ATE209394T1 - Laminat und verfahren für die herstellung einer ohmschen elektrode - Google Patents

Laminat und verfahren für die herstellung einer ohmschen elektrode

Info

Publication number
ATE209394T1
ATE209394T1 AT96927199T AT96927199T ATE209394T1 AT E209394 T1 ATE209394 T1 AT E209394T1 AT 96927199 T AT96927199 T AT 96927199T AT 96927199 T AT96927199 T AT 96927199T AT E209394 T1 ATE209394 T1 AT E209394T1
Authority
AT
Austria
Prior art keywords
film
ohmic electrode
image
fabricating
iii
Prior art date
Application number
AT96927199T
Other languages
English (en)
Inventor
Mitsuhiro Nakamura
Masura Wada
Chihiro Uchibori
Masanori Murakami
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of ATE209394T1 publication Critical patent/ATE209394T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45—Ohmic electrodes
    • H01L29/452—Ohmic electrodes on AIII-BV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Laminated Bodies (AREA)
  • Light Receiving Elements (AREA)
  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
AT96927199T 1995-08-24 1996-08-20 Laminat und verfahren für die herstellung einer ohmschen elektrode ATE209394T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23912095 1995-08-24
PCT/JP1996/002318 WO1997008744A1 (fr) 1995-08-24 1996-08-20 Lamine permettant de former une electrode ohmique et electrode ohmique

Publications (1)

Publication Number Publication Date
ATE209394T1 true ATE209394T1 (de) 2001-12-15

Family

ID=17040094

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96927199T ATE209394T1 (de) 1995-08-24 1996-08-20 Laminat und verfahren für die herstellung einer ohmschen elektrode

Country Status (14)

Country Link
US (1) US20040238891A1 (de)
EP (1) EP0789387B1 (de)
JP (1) JP4048284B2 (de)
KR (1) KR970707572A (de)
CN (1) CN1107339C (de)
AT (1) ATE209394T1 (de)
AU (1) AU6709996A (de)
BR (1) BR9606606A (de)
CA (1) CA2203557A1 (de)
DE (1) DE69617192T2 (de)
ES (1) ES2165515T3 (de)
MY (1) MY118640A (de)
TW (1) TW307926B (de)
WO (1) WO1997008744A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040214417A1 (en) * 2003-03-11 2004-10-28 Paul Rich Methods of forming tungsten or tungsten containing films
US20050175770A1 (en) * 2004-02-10 2005-08-11 Eastman Kodak Company Fabricating an electrode for use in organic electronic devices
CN100479102C (zh) * 2006-08-29 2009-04-15 中国科学院声学研究所 一种图形化铂/钛金属薄膜的剥离制备方法
JP5621228B2 (ja) * 2009-08-27 2014-11-12 富士通株式会社 半導体装置及びその製造方法
JP5437114B2 (ja) * 2010-03-02 2014-03-12 次世代パワーデバイス技術研究組合 半導体トランジスタの製造方法
JP2011204717A (ja) * 2010-03-24 2011-10-13 Sanken Electric Co Ltd 化合物半導体装置
JP5674106B2 (ja) * 2010-09-30 2015-02-25 国立大学法人 東京大学 半導体デバイス、その製造方法及び集積回路
CN102306626B (zh) * 2011-09-09 2013-06-12 电子科技大学 半导体异质结场效应晶体管栅结构的制备方法
US20150152543A1 (en) * 2013-10-30 2015-06-04 Skyworks Solutions, Inc. Systems, devices and methods related to reactive evaporation of refractory materials
EP2881982B1 (de) * 2013-12-05 2019-09-04 IMEC vzw Verfahren zur Herstellung CMOS-kompatibler Kontaktschichten in Halbleitervorrichtungen
US10224285B2 (en) 2017-02-21 2019-03-05 Raytheon Company Nitride structure having gold-free contact and methods for forming such structures
US10096550B2 (en) 2017-02-21 2018-10-09 Raytheon Company Nitride structure having gold-free contact and methods for forming such structures

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01166556A (ja) * 1987-12-23 1989-06-30 Hitachi Ltd ｎ型ＧａＡｓオーム性電極およびその形成方法
US4833042A (en) * 1988-01-27 1989-05-23 Rockwell International Corporation Nonalloyed ohmic contacts for n type gallium arsenide
SE465211B (sv) * 1990-01-10 1991-08-12 Bahco Verktyg Ab Batteridrivet handverktyg
US5027187A (en) * 1990-03-22 1991-06-25 Harris Corporation Polycrystalline silicon ohmic contacts to group III-arsenide compound semiconductors
US5089438A (en) * 1991-04-26 1992-02-18 At&T Bell Laboratories Method of making an article comprising a TiNx layer
JP3180501B2 (ja) * 1993-03-12 2001-06-25 ソニー株式会社 オーミック電極の形成方法
JP3584481B2 (ja) * 1993-09-21 2004-11-04 ソニー株式会社 オーミック電極の形成方法およびオーミック電極形成用積層体
JPH1166556A (ja) * 1997-08-14 1999-03-09 Hightech Syst:Kk 磁気カード用テープ及び穴開け機

Also Published As

Publication number Publication date
US20040238891A1 (en) 2004-12-02
WO1997008744A1 (fr) 1997-03-06
DE69617192D1 (de) 2002-01-03
EP0789387A1 (de) 1997-08-13
ES2165515T3 (es) 2002-03-16
EP0789387A4 (de) 1997-09-03
CA2203557A1 (en) 1997-03-06
AU6709996A (en) 1997-03-19
MY118640A (en) 2004-12-31
MX9702916A (es) 1997-09-30
CN1107339C (zh) 2003-04-30
KR970707572A (ko) 1997-12-01
CN1165583A (zh) 1997-11-19
BR9606606A (pt) 1997-09-16
TW307926B (de) 1997-06-11
EP0789387B1 (de) 2001-11-21
JP4048284B2 (ja) 2008-02-20
DE69617192T2 (de) 2002-07-18

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