fergal O'reilly
Jules Braddell
Peter Dobbyn
Original Assignee
Dow Corning Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Ireland Ltd filed Critical Dow Corning Ireland Ltd
Application granted granted Critical
Publication of ATE265089T1 publication Critical patent/ATE265089T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32743Means for moving the material to be treated for introducing the material into processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32788Means for moving the material to be treated for extracting the material from the process chamber

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
AT01904276T 2000-02-11 2001-02-12 Eine plasmaanlage mit atmosphärischem druck ATE265089T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IE20000123 2000-02-11
PCT/IE2001/000023 WO2001059809A1 (en) 2000-02-11 2001-02-12 An atmospheric pressure plasma system

Publications (1)

Publication Number Publication Date
ATE265089T1 true ATE265089T1 (de) 2004-05-15

Family

ID=11042563

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01904276T ATE265089T1 (de) 2000-02-11 2001-02-12 Eine plasmaanlage mit atmosphärischem druck

Country Status (11)

Country Link
US (1) US20030116281A1 (de)
EP (1) EP1259975B1 (de)
JP (1) JP2003523053A (de)
KR (1) KR100819352B1 (de)
CN (1) CN1233018C (de)
AT (1) ATE265089T1 (de)
AU (1) AU2001232188A1 (de)
DE (1) DE60102903T2 (de)
ES (1) ES2220711T3 (de)
IE (1) IES20010113A2 (de)
WO (1) WO2001059809A1 (de)

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US8227051B1 (en) * 2004-06-24 2012-07-24 UT-Battle, LLC Apparatus and method for carbon fiber surface treatment
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DE102004048410A1 (de) * 2004-10-01 2006-05-04 Institut für Niedertemperatur-Plasmaphysik e.V. Anordnung zur Oberflächenbehandlung von Schüttgut in einer Plasmazone bei Atmosphärendruck
GB0509648D0 (en) 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
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US9217066B2 (en) * 2008-03-31 2015-12-22 Ford Global Technologies, Llc Structural polymer insert and method of making the same
US8778080B2 (en) * 2008-05-21 2014-07-15 Institute Of Nuclear Energy Research, Atomic Energy Council Apparatus for double-plasma graft polymerization at atmospheric pressure
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DE102009000639A1 (de) * 2009-02-05 2010-08-12 Voith Patent Gmbh Verfahren zum Beschichten eines Bandes, insbesondere einer Papiermaschinenbespannung
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
EP2326151A1 (de) 2009-11-24 2011-05-25 AGC Glass Europe Verfahren und Vorrichtung zur Polarisierung einer DBD-Elektrode
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CN103103493B (zh) * 2012-11-07 2015-05-06 山东鑫汇铜材有限公司 一种石墨烯铜线生产装置
TWI570745B (zh) 2012-12-19 2017-02-11 因特瓦克公司 用於電漿離子植入之柵極
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Also Published As

Publication number Publication date
WO2001059809A1 (en) 2001-08-16
KR100819352B1 (ko) 2008-04-04
JP2003523053A (ja) 2003-07-29
DE60102903T2 (de) 2005-05-12
CN1404619A (zh) 2003-03-19
US20030116281A1 (en) 2003-06-26
DE60102903D1 (de) 2004-05-27
KR20020092952A (ko) 2002-12-12
IES20010113A2 (en) 2001-09-19
EP1259975B1 (de) 2004-04-21
AU2001232188A1 (en) 2001-08-20
CN1233018C (zh) 2005-12-21
EP1259975A1 (de) 2002-11-27
ES2220711T3 (es) 2004-12-16

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