EA200401344A1 - Система для формирования плазмы при атмосферном давлении - Google Patents

Система для формирования плазмы при атмосферном давлении

Info

Publication number
EA200401344A1
EA200401344A1 EA200401344A EA200401344A EA200401344A1 EA 200401344 A1 EA200401344 A1 EA 200401344A1 EA 200401344 A EA200401344 A EA 200401344A EA 200401344 A EA200401344 A EA 200401344A EA 200401344 A1 EA200401344 A1 EA 200401344A1
Authority
EA
Eurasian Patent Office
Prior art keywords
assembly
plasma
process gas
generating
reactive agent
Prior art date
Application number
EA200401344A
Other languages
English (en)
Other versions
EA007057B1 (ru
Inventor
Фрэнк Суоллоу
Питер Доббин
Стюарт Лидли
Original Assignee
Дау Корнинг Айэлэнд Лимитед
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB0208263.4A external-priority patent/GB0208263D0/en
Priority claimed from GB0208259A external-priority patent/GB0208259D0/en
Application filed by Дау Корнинг Айэлэнд Лимитед filed Critical Дау Корнинг Айэлэнд Лимитед
Publication of EA200401344A1 publication Critical patent/EA200401344A1/ru
Publication of EA007057B1 publication Critical patent/EA007057B1/ru

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/123—Spraying molten metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treating Waste Gases (AREA)
  • Materials For Medical Uses (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Secondary Cells (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Система (100) генерирования плазмы при атмосферном давлении, содержащая устройство (7) генерирования плазмы, имеющее корпус (17), содержащий средство введения реагента, средство введения технологического газа, и одно или более электродных устройств множества параллельных электродов для генерирования плазмы. Каждое электродное устройство имеет по меньшей мере один частично покрытый диэлектриком электрод (3). При этом система выполнена таким образом, что выход технологического газа и реагента, вводимых в систему, осуществляются только через область (6) плазмы между электродами (3). Система (100) выполнена с возможностью перемещения относительно подложки (1) в непосредственной близости от дальних концов (23) электродов. Система (100) также содержит экстрактор (8), размещенный вокруг устройства (7) генерирования плазмы и имеющий корпус, который изолирует систему от внешней атмосферы и обеспечивает удаление отработанного технологического газа, реагентов и побочных продуктов.Международная заявка была опубликована вместе с отчетом о международном поиске.
EA200401344A 2002-04-10 2003-04-08 Система для формирования плазмы при атмосферном давлении EA007057B1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0208263.4A GB0208263D0 (en) 2002-04-10 2002-04-10 Protective coating composition
GB0208259A GB0208259D0 (en) 2002-04-10 2002-04-10 An atmospheric pressure plasma assembly
PCT/EP2003/004345 WO2003085693A1 (en) 2002-04-10 2003-04-08 An atmospheric pressure plasma assembly

Publications (2)

Publication Number Publication Date
EA200401344A1 true EA200401344A1 (ru) 2005-04-28
EA007057B1 EA007057B1 (ru) 2006-06-30

Family

ID=28793309

Family Applications (1)

Application Number Title Priority Date Filing Date
EA200401344A EA007057B1 (ru) 2002-04-10 2003-04-08 Система для формирования плазмы при атмосферном давлении

Country Status (10)

Country Link
US (1) US20050241582A1 (ru)
EP (1) EP1493172B1 (ru)
JP (1) JP2005522824A (ru)
AT (1) ATE310318T1 (ru)
AU (1) AU2003229730A1 (ru)
DE (1) DE60302345T2 (ru)
EA (1) EA007057B1 (ru)
ES (1) ES2253671T3 (ru)
TW (1) TW200308187A (ru)
WO (1) WO2003085693A1 (ru)

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Also Published As

Publication number Publication date
TW200308187A (en) 2003-12-16
WO2003085693A1 (en) 2003-10-16
JP2005522824A (ja) 2005-07-28
EP1493172A1 (en) 2005-01-05
EA007057B1 (ru) 2006-06-30
DE60302345T2 (de) 2006-08-03
DE60302345D1 (de) 2005-12-22
EP1493172B1 (en) 2005-11-16
ES2253671T3 (es) 2006-06-01
US20050241582A1 (en) 2005-11-03
AU2003229730A1 (en) 2003-10-20
ATE310318T1 (de) 2005-12-15

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