ES2081311T3 - Capa magnetooptica y procedimiento para su obtencion. - Google Patents

Capa magnetooptica y procedimiento para su obtencion.

Info

Publication number
ES2081311T3
ES2081311T3 ES90102647T ES90102647T ES2081311T3 ES 2081311 T3 ES2081311 T3 ES 2081311T3 ES 90102647 T ES90102647 T ES 90102647T ES 90102647 T ES90102647 T ES 90102647T ES 2081311 T3 ES2081311 T3 ES 2081311T3
Authority
ES
Spain
Prior art keywords
layer
procedure
obtaining
sputtertargets
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90102647T
Other languages
English (en)
Inventor
Karl-Friedrich Dr Dipl- Dossel
Ernst-Gunther Dr Dip Schlosser
Bernd Dr Dipl-Phys Fischer
Gunther Dr Dipl-Phys Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Application granted granted Critical
Publication of ES2081311T3 publication Critical patent/ES2081311T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G11B11/10586—Record carriers characterised by the selection of the material or by the structure or form characterised by the selection of the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
    • H01F10/265—Magnetic multilayers non exchange-coupled
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/90—Magnetic feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12639—Adjacent, identical composition, components
    • Y10T428/12646—Group VIII or IB metal-base
    • Y10T428/12653—Fe, containing 0.01-1.7% carbon [i.e., steel]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Measuring Magnetic Variables (AREA)
  • Magnetic Heads (AREA)

Abstract

LA CAPA OPTICOMAGNETICA DE METALES RAROS DE LA TIERRA Y METALES DE TRANSICION TIENE UN AGRADIENTE DE LA COMPOSICION DE LA ALEACION SOBRE LA PROFUNDIDAD DE LA CAPA Y TIENE UN CAMPO DE TEMPERATURA AT=100 C EN TORNO A LA TEMPERATURA DE COMPENSACION T COMP UN ESPESOR COERCITIVO DE CAMPO SUPERIOR A 8 KOE. LA FABRICACION SE EFECTUA EN UN PROCESO DINAMICO SPUTTER EN EL QUE LOS SUSTRATOS A CUBRIR ESTAN COLOCADOS EN UNO O VARIOS SPUTTERTARGETS QUE ESTAN CONJUNTAMENTE EN UN PLANO PARALELO A LA BANDA DE SUSTRATOS. ENTRE EK SPUTTERTARGETS Y LOS SUSTRATOS SE ENCUENTRA UN DIAFRAGMA.
ES90102647T 1989-02-16 1990-02-10 Capa magnetooptica y procedimiento para su obtencion. Expired - Lifetime ES2081311T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3904611A DE3904611A1 (de) 1989-02-16 1989-02-16 Magnetooptische schicht und verfahren zu ihrer herstellung

Publications (1)

Publication Number Publication Date
ES2081311T3 true ES2081311T3 (es) 1996-03-01

Family

ID=6374184

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90102647T Expired - Lifetime ES2081311T3 (es) 1989-02-16 1990-02-10 Capa magnetooptica y procedimiento para su obtencion.

Country Status (12)

Country Link
US (1) US5527605A (es)
EP (1) EP0383216B1 (es)
JP (1) JP2996681B2 (es)
AT (1) ATE130117T1 (es)
AU (1) AU630664B2 (es)
BR (1) BR9000700A (es)
CA (1) CA2010014A1 (es)
DE (2) DE3904611A1 (es)
DK (1) DK0383216T3 (es)
ES (1) ES2081311T3 (es)
FI (1) FI900721A0 (es)
ZA (1) ZA901150B (es)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0598377B1 (en) * 1992-11-17 1999-09-22 Mitsubishi Chemical Corporation Magneto-optical recording medium and optical information recording and reading-out method
JP2664330B2 (ja) * 1993-09-02 1997-10-15 富士通株式会社 光磁気記録媒体
JP2912154B2 (ja) * 1994-03-24 1999-06-28 シャープ株式会社 磁気光学記録媒体およびその製造方法
US6342131B1 (en) * 1998-04-17 2002-01-29 Kabushiki Kaisha Toshiba Method of depositing a multilayer thin film by means of magnetron sputtering which controls the magnetic field
US6328858B1 (en) 1998-10-01 2001-12-11 Nexx Systems Packaging, Llc Multi-layer sputter deposition apparatus
US6821912B2 (en) 2000-07-27 2004-11-23 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6682288B2 (en) 2000-07-27 2004-01-27 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6530733B2 (en) 2000-07-27 2003-03-11 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
JP4033082B2 (ja) 2002-11-07 2008-01-16 株式会社村田製作所 Ｄｃ−ｄｃコンバータ
US7100954B2 (en) 2003-07-11 2006-09-05 Nexx Systems, Inc. Ultra-thin wafer handling system
JP5004484B2 (ja) * 2006-03-23 2012-08-22 日本碍子株式会社 誘電体デバイス
US7687390B2 (en) * 2006-03-28 2010-03-30 Toppan Printing Co., Ltd. Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method
KR20090132348A (ko) * 2008-06-20 2009-12-30 한국기계연구원 자성을 보유하는 사이알론 및 그 제조방법
CN108863096B (zh) * 2018-08-16 2021-02-26 重庆市渝大节能玻璃有限公司 玻璃镀膜用防溅射的阴极底板
CN113608372B (zh) * 2021-07-14 2024-03-19 江苏大学 一种pt对称耦合微腔和磁微腔复合结构及其应用

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4293621A (en) * 1978-10-12 1981-10-06 Nippon Hoso Kyokai Recording medium
DE3309483C3 (de) * 1982-03-17 2003-02-27 Canon Kk Magnetooptisches Aufzeichnungsmaterial und dessen Verwendung
US4569881A (en) * 1983-05-17 1986-02-11 Minnesota Mining And Manufacturing Company Multi-layer amorphous magneto optical recording medium
JPH0670858B2 (ja) * 1983-05-25 1994-09-07 ソニー株式会社 光磁気記録媒体とその製法
JPS609855A (ja) * 1983-06-28 1985-01-18 Toshiba Corp 磁性合金
JPS60243844A (ja) * 1984-05-18 1985-12-03 Fujitsu Ltd 光磁気記録媒体
JPS60243840A (ja) * 1984-05-18 1985-12-03 Fujitsu Ltd 光磁気記録体
JPS6148148A (ja) * 1984-08-13 1986-03-08 Toshiba Corp 光熱磁気記録媒体
DE3536210A1 (de) * 1984-10-11 1986-04-17 Hitachi, Ltd., Tokio/Tokyo Magnetooptisches aufzeichnungsmedium
JPS61144742A (ja) * 1984-12-17 1986-07-02 Sony Corp 光磁気記録媒体
KR870006535A (ko) * 1985-02-27 1987-07-13 나가이 아쯔시 광자기 기록 매체
JPS61255546A (ja) * 1985-05-09 1986-11-13 Kokusai Denshin Denwa Co Ltd <Kdd> 光磁気記録媒体
US4794560A (en) * 1985-09-30 1988-12-27 International Business Machines Corporation Eraseable self biasing thermal magneto-optic medium
US4649519A (en) * 1985-09-30 1987-03-10 International Business Machines Corporation Self biasing thermal magneto-optic medium
US4694358A (en) * 1985-10-28 1987-09-15 Kerdix, Inc. Magneto-optic recording structure and method
JPH07105082B2 (ja) * 1985-11-28 1995-11-13 ソニー株式会社 光磁気記録媒体
JPH0695404B2 (ja) * 1985-12-27 1994-11-24 ソニー株式会社 光磁気記録方法
DE3642161A1 (de) * 1986-12-10 1988-06-23 Philips Patentverwaltung Verfahren zur herstellung eines magneto-optischen speichers
JPS63184940A (ja) * 1987-01-27 1988-07-30 Sumitomo Metal Mining Co Ltd 光磁気デイスク
JPS63188843A (ja) * 1987-01-31 1988-08-04 Nec Home Electronics Ltd 光磁気デイスクの製造方法
US4740430A (en) * 1987-02-18 1988-04-26 American Telephone And Telegraph Company, At&T Bell Laboratories Magneto-optic memory

Also Published As

Publication number Publication date
AU630664B2 (en) 1992-11-05
EP0383216A2 (de) 1990-08-22
DE3904611A1 (de) 1990-08-23
AU4978490A (en) 1990-08-23
ATE130117T1 (de) 1995-11-15
JPH02247848A (ja) 1990-10-03
FI900721A0 (fi) 1990-02-14
EP0383216A3 (de) 1991-09-11
US5527605A (en) 1996-06-18
BR9000700A (pt) 1991-01-22
ZA901150B (en) 1990-10-31
DE59009844D1 (de) 1995-12-14
EP0383216B1 (de) 1995-11-08
DK0383216T3 (da) 1995-12-11
CA2010014A1 (en) 1990-08-16
JP2996681B2 (ja) 2000-01-11

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