GB2332534B - A mask for fabricating a semiconductor device and method thereof - Google Patents

A mask for fabricating a semiconductor device and method thereof

Info

Publication number
GB2332534B
GB2332534B GB9824540A GB9824540A GB2332534B GB 2332534 B GB2332534 B GB 2332534B GB 9824540 A GB9824540 A GB 9824540A GB 9824540 A GB9824540 A GB 9824540A GB 2332534 B GB2332534 B GB 2332534B
Authority
GB
United Kingdom
Prior art keywords
mask
frame
frames
fabricating
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9824540A
Other versions
GB2332534A (en
GB9824540D0 (en
Inventor
Seung-Seok Yoo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
LG Semicon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Semicon Co Ltd filed Critical LG Semicon Co Ltd
Publication of GB9824540D0 publication Critical patent/GB9824540D0/en
Publication of GB2332534A publication Critical patent/GB2332534A/en
Application granted granted Critical
Publication of GB2332534B publication Critical patent/GB2332534B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60C—VEHICLE TYRES; TYRE INFLATION; TYRE CHANGING; CONNECTING VALVES TO INFLATABLE ELASTIC BODIES IN GENERAL; DEVICES OR ARRANGEMENTS RELATED TO TYRES
    • B60C23/00—Devices for measuring, signalling, controlling, or distributing tyre pressure or temperature, specially adapted for mounting on vehicles; Arrangement of tyre inflating devices on vehicles, e.g. of pumps or of tanks; Tyre cooling arrangements
    • B60C23/06—Signalling devices actuated by deformation of the tyre, e.g. tyre mounted deformation sensors or indirect determination of tyre deformation based on wheel speed, wheel-centre to ground distance or inclination of wheel axle
    • B60C23/061—Signalling devices actuated by deformation of the tyre, e.g. tyre mounted deformation sensors or indirect determination of tyre deformation based on wheel speed, wheel-centre to ground distance or inclination of wheel axle by monitoring wheel speed
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60Y—INDEXING SCHEME RELATING TO ASPECTS CROSS-CUTTING VEHICLE TECHNOLOGY
    • B60Y2400/00—Special features of vehicle units
    • B60Y2400/30—Sensors
    • B60Y2400/303—Speed sensors
    • B60Y2400/3032—Wheel speed sensors

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

A mask comprises a substrate 2 which is optically transparent with an opaque pattern 3 thereon; mask frames 14 placed on the upper and lower edges of the mask; a plurality of holes and screws 15,15a for removably fixing the mask frames round the mask; a pellicle frame 6 attached to top and bottom surfaces of each mask frame; and a pellicle 7 attached to top and bottom surfaces of each pellicle frame and thus covering a centre part of the mask. It is thus possible to replace the mask within the protective frame without scrapping the mask. The mask frames may be fixed by clamps and grooves (Figs 6-8 not shown) rather than screws and the mask may be a single opaque substrate with holes (Fig 5 not shown).
GB9824540A 1997-12-19 1998-11-09 A mask for fabricating a semiconductor device and method thereof Expired - Fee Related GB2332534B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019970071019A KR19990051659A (en) 1997-12-19 1997-12-19 Tire deformation warning device

Publications (3)

Publication Number Publication Date
GB9824540D0 GB9824540D0 (en) 1999-01-06
GB2332534A GB2332534A (en) 1999-06-23
GB2332534B true GB2332534B (en) 1999-11-03

Family

ID=19527923

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9824540A Expired - Fee Related GB2332534B (en) 1997-12-19 1998-11-09 A mask for fabricating a semiconductor device and method thereof

Country Status (2)

Country Link
KR (1) KR19990051659A (en)
GB (1) GB2332534B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016079052A2 (en) * 2014-11-17 2016-05-26 Asml Netherlands B.V. Apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0252673A2 (en) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Removable pellicle and method
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
EP0438602A1 (en) * 1989-08-10 1991-07-31 Daicel Chemical Industries, Ltd. Dust-preventing film
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
EP0252673A2 (en) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Removable pellicle and method
EP0438602A1 (en) * 1989-08-10 1991-07-31 Daicel Chemical Industries, Ltd. Dust-preventing film
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle

Also Published As

Publication number Publication date
KR19990051659A (en) 1999-07-05
GB2332534A (en) 1999-06-23
GB9824540D0 (en) 1999-01-06

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20061109