AR049884A1 - Procedimiento de deposito al vacio y el sustrato obtenido - Google Patents

Procedimiento de deposito al vacio y el sustrato obtenido

Info

Publication number
AR049884A1
AR049884A1 ARP050101584A ARP050101584A AR049884A1 AR 049884 A1 AR049884 A1 AR 049884A1 AR P050101584 A ARP050101584 A AR P050101584A AR P050101584 A ARP050101584 A AR P050101584A AR 049884 A1 AR049884 A1 AR 049884A1
Authority
AR
Argentina
Prior art keywords
spray
target
substrate
substrate obtained
sprayed
Prior art date
Application number
ARP050101584A
Other languages
English (en)
Spanish (es)
Inventor
Nicolas Nadaud
Eric Mattmann
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of AR049884A1 publication Critical patent/AR049884A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
ARP050101584A 2004-04-21 2005-04-21 Procedimiento de deposito al vacio y el sustrato obtenido AR049884A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0404204A FR2869324B1 (fr) 2004-04-21 2004-04-21 Procede de depot sous vide

Publications (1)

Publication Number Publication Date
AR049884A1 true AR049884A1 (es) 2006-09-13

Family

ID=34944951

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP050101584A AR049884A1 (es) 2004-04-21 2005-04-21 Procedimiento de deposito al vacio y el sustrato obtenido

Country Status (9)

Country Link
US (1) US20090226735A1 (enExample)
EP (1) EP1743048A2 (enExample)
JP (1) JP2007533856A (enExample)
KR (1) KR20070004042A (enExample)
CN (1) CN1950540A (enExample)
AR (1) AR049884A1 (enExample)
FR (1) FR2869324B1 (enExample)
RU (1) RU2006141003A (enExample)
WO (1) WO2005106070A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
JP2011100111A (ja) 2009-10-09 2011-05-19 Seiko Epson Corp 光学物品、光学物品の製造方法、電子機器
US8758580B2 (en) * 2010-08-23 2014-06-24 Vaeco Inc. Deposition system with a rotating drum
US9365450B2 (en) * 2012-12-27 2016-06-14 Intermolecular, Inc. Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
US20150364626A1 (en) * 2014-06-11 2015-12-17 Electronics And Telecommunications Research Institute Transparent electrode and solar cell including the same
WO2019125186A1 (en) 2017-12-22 2019-06-27 Institute Of Geological And Nuclear Sciences Limited Ion beam sputtering apparatus and method
US10544499B1 (en) * 2018-08-13 2020-01-28 Valeo North America, Inc. Reflector for vehicle lighting
CN112745038B (zh) * 2019-10-30 2022-12-06 传奇视界有限公司 电控变色玻璃制备方法
FR3133057B1 (fr) * 2022-02-25 2024-05-24 Saint Gobain Matériau comprenant un revêtement contrôle solaire

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
JPH0626877B2 (ja) * 1988-06-14 1994-04-13 旭硝子株式会社 熱線遮断ガラス
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
DE3880135T2 (de) * 1988-09-08 1993-09-16 Asahi Glass Co Ltd Zerstaeubungsverfahren mittels eines bandfoermigen plasmaflusses und geraet zur handhabung dieses verfahrens.
DE3834318A1 (de) * 1988-10-08 1990-04-12 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
DE3904991A1 (de) * 1989-02-18 1990-08-23 Leybold Ag Kathodenzerstaeubungsvorrichtung
JP2896193B2 (ja) * 1989-07-27 1999-05-31 株式会社東芝 酸化物結晶配向膜の製造方法及び酸化物結晶配向膜並びに光磁気記録媒体
DE4324576C1 (de) * 1993-07-22 1995-01-26 Ver Glaswerke Gmbh Verfahren zur Herstellung einer mit einer Mehrfachschicht versehenen Glasscheibe
US6416880B1 (en) * 1993-12-09 2002-07-09 Seagate Technology, Llc Amorphous permalloy films and method of preparing the same
JPH08127869A (ja) * 1994-10-27 1996-05-21 Japan Aviation Electron Ind Ltd イオンビームスパッタリング装置
EP1155816B1 (en) * 1998-12-28 2007-02-14 Asahi Glass Company Ltd. Layered product
JP4370650B2 (ja) * 1998-12-28 2009-11-25 旭硝子株式会社 積層体およびその製造方法
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials

Also Published As

Publication number Publication date
RU2006141003A (ru) 2008-05-27
KR20070004042A (ko) 2007-01-05
JP2007533856A (ja) 2007-11-22
FR2869324A1 (fr) 2005-10-28
WO2005106070A2 (fr) 2005-11-10
WO2005106070A3 (fr) 2005-12-29
CN1950540A (zh) 2007-04-18
FR2869324B1 (fr) 2007-08-10
US20090226735A1 (en) 2009-09-10
EP1743048A2 (fr) 2007-01-17

Similar Documents

Publication Publication Date Title
WO2007015023A3 (fr) Procede de depot d'une couche anti-rayure
EP2172577A3 (en) Surface treatments for turbine components to reduce particle accumulation during use thereof
AR049884A1 (es) Procedimiento de deposito al vacio y el sustrato obtenido
SG158896A1 (en) Substrate with antimicrobial properties
DK1332238T3 (da) Metalliseret film, fremgangsmåde til fremstilling heraf samt anvendelse heraf
GB2450950B (en) A method for the manufacture of a hard material coating on a substrate
AR059303A2 (es) Un proceso para la produccion de un sustrato recubierto fotocataliticamente activo
TW200702468A (en) Improved magnetron sputtering system for large-area substrates
TW200741033A (en) Ceramic coating member for semiconductor processing apparatus
TW200714560A (en) Spray-coated member having an excellent resistance to plasma erosion and method of producing the same
ATE502690T1 (de) Oberflächenplasmagasverarbeitung
EA200600113A1 (ru) Подложка, покрытая слоем диэлектрика, способ и устройство для её изготовления
TW200641165A (en) Elastomer bonding of large area sputtering target
WO2001036704A3 (en) Method and apparatus for forming carbonaceous film
ATE527391T1 (de) Verfahren zum herstellen eines antimikrobiell wirkenden materials
TW200712251A (en) Protection film structure for a metal member, metal parts using the protection film structure, and semiconductor of flat display production apparatus using the protection film structure
JP2017108053A (ja) 電子デバイスの製造方法および積層体
AR017505A1 (es) METODO PARA CREAR UNA PELICULA DE CARBONO CON ASPECTO DE DIAMANTE EN UN SUBSTRATO Y ARTíCULO DE FABRICACIoN OBTENIDO POR DICHO METODO
MX2010006214A (es) Unidad de recubrimiento al vacio de pvd.
CO5690658A2 (es) Proceso para la aplicacion por alto vacio de substratos acin tados con una capa de barrera de oxido de aluminio
ATE543190T1 (de) Materialabscheidung aus einer verflüssigten gaslösung
ATE520143T1 (de) Sputter-target mit langsamsputter-schicht unter targetmaterial
MX2010004854A (es) Metodo para fabricar una superficie tratada y fuentes de plasma de vacio.
TW200702469A (en) Improved magnetron sputtering system for large-area substrates having removable anodes
TW200615135A (en) Carrier film for ceramic green sheet, ceramic green sheet processing method using it and manufacturing method of electronic part

Legal Events

Date Code Title Description
FB Suspension of granting procedure