ATE134049T1 - Amorphes fluorpolymer enthaltende filmabdeckung - Google Patents

Amorphes fluorpolymer enthaltende filmabdeckung

Info

Publication number
ATE134049T1
ATE134049T1 AT90116949T AT90116949T ATE134049T1 AT E134049 T1 ATE134049 T1 AT E134049T1 AT 90116949 T AT90116949 T AT 90116949T AT 90116949 T AT90116949 T AT 90116949T AT E134049 T1 ATE134049 T1 AT E134049T1
Authority
AT
Austria
Prior art keywords
fluorpolymer
film covering
containing amorphous
covering containing
thin
Prior art date
Application number
AT90116949T
Other languages
English (en)
Inventor
Dalen E Keys
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE134049T1 publication Critical patent/ATE134049T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Secondary Cells (AREA)
  • Closures For Containers (AREA)
AT90116949T 1989-09-06 1990-09-04 Amorphes fluorpolymer enthaltende filmabdeckung ATE134049T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07403644 US5061024C1 (en) 1989-09-06 1989-09-06 Amorphous fluoropolymer pellicle films

Publications (1)

Publication Number Publication Date
ATE134049T1 true ATE134049T1 (de) 1996-02-15

Family

ID=23596515

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90116949T ATE134049T1 (de) 1989-09-06 1990-09-04 Amorphes fluorpolymer enthaltende filmabdeckung

Country Status (7)

Country Link
US (1) US5061024C1 (de)
EP (1) EP0416528B1 (de)
JP (1) JPH0725905B2 (de)
KR (1) KR940010594B1 (de)
AT (1) ATE134049T1 (de)
CA (1) CA2024618C (de)
DE (1) DE69025245T2 (de)

Families Citing this family (41)

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JP2952962B2 (ja) * 1989-05-31 1999-09-27 旭硝子株式会社 汚染防止保護器具
US5229229A (en) * 1990-04-27 1993-07-20 Tosoh Corporation Pellicle having reflection-preventing function
KR950002949B1 (ko) * 1990-10-16 1995-03-28 미쓰이세끼유 가가꾸고오교오 가부시끼가이샤 고광선 투과성 방진막, 그 제조방법 및 방진체
JP3037745B2 (ja) * 1990-11-29 2000-05-08 三井化学株式会社 ペリクル構造体
US5256747A (en) * 1991-05-20 1993-10-26 Leo Ojakaar Soluble perfluoroelastomers
US5168001A (en) * 1991-05-20 1992-12-01 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicle
US5184192A (en) * 1991-07-17 1993-02-02 Millipore Corporation Photometric apparatus with a flow cell coated with an amorphous fluoropolymer
JPH0667409A (ja) * 1992-08-21 1994-03-11 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
US5344677A (en) * 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
US5882773A (en) * 1993-10-13 1999-03-16 The Regents Of The University Of California Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer
CA2251638A1 (en) * 1997-02-13 1998-08-20 Mitsui Chemicals, Incorporated Pellicle membrane for ultraviolet rays and pellicle
ITMI981506A1 (it) 1998-06-30 1999-12-30 Ausimont Spa Manufatti di fluoropolimeri amorfi
JP3467191B2 (ja) * 1998-08-19 2003-11-17 信越化学工業株式会社 ペリクル製造用治具およびこれを用いたペリクルの製造方法
TW420770B (en) 1998-09-22 2001-02-01 Mitsui Chemicals Inc Pellicle film, method of preparing the same and exposure method
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
IT1312320B1 (it) 1999-05-25 2002-04-15 Ausimont Spa Membrane di polimeri amorfi (per) fluorurati.
US6280885B1 (en) 1999-08-11 2001-08-28 Dupont Photomasks, Inc. Dust cover comprising anti-reflective coating
JP2003514955A (ja) * 1999-11-17 2003-04-22 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 紫外および真空紫外透過性重合体組成物およびそれらの使用
US6824930B1 (en) 1999-11-17 2004-11-30 E. I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
US6770404B1 (en) 1999-11-17 2004-08-03 E. I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
US7271950B1 (en) 2000-02-16 2007-09-18 Toppan Photomasks, Inc. Apparatus and method for optimizing a pellicle for off-axis transmission of light
US6548129B2 (en) 2000-03-15 2003-04-15 Asahi Glass Company, Limited Pellicle
JP2001330943A (ja) * 2000-03-15 2001-11-30 Asahi Glass Co Ltd ペリクル
US6678051B2 (en) 2001-01-18 2004-01-13 Systec, Inc. Flow cells utilizing photometric techniques
JP2004536171A (ja) 2001-05-14 2004-12-02 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用
JP2004085713A (ja) * 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル
US7094505B2 (en) * 2002-10-29 2006-08-22 Toppan Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
US7214452B2 (en) * 2002-11-07 2007-05-08 Intel Corporation Using perfluoropoly-ethers to form pellicles
US20040137371A1 (en) * 2003-01-09 2004-07-15 Garza Cesar M. Method of making a semiconductor device using a pellicle that is transparent at short wavelengths
US7022437B2 (en) * 2003-01-15 2006-04-04 Asml Netherlands B.V. Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
US7264853B2 (en) 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
US7314667B2 (en) 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
KR20070092291A (ko) * 2004-12-21 2007-09-12 이 아이 듀폰 디 네모아 앤드 캄파니 기판 상에 패턴화 불소중합체 필름을 형성하는 방법
US7298472B2 (en) * 2004-12-28 2007-11-20 Rheodyne, Llc Fluid analysis apparatus
US7259840B1 (en) 2004-12-28 2007-08-21 Systec, Llc Fluid analysis apparatus
EP2592474B1 (de) * 2010-07-08 2015-04-08 Mitsui Chemicals, Inc. Pellikel
EP2722350A1 (de) 2012-10-19 2014-04-23 Solvay Specialty Polymers Italy S.p.A. Amorphes fluoriniertes Polymer
TWI644953B (zh) * 2017-09-21 2018-12-21 微相科技股份有限公司 DUV mask frame protection film preparation method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
US4935477A (en) * 1981-08-20 1990-06-19 E. I. Du Pont De Nemours And Company Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
JPS5838707A (ja) * 1981-08-20 1983-03-07 イ−・アイ・デユポン・デ・ニモアス・アンド・カンパニ− パ−フルオロ−２，２−ジメチル−１，３−ジオキソ−ルの無定形共重合体
US4754009A (en) * 1981-08-20 1988-06-28 E. I. Du Pont De Nemours And Company Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
US4378953A (en) * 1981-12-02 1983-04-05 Advanced Semiconductor Products Thin, optical membranes and methods and apparatus for making them
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
JPS58219023A (ja) * 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
US4523974A (en) * 1983-02-14 1985-06-18 The Perkin-Elmer Corporation Method of fabricating a pellicle cover for projection printing system
US4465759A (en) * 1983-02-14 1984-08-14 The Perkin-Elmer Corporation Method of fabricating a pellicle cover for projection printing system
US4482591A (en) * 1983-03-08 1984-11-13 J. T. Baker Chemical Company Polyvinyl butyrate pellicle compositions and pellicles thereof for projection printing
US4499231A (en) * 1983-03-22 1985-02-12 J. T. Baker Chemical Company Pellicle compositions and pellicles thereof for projection printing
US4476172A (en) * 1983-04-18 1984-10-09 J. T. Baker Chemical Company Pellicle compositions and pellicles thereof for projection printing
JPS6083032A (ja) * 1983-10-13 1985-05-11 Asahi Chem Ind Co Ltd 光透過性に優れたフオトマスク用防塵カバ−
JPS60237450A (ja) * 1984-05-11 1985-11-26 Asahi Chem Ind Co Ltd 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法
US4796973A (en) * 1984-10-16 1989-01-10 Tau Laboratories, Inc. Pellicle structure for transmission of mid ultraviolet light
US4754099A (en) * 1987-05-27 1988-06-28 Shell Oil Company Disproportionation of olefins

Also Published As

Publication number Publication date
CA2024618C (en) 1999-02-16
JPH03174450A (ja) 1991-07-29
US5061024C1 (en) 2002-02-26
EP0416528A2 (de) 1991-03-13
JPH0725905B2 (ja) 1995-03-22
EP0416528A3 (en) 1991-06-05
CA2024618A1 (en) 1991-03-07
DE69025245T2 (de) 1996-08-01
EP0416528B1 (de) 1996-02-07
KR940010594B1 (ko) 1994-10-24
DE69025245D1 (de) 1996-03-21
US5061024A (en) 1991-10-29
KR910006773A (ko) 1991-04-30

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