ZA901150B - Magnetooptic layer and a process for its fabrication - Google Patents
Magnetooptic layer and a process for its fabricationInfo
- Publication number
- ZA901150B ZA901150B ZA901150A ZA901150A ZA901150B ZA 901150 B ZA901150 B ZA 901150B ZA 901150 A ZA901150 A ZA 901150A ZA 901150 A ZA901150 A ZA 901150A ZA 901150 B ZA901150 B ZA 901150B
- Authority
- ZA
- South Africa
- Prior art keywords
- substrates
- fabrication
- sputter
- layer
- sputter targets
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052761 rare earth metal Inorganic materials 0.000 abstract 1
- 150000002910 rare earth metals Chemical class 0.000 abstract 1
- 229910052723 transition metal Inorganic materials 0.000 abstract 1
- 150000003624 transition metals Chemical class 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
- G11B11/10586—Record carriers characterised by the selection of the material or by the structure or form characterised by the selection of the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/265—Magnetic multilayers non exchange-coupled
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12639—Adjacent, identical composition, components
- Y10T428/12646—Group VIII or IB metal-base
- Y10T428/12653—Fe, containing 0.01-1.7% carbon [i.e., steel]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Measuring Magnetic Variables (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3904611A DE3904611A1 (de) | 1989-02-16 | 1989-02-16 | Magnetooptische schicht und verfahren zu ihrer herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA901150B true ZA901150B (en) | 1990-10-31 |
Family
ID=6374184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA901150A ZA901150B (en) | 1989-02-16 | 1990-02-15 | Magnetooptic layer and a process for its fabrication |
Country Status (12)
Country | Link |
---|---|
US (1) | US5527605A (ja) |
EP (1) | EP0383216B1 (ja) |
JP (1) | JP2996681B2 (ja) |
AT (1) | ATE130117T1 (ja) |
AU (1) | AU630664B2 (ja) |
BR (1) | BR9000700A (ja) |
CA (1) | CA2010014A1 (ja) |
DE (2) | DE3904611A1 (ja) |
DK (1) | DK0383216T3 (ja) |
ES (1) | ES2081311T3 (ja) |
FI (1) | FI900721A0 (ja) |
ZA (1) | ZA901150B (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0598377B1 (en) * | 1992-11-17 | 1999-09-22 | Mitsubishi Chemical Corporation | Magneto-optical recording medium and optical information recording and reading-out method |
JP2664330B2 (ja) * | 1993-09-02 | 1997-10-15 | 富士通株式会社 | 光磁気記録媒体 |
JP2912154B2 (ja) * | 1994-03-24 | 1999-06-28 | シャープ株式会社 | 磁気光学記録媒体およびその製造方法 |
US6342131B1 (en) * | 1998-04-17 | 2002-01-29 | Kabushiki Kaisha Toshiba | Method of depositing a multilayer thin film by means of magnetron sputtering which controls the magnetic field |
US6328858B1 (en) | 1998-10-01 | 2001-12-11 | Nexx Systems Packaging, Llc | Multi-layer sputter deposition apparatus |
US6530733B2 (en) | 2000-07-27 | 2003-03-11 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
US6821912B2 (en) | 2000-07-27 | 2004-11-23 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
US6682288B2 (en) | 2000-07-27 | 2004-01-27 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
JP4033082B2 (ja) | 2002-11-07 | 2008-01-16 | 株式会社村田製作所 | Dc−dcコンバータ |
US7100954B2 (en) | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
JP5004484B2 (ja) * | 2006-03-23 | 2012-08-22 | 日本碍子株式会社 | 誘電体デバイス |
US7687390B2 (en) * | 2006-03-28 | 2010-03-30 | Toppan Printing Co., Ltd. | Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method |
KR20090132348A (ko) * | 2008-06-20 | 2009-12-30 | 한국기계연구원 | 자성을 보유하는 사이알론 및 그 제조방법 |
CN108863096B (zh) * | 2018-08-16 | 2021-02-26 | 重庆市渝大节能玻璃有限公司 | 玻璃镀膜用防溅射的阴极底板 |
CN113608372B (zh) * | 2021-07-14 | 2024-03-19 | 江苏大学 | 一种pt对称耦合微腔和磁微腔复合结构及其应用 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4293621A (en) * | 1978-10-12 | 1981-10-06 | Nippon Hoso Kyokai | Recording medium |
DE3309483C3 (de) * | 1982-03-17 | 2003-02-27 | Canon Kk | Magnetooptisches Aufzeichnungsmaterial und dessen Verwendung |
US4569881A (en) * | 1983-05-17 | 1986-02-11 | Minnesota Mining And Manufacturing Company | Multi-layer amorphous magneto optical recording medium |
JPH0670858B2 (ja) * | 1983-05-25 | 1994-09-07 | ソニー株式会社 | 光磁気記録媒体とその製法 |
JPS609855A (ja) * | 1983-06-28 | 1985-01-18 | Toshiba Corp | 磁性合金 |
JPS60243844A (ja) * | 1984-05-18 | 1985-12-03 | Fujitsu Ltd | 光磁気記録媒体 |
JPS60243840A (ja) * | 1984-05-18 | 1985-12-03 | Fujitsu Ltd | 光磁気記録体 |
JPS6148148A (ja) * | 1984-08-13 | 1986-03-08 | Toshiba Corp | 光熱磁気記録媒体 |
DE3536210A1 (de) * | 1984-10-11 | 1986-04-17 | Hitachi, Ltd., Tokio/Tokyo | Magnetooptisches aufzeichnungsmedium |
JPS61144742A (ja) * | 1984-12-17 | 1986-07-02 | Sony Corp | 光磁気記録媒体 |
KR870006535A (ko) * | 1985-02-27 | 1987-07-13 | 나가이 아쯔시 | 광자기 기록 매체 |
JPS61255546A (ja) * | 1985-05-09 | 1986-11-13 | Kokusai Denshin Denwa Co Ltd <Kdd> | 光磁気記録媒体 |
US4794560A (en) * | 1985-09-30 | 1988-12-27 | International Business Machines Corporation | Eraseable self biasing thermal magneto-optic medium |
US4649519A (en) * | 1985-09-30 | 1987-03-10 | International Business Machines Corporation | Self biasing thermal magneto-optic medium |
US4694358A (en) * | 1985-10-28 | 1987-09-15 | Kerdix, Inc. | Magneto-optic recording structure and method |
JPH07105082B2 (ja) * | 1985-11-28 | 1995-11-13 | ソニー株式会社 | 光磁気記録媒体 |
JPH0695404B2 (ja) * | 1985-12-27 | 1994-11-24 | ソニー株式会社 | 光磁気記録方法 |
DE3642161A1 (de) * | 1986-12-10 | 1988-06-23 | Philips Patentverwaltung | Verfahren zur herstellung eines magneto-optischen speichers |
JPS63184940A (ja) * | 1987-01-27 | 1988-07-30 | Sumitomo Metal Mining Co Ltd | 光磁気デイスク |
JPS63188843A (ja) * | 1987-01-31 | 1988-08-04 | Nec Home Electronics Ltd | 光磁気デイスクの製造方法 |
US4740430A (en) * | 1987-02-18 | 1988-04-26 | American Telephone And Telegraph Company, At&T Bell Laboratories | Magneto-optic memory |
-
1989
- 1989-02-16 DE DE3904611A patent/DE3904611A1/de not_active Withdrawn
-
1990
- 1990-02-10 AT AT90102647T patent/ATE130117T1/de not_active IP Right Cessation
- 1990-02-10 DE DE59009844T patent/DE59009844D1/de not_active Expired - Fee Related
- 1990-02-10 DK DK90102647.6T patent/DK0383216T3/da active
- 1990-02-10 ES ES90102647T patent/ES2081311T3/es not_active Expired - Lifetime
- 1990-02-10 EP EP90102647A patent/EP0383216B1/de not_active Expired - Lifetime
- 1990-02-14 CA CA002010014A patent/CA2010014A1/en not_active Abandoned
- 1990-02-14 FI FI900721A patent/FI900721A0/fi not_active IP Right Cessation
- 1990-02-14 AU AU49784/90A patent/AU630664B2/en not_active Ceased
- 1990-02-15 JP JP2035039A patent/JP2996681B2/ja not_active Expired - Fee Related
- 1990-02-15 BR BR909000700A patent/BR9000700A/pt not_active Application Discontinuation
- 1990-02-15 ZA ZA901150A patent/ZA901150B/xx unknown
-
1994
- 1994-04-07 US US08/224,190 patent/US5527605A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3904611A1 (de) | 1990-08-23 |
ES2081311T3 (es) | 1996-03-01 |
US5527605A (en) | 1996-06-18 |
CA2010014A1 (en) | 1990-08-16 |
EP0383216B1 (de) | 1995-11-08 |
BR9000700A (pt) | 1991-01-22 |
DE59009844D1 (de) | 1995-12-14 |
FI900721A0 (fi) | 1990-02-14 |
DK0383216T3 (da) | 1995-12-11 |
EP0383216A3 (de) | 1991-09-11 |
ATE130117T1 (de) | 1995-11-15 |
JP2996681B2 (ja) | 2000-01-11 |
AU630664B2 (en) | 1992-11-05 |
JPH02247848A (ja) | 1990-10-03 |
AU4978490A (en) | 1990-08-23 |
EP0383216A2 (de) | 1990-08-22 |
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